公开(公告)号：US07110110B2

公开(公告)日：2006-09-19

申请号：US10745577

申请日：2003-12-29

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: G01J3/30

CPC classification number: G01N21/73

Abstract: A sensing device for sensing a condition of a plasma processing system component. The sensing device includes a main body configured to contain a material, an emitter contained in the main body and configured to emit light when exposed to a plasma, and a mating feature connected to the main body and configured to be mated with a receiving feature of an object in the plasma processing system such that the emitter material is exposed to a processing environment of the plasma processing system. When the emitter material is exposed to a plasma, the light emitted from the emitter can be monitored to determine at least one of material accumulation on the system component and erosion of the system component.

Abstract translation: 一种感测装置，用于感测等离子体处理系统部件的状态。 感测装置包括被配置为容纳材料的主体，容纳在主体中并被配置为当暴露于等离子体时发光的发射器，以及连接到主体的配合特征，并且被配置为与接收特征 等离子体处理系统中的一个目的，使得发射极材料暴露于等离子体处理系统的处理环境中。 当发射体材料暴露于等离子体时，可以监测从发射器发射的光以确定系统部件上的材料积聚和系统部件的侵蚀中的至少一种。

公开(公告)号：US07005842B2

公开(公告)日：2006-02-28

申请号：US10451214

申请日：2001-12-20

Applicant: Steven T. Fink ,  Thomas H. Windhorn

Inventor： Steven T. Fink ,  Thomas H. Windhorn

IPC: G01R31/02

CPC classification number: H01J37/32935 ,  G01D11/30

Abstract: A probe cartridge assembly and a multi-probe assembly (10) including a mounting plate having a plurality of the probe cartridge assemblies mounted on the mounting plate. The probe cartridge assembly generally includes a mounting member, a probe insulator (30), a probe (40), a ferrule (50), a lead insulator (60), a retaining member (70), and a wire having an electrical lead. The electrical lead is positioned within a cavity in the ferrule, and an inclined surface of the ferrule is contacted to an inclined surface of the probe within an area defined by the probe insulator and the lead insulator. The probe insulator and the lead insulator are held within an area defined by the mounting member and the retaining member. The retaining member and the mounting member are adjustably mated to each other in order to provide a clamping force to ensure proper electrical interconnection between the electric lead, the ferrule, and the probe.

Abstract translation: 探针盒组件和多探针组件（10），其包括安装板，所述安装板具有安装在安装板上的多个探针盒组件。 探针盒组件通常包括安装构件，探针绝缘体（30），探针（40），套圈（50），引线绝缘体（60），保持构件（70）和具有电引线 。 电引线定位在套圈内的空腔内，并且套管的倾斜表面在由探针绝缘体和导线绝缘体限定的区域内与探针的倾斜表面接触。 探头绝缘体和引线绝缘体保持在由安装构件和保持构件限定的区域内。 保持构件和安装构件可调节地彼此配合，以便提供夹紧力以确保电引线，套圈和探针之间的适当的电互连。

公开(公告)号：US06963043B2

公开(公告)日：2005-11-08

申请号：US10647469

申请日：2003-08-26

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: H01J37/32 ,  B23K10/00

CPC classification number: H01J37/32642

Abstract: An asymmetrical focus ring varies the flow-field, which aids in normalizing pressure gradients across the wafer being processed, thereby improving the process. Embodiments of the present invention utilize a focus ring that either (1) contains a pattern of through holes that enhances pumping, or (2) does not contain any such pattern.

Abstract translation: 不对称聚焦环改变了流场，这有助于正在处理正在处理的晶片上的压力梯度，从而改进了工艺。 本发明的实施例利用聚焦环（1）包含增强泵送的通孔图案，或（2）不包含任何这种图案。

公开(公告)号：US07789963B2

公开(公告)日：2010-09-07

申请号：US11065065

申请日：2005-02-25

Applicant: Andrej S. Mitrovic ,  Steven T. Fink

Inventor： Andrej S. Mitrovic ,  Steven T. Fink

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC classification number: H01L21/67069 ,  C23F4/00 ,  H01J37/32477

Abstract: An apparatus for processing semiconductors includes a processing chamber including a plurality of chamber walls, a substrate holder, positioned within the processing chamber and configured to support the substrate, and a linear displacement device, coupled between a base wall of the plurality of walls and the substrate holder and configured to move the substrate holder relative to the base wall. A shielding part extending from the substrate holder to be in close parallel relation with at least one of the plurality of walls such that a first area of the processing chamber is substantially shielded from a processing environment to which the substrate is exposed.

Abstract translation: 一种用于处理半导体的设备包括处理室，其包括多个室壁，位于处理室内并被配置为支撑衬底的衬底保持器，以及线性位移装置，其连接在多个壁的底壁和 衬底保持器并且构造成相对于底壁移动衬底保持器。 从衬底保持器延伸成与多个壁中的至少一个紧密平行的屏蔽部分，使得处理室的第一区域基本上与衬底暴露于的处理环境屏蔽。

公开(公告)号：US07552521B2

公开(公告)日：2009-06-30

申请号：US11006544

申请日：2004-12-08

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: B23P15/16 ,  B23P13/02 ,  C23F1/00 ,  H01L21/306 ,  C23C16/455

CPC classification number: H01J37/32633 ,  H01J37/32623 ,  Y10T29/49995

Abstract: An apparatus related to plasma chambers used for processing semiconductor substrates and specifically to improvements in pumping baffle plates used in plasma sources. An apparatus and method for making a baffle plate assembly formed from a modified baffle plate blank wherein a variety of pumping features are formed in the baffle plate blank and opened in a planar material removal operation.

Abstract translation: 涉及用于处理半导体衬底的等离子体室的装置，具体涉及在等离子体源中使用的抽吸挡板的改进。 一种用于制造由改性挡板坯料形成的挡板组件的装置和方法，其中在挡板板坯中形成各种泵送特征并在平面材料去除操作中打开。

公开(公告)号：US07311784B2

公开(公告)日：2007-12-25

申请号：US10720189

申请日：2003-11-25

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: H01L21/00

CPC classification number: H01J37/32642 ,  H01L21/67069

Abstract: This invention relates to a plasma processing system. A common problem in the manufacture of semiconductors is the maintenance of a constant fluid flow throughout the chamber in which the semiconductors are being etched. The focus ring described herein helps control fluid flow such that all (or substantially all) of a substrate (e.g., semiconductor) surface is exposed to a constant flow of plasma throughout the etching process. An even fluid flow is maintained by adjusting the configuration of a focus ring, a pumping baffle, or a focus ring working with an auxiliary focus ring with respect to the semiconductor surface. By manipulating the position of the focus ring, pumping baffle, and auxiliary focus ring, fluid flow over the surface of the semiconductor can be increased, decreased, or kept stagnant.

Abstract translation: 本发明涉及等离子体处理系统。 半导体制造中的常见问题是在整个室内保持恒定的流体流动，其中半导体被蚀刻。 本文描述的聚焦环有助于控制流体流动，使得在整个蚀刻过程中，所有（或基本上全部）基底（例如半导体）表面暴露于恒定的等离子体流。 通过调整聚焦环，泵送挡板或与辅助聚焦环相对于半导体表面工作的聚焦环的结构来维持均匀的流体流动。 通过操纵聚焦环的位置，泵送挡板和辅助聚焦环，可以增加，减少或保持停滞在半导体表面上的流体流动。

公开(公告)号：US07296534B2

公开(公告)日：2007-11-20

申请号：US10808388

申请日：2004-03-25

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: C23C16/50 ,  C23F1/00 ,  H01L21/306 ,  C23C16/503 ,  C23C16/505 ,  C23C16/509

CPC classification number: H01J37/3244 ,  H01J37/32532

Abstract: The present invention uses hybrid ball-lock devices as an alternate for threaded fasteners. Parts of the fastener exposed directly to the plasma act as a shield for the remaining pieces of the fastener or are used as a material to actually enhance plasma characteristics. The present invention also provides consistent electrical and mechanical contact between parts, without the use of any tools.

Abstract translation: 本发明使用混合球锁装置作为螺纹紧固件的替代品。 直接暴露于等离子体的紧固件的部件用作其余的紧固件的屏蔽件，或用作实际增强等离子体特性的材料。 本发明还提供了部件之间的一致的电和机械接触，而不使用任何工具。

公开(公告)号：US07241397B2

公开(公告)日：2007-07-10

申请号：US10811912

申请日：2004-03-30

Applicant: Steven T. Fink ,  Andrej S. Mitrovic ,  Paula A. Calabrese

Inventor： Steven T. Fink ,  Andrej S. Mitrovic ,  Paula A. Calabrese

IPC: C23C16/00 ,  C23C14/34 ,  G01L21/30

CPC classification number: H01L21/67069 ,  H01J37/32458 ,  H01J37/32972

Abstract: An optical window deposition shield including a backing plate having a through hole, and a honeycomb structure having a plurality of adjacent cells configured to allow optical viewing through the honeycomb structure. Each cell of the honeycomb structure has an aspect ratio of length to diameter sufficient to impede a processing plasma from traveling through the full length of the cell. A coupling device configured to couple the honeycomb core structure to the backing plate such that the honeycomb structure is aligned with at least a portion of the through hole in the backing plate. The optical window deposition shield shields the optical viewing window of a plasma processing apparatus from contact with the plasma.

Abstract translation: 一种光学窗口沉积屏蔽，包括具有通孔的背板，以及具有多个相邻单元的蜂窝结构，所述多个相邻单元被配置为允许通过蜂窝结构进行光学观察。 蜂窝结构体的每个单元具有足以阻碍加工等离子体行进通过电池整个长度的长度与直径的纵横比。 耦合装置，其被配置为将蜂窝芯结构耦合到背板，使得蜂窝结构与背板中的通孔的至少一部分对准。 光学窗口沉积屏蔽屏蔽了等离子体处理设备的光学观察窗口与等离子体的接触。

公开(公告)号：US07237666B2

公开(公告)日：2007-07-03

申请号：US11503154

申请日：2006-08-14

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: F16D71/04

CPC classification number: H01L21/67069 ,  H01L21/68 ,  H01L21/68792 ,  Y10T74/1836

Abstract: A multi-stop mechanism for providing multiple stop positions between first and second objects that are movable into and out of contact with one another. The multi-stop mechanism of the present invention includes a housing which secures the multi stop mechanism to the first object and/or the second object, a rotatble shaft rotatably mounted to the housing, and plurality of stops located on the rotatable shaft. When the shaft is rotated within the housing, the stops are rotated to different positions relative to the housing. As such, the rotatable shaft positions one of the stops to contact the first or second object that the multi-stop mechanism is not attached to.

Abstract translation: 一种用于在第一和第二物体之间提供多个停止位置的多功能机构，其可移动进入或离开彼此接触。 本发明的多重机构包括将多重停止机构固定到第一物体和/或第二物体的壳体，可旋转地安装到壳体的旋转轴以及位于可旋转轴上的多个止动件。 当轴在壳体内旋转时，止动件相对于壳体旋转到不同的位置。 这样，可旋转轴将止动件之一定位成与多个止动机构未附接到的第一或第二物体接触。