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    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    21.
    发明申请
    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置投影目标

    公开(公告)号：US20080304033A1

    公开(公告)日：2008-12-11

    申请号：US12194229

    申请日：2008-08-19

    申请人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    发明人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    IPC分类号： G03B27/42 ,  G03B27/54

    CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.

    摘要翻译： 降低分辨率的另一种方法是将具有高折射率的浸没液体引入保留在投影物镜的像侧上的最终透镜元件与待曝光的光致抗蚀剂或另一光敏层之间的间隙中。 为浸入式操作设计的投影物镜，因此也称为浸没物镜，可达到大于1，例如1.3或1.4的数值孔径。 在本申请的上下文中，术语“浸没液体”还涉及通常称为“固体浸没”的内容。 在固体浸渍的情况下，浸没液实际上是固体介质，然而，其不会与光致抗蚀剂直接接触，而是与其隔开距离，其仅是所使用波长的一部分。 这确保几何光学的定律不适用于不发生全反射。

    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    24.
    发明申请
    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置投影目标

    公开(公告)号：US20110228246A1

    公开(公告)日：2011-09-22

    申请号：US13115741

    申请日：2011-05-25

    申请人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    发明人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    IPC分类号： G03F7/207 ,  G02B3/12 ,  G02B17/08 ,  G03B27/70

    CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.

    摘要翻译： 降低分辨率的另一种方法是将具有高折射率的浸没液体引入保留在投影物镜的像侧上的最终透镜元件与待曝光的光致抗蚀剂或另一光敏层之间的间隙中。 为浸入式操作设计的投影物镜，因此也称为浸没物镜，可达到大于1，例如1.3或1.4的数值孔径。 在本申请的上下文中，术语“浸没液体”还涉及通常称为“固体浸没”的内容。 在固体浸渍的情况下，浸没液实际上是固体介质，然而，其不会与光致抗蚀剂直接接触，而是与其隔开距离，其仅是所使用波长的一部分。 这确保几何光学的定律不适用于不发生全反射。

    PROJECTION OBJECTIVE ADAPTED FOR USE WITH DIFFERENT IMMERSION FLUIDS OR LIQUIDS, METHOD OF CONVERSION OF SUCH AND PRODUCTION METHOD
    26.
    发明申请
    PROJECTION OBJECTIVE ADAPTED FOR USE WITH DIFFERENT IMMERSION FLUIDS OR LIQUIDS, METHOD OF CONVERSION OF SUCH AND PRODUCTION METHOD 失效
    投影目标适用于不同浸入液或液体的方法，转换方法和生产方法

    公开(公告)号：US20080273248A1

    公开(公告)日：2008-11-06

    申请号：US11420103

    申请日：2006-05-24

    申请人： Susanne Beder ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Wolfgang Singer ,  Toralf Gruner

    发明人： Susanne Beder ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Wolfgang Singer ,  Toralf Gruner

    IPC分类号： G02B3/12

    CPC分类号： G02B13/143 ,  G03F7/70341

    摘要： The invention relates to a projection objective (6), in particular for applications in microlithography, serving to project an image of an object (3) arranged in an object plane (4) onto a substrate (18) arranged in an image plane (7). The projection objective (6) has an object-side-oriented part (10) which is arranged adjacent to the object plane (4) and includes a plurality of optical elements, and it also has an image-side-oriented part (11) of the objective which is arranged adjacent to the image plane (7) and includes a free space (16) serving to receive a fluid (13) and further includes at least a part of an optical end-position element (14) serving to delimit the free space (16) towards the object side. The projection objective (6) is operable in different modes of operation in which the free space (16) is filled with fluids (13) that differ in their respective indices of refraction.

    摘要翻译： 本发明涉及一种投影物镜（6），特别是用于微光刻中的用于将布置在物平面（4）中的物体（3）的图像投影到布置在图像平面（7）中的基底（18）上的投影物镜 ）。 投影物镜（6）具有与物平面（4）相邻配置并具有多个光学元件的物体侧取向部（10），还具有图像侧取向部（11） 所述物镜布置成邻近所述图像平面（7）并且包括用于接收流体（13）的自由空间（16），并且还包括用于界定光学终点位置元件（14）的至少一部分 朝向物体侧的自由空间（16）。 投影物镜（6）可在不同的操作模式中操作，其中自由空间（16）填充有各自折射率不同的流体（13）。