公开(公告)号：US20060245540A1

公开(公告)日：2006-11-02

申请号：US11345880

申请日：2006-02-02

申请人： Jorg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni ,  Joachim Wietzorrek ,  Joachim Hainz

发明人： Jorg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni ,  Joachim Wietzorrek ,  Joachim Hainz

IPC分类号： G21K5/00

CPC分类号： G02B3/0043 ,  B82Y10/00 ,  G02B3/0062 ,  G02B17/0657 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G21K1/06 ,  G21K1/062

摘要： There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.

公开(公告)号：US20070030948A1

公开(公告)日：2007-02-08

申请号：US11581053

申请日：2006-10-13

申请人： Wolfgang Singer ,  Joachim Hainz ,  Hans-Joachim Frasch ,  Johannes Wangler ,  Joachim Wietzorrek ,  Jorg Schultz

发明人： Wolfgang Singer ,  Joachim Hainz ,  Hans-Joachim Frasch ,  Johannes Wangler ,  Joachim Wietzorrek ,  Jorg Schultz

IPC分类号： G21K5/00

CPC分类号： G03F7/7015 ,  G03F7/70083 ,  G21K2201/06

摘要： This invention relates to an illumination system for scanning lithography especially for wavelengths ≦193 nm, particularly EUV lithography, for the illumination of a slit, comprising at least one field mirror or at least one field lens and being characterized in that at least one of the field mirror(s) or the field lens(es) has (have) an aspheric shape.

摘要翻译： 本发明涉及一种用于扫描光刻的照明系统，特别是用于照射狭缝的波长<= 193nm，特别是EUV光刻，其包括至少一个场反射镜或至少一个场透镜，其特征在于，至少一个 场反射镜或场透镜具有非球面形状。

公开(公告)号：US20050083503A1

公开(公告)日：2005-04-21

申请号：US10921447

申请日：2004-08-19

申请人： Martin Antoni ,  Isabel Escudero-Sanz ,  Wolfgang Singer ,  Johannes Wangler ,  Jorg Schultz

发明人： Martin Antoni ,  Isabel Escudero-Sanz ,  Wolfgang Singer ,  Johannes Wangler ,  Jorg Schultz

IPC分类号： G02B13/18 ,  G02B13/24 ,  G02B17/00 ,  G02B17/06 ,  G02B19/00 ,  G02B27/00 ,  G02B27/09 ,  G03F7/20 ,  G03F7/22 ,  H01L21/027 ,  G02B5/32

CPC分类号： G02B27/0983 ,  G02B17/0621 ,  G02B19/0023 ,  G02B19/0028 ,  G02B19/0047 ,  G02B19/0095 ,  G02B27/0905 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70233 ,  Y10S359/90

摘要： There is provided a multi-mirror-system for an illumination system, especially for lithography with wavelengths ≦193 nm. The system includes light rays traveling along a light path from an object plane to an image plane, andan arc-shaped field in the image plane, whereby a radial direction in the middle of the arc-shaped field defines a scanning direction. The first mirror and the second mirror are arranged in the light path in such a position and having such a shape, that the edge sharpness of the arc-shaped field in the image plane is smaller than 5 mm in the scanning direction. Furthermore, the light rays are impinging on the first mirror and the second mirror with incidence angles ≦30° or ≧60° relative to a surface normal of the first and second mirror.

摘要翻译： 提供了用于照明系统的多镜系统，特别是对于波长<= 193nm的光刻。 该系统包括沿着从物平面到像平面的光路行进的光线，以及图像平面中的弧形场，由此在弧形场的中间的径向方向限定了扫描方向。 第一反射镜和第二反射镜被布置在具有这样的位置的光路中，使得像面中的弧形场的边缘锐度在扫描方向上小于5mm。 此外，相对于第一和第二反射镜的表面法线，光线入射在第一反射镜和第二反射镜上，入射角<= 30°或> = 60°。

公开(公告)号：US20070014028A1

公开(公告)日：2007-01-18

申请号：US11534022

申请日：2006-09-21

申请人： Johannes Wangler ,  Karl-Heinz Schuster ,  Alexander Sohmer ,  Alexander Epple ,  Jurgen Grunwald ,  Jorg Schultz ,  Christa Muller

发明人： Johannes Wangler ,  Karl-Heinz Schuster ,  Alexander Sohmer ,  Alexander Epple ,  Jurgen Grunwald ,  Jorg Schultz ,  Christa Muller

IPC分类号： G02B21/02

CPC分类号： G03F7/70891 ,  G02B13/143 ,  G02B13/18 ,  G03F7/70066 ,  G03F7/70075

摘要： A reticle-masking (REMA) objective for imaging an object plane onto an image plane has a condenser portion, an intermediate portion, and a field lens portion. The three portions together have no more than 10 lenses with a combined total of no more than five aspheric lens surfaces. Each of the three portions of the REMA objective has one or two aspheric lens surfaces.

摘要翻译： 用于将物平面成像到图像平面上的掩模版掩模（REMA）物镜具有聚光部分，中间部分和场透镜部分。 三个部分一起不超过10个透镜，总共不超过五个非球面透镜表面。 REMA物镜的三个部分中的每一个具有一个或两个非球面透镜表面。

公开(公告)号：US20080225259A1

公开(公告)日：2008-09-18

申请号：US12127310

申请日：2008-05-27

申请人： Wolfgang Singer ,  Jorg Schultz ,  Johannes Wangler

发明人： Wolfgang Singer ,  Jorg Schultz ,  Johannes Wangler

IPC分类号： G03B27/54

CPC分类号： G03F7/70075 ,  B82Y10/00 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70891 ,  G03F7/70983 ,  G21K1/06 ,  G21K5/00 ,  G21K5/04

摘要： An illumination system comprises (a) a first optical element upon which a light beam impinges, where the first optical element has first raster elements that partition said light beam into light channels; (b) a second optical element that receives said light channels, where the second optical element has a second raster elements; (c) an object plane that receives said light channels via said second optical element; and (d) an exit pupil that is provided with an illumination via said object plane. The system is characterized by an assignment of a member of said first raster elements and a member of said second raster elements to each of said light channels to provide a continuous beam path from said first optical element to said object plane for each of said plurality of light channels. The assignment is changeable to provide an adjustment of said illumination in said exit pupil.

摘要翻译： 照明系统包括：（a）第一光学元件，光束入射到该第一光学元件上，其中第一光学元件具有将所述光束分成光通道的第一光栅元件; （b）第二光学元件，其接收所述光通道，其中所述第二光学元件具有第二光栅元件; （c）通过所述第二光学元件接收所述光通道的物平面; 和（d）通过所述物平面设置照明的出射光瞳。 该系统的特征在于将所述第一光栅元件的成员和所述第二光栅元件的成员分配给每个所述光通道，以提供从所述第一光学元件到所述物平面的连续光束路径，用于所述多个 光通道。 所述分配是可变的以提供所述出射光瞳中的所述照明的调整。