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公开(公告)号:US20250087641A1
公开(公告)日:2025-03-13
申请号:US18939947
申请日:2024-11-07
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Jiun Yi Wu , Chen-Hua Yu , Chung-Shi Liu
IPC: H01L25/065 , H01L21/56 , H01L23/00 , H01L23/538
Abstract: A structure includes core substrates attached to a first side of a redistribution structure, wherein the redistribution structure includes first conductive features and first dielectric layers, wherein each core substrate includes conductive pillars, wherein the conductive pillars of the core substrates physically and electrically contact first conductive features; an encapsulant extending over the first side of the redistribution structure, wherein the encapsulant extends along sidewalls of each core substrate; and an integrated device package connected to a second side of the redistribution structure.
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公开(公告)号:US12191251B2
公开(公告)日:2025-01-07
申请号:US18334843
申请日:2023-06-14
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Jiun Yi Wu , Chen-Hua Yu , Chien-Hsun Chen
IPC: H01L23/522 , H01L21/768 , H01L23/00 , H01L23/48 , H01L23/528 , H01L25/16
Abstract: A method includes forming a redistribution structure on a carrier, attaching an integrated passive device on a first side of the redistribution structure, attaching an interconnect structure to the first side of the redistribution structure, the integrated passive device interposed between the redistribution structure and the interconnect structure, depositing an underfill material between the interconnect structure and the redistribution structure, and attaching a semiconductor device on a second side of the redistribution structure that is opposite the first side of the redistribution structure.
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公开(公告)号:US12165941B2
公开(公告)日:2024-12-10
申请号:US17870222
申请日:2022-07-21
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chen-Hua Yu , Chien-Hsun Lee , Jiun Yi Wu
IPC: H01L23/31 , H01L21/48 , H01L21/56 , H01L23/00 , H01L23/498
Abstract: An integrated fan out package is utilized in which the dielectric materials of different redistribution layers are utilized to integrate the integrated fan out package process flows with other package applications. In some embodiments an Ajinomoto or prepreg material is utilized as the dielectric in at least some of the overlying redistribution layers.
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公开(公告)号:US20240379538A1
公开(公告)日:2024-11-14
申请号:US18782124
申请日:2024-07-24
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Jiun Yi Wu , Chen-Hua Yu , Chien-Hsun Chen
IPC: H01L23/522 , H01L21/768 , H01L23/00 , H01L23/48 , H01L23/528 , H01L25/16
Abstract: A method includes forming a redistribution structure on a carrier, attaching an integrated passive device on a first side of the redistribution structure, attaching an interconnect structure to the first side of the redistribution structure, the integrated passive device interposed between the redistribution structure and the interconnect structure, depositing an underfill material between the interconnect structure and the redistribution structure, and attaching a semiconductor device on a second side of the redistribution structure that is opposite the first side of the redistribution structure.
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公开(公告)号:US20240379535A1
公开(公告)日:2024-11-14
申请号:US18779329
申请日:2024-07-22
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chung-Shi Liu , Chien-Hsun Lee , Jiun Yi Wu , Hao-Cheng Hou , Hung-Jen Lin , Jung Wei Cheng , Tsung-Ding Wang , Yu-Min Liang , Li-Wei Chou
IPC: H01L23/522 , H01L21/56 , H01L21/683 , H01L21/768 , H01L23/00 , H01L23/31 , H01L23/498
Abstract: An embodiment semiconductor package includes a bare semiconductor chip, a packaged semiconductor chip adjacent the bare semiconductor chip, and a redistribution structure bonded to the bare semiconductor chip and the packaged semiconductor chip. The redistribution structure includes a first redistribution layer having a first thickness; a second redistribution layer having a second thickness; and a third redistribution layer between the first redistribution layer and the second redistribution layer. The third redistribution layer has a third thickness greater than the first thickness and the second thickness. The package further includes an underfill disposed between the bare semiconductor chip and the redistribution structure and a molding compound encapsulating the bare semiconductor chip, the packaged semiconductor chip, and the underfill.
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公开(公告)号:US20240377595A1
公开(公告)日:2024-11-14
申请号:US18783789
申请日:2024-07-25
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chen-Hua Yu , Jiun Yi Wu
IPC: G02B6/42 , H01L27/146
Abstract: A method includes forming a package, which includes an optical die and a protection layer attached to the optical die. The optical die includes a micro lens, with the protection layer and the micro lens being on a same side of the optical die. The method further includes encapsulating the package in an encapsulant, planarizing the encapsulant to reveal the protection layer, and removing the protection layer to form a recess in the encapsulant. The optical die is underlying the recess, with the micro lens facing the recess.
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公开(公告)号:US20240369783A1
公开(公告)日:2024-11-07
申请号:US18448686
申请日:2023-08-11
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chen-Hua Yu , Hsing-Kuo Hsia , Chih-Wei Tseng , Jiun Yi Wu
IPC: G02B6/42
Abstract: A package includes a routing structure including a first waveguide and a photonic device; an electronic die bonded to the routing structure, wherein the electronic die is electrically connected to the photonic device; and an optical coupling structure bonded to the routing structure adjacent the electronic die, wherein the optical coupling structure includes a first lens in a first side of a substrate.
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公开(公告)号:US20240304585A1
公开(公告)日:2024-09-12
申请号:US18665806
申请日:2024-05-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Jiun Yi Wu , Chen-Hua Yu
IPC: H01L23/00
CPC classification number: H01L24/20 , H01L24/19 , H01L2224/2101 , H01L2224/211 , H01L2224/214
Abstract: In an embodiment, a structure includes a core substrate, a redistribution structure coupled, the redistribution structure including a plurality of redistribution layers, the plurality of redistribution layers comprising a dielectric layer and a metallization layer, a first local interconnect component embedded in a first redistribution layer of the plurality of redistribution layers, the first local interconnect component comprising conductive connectors, the conductive connectors being bonded to a metallization pattern of the first redistribution layer, the dielectric layer of the first redistribution layer encapsulating the first local interconnect component, a first integrated circuit die coupled to the redistribution structure, a second integrated circuit die coupled to the redistribution structure, an interconnect structure of the first local interconnect component electrically coupling the first integrated circuit die to the second integrated circuit die, and a set of conductive connectors coupled to a second side of the core substrate.
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公开(公告)号:US20240280772A1
公开(公告)日:2024-08-22
申请号:US18329464
申请日:2023-06-05
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chen-Hua Yu , Jiun Yi Wu
IPC: G02B6/42
CPC classification number: G02B6/4283 , G02B6/4215 , G02B6/4232 , G02B6/428
Abstract: A method includes forming a first redistribution structure on a first substrate; forming a waveguide structure on a second substrate, wherein the waveguide structure includes waveguides; bonding the waveguide structure to the redistribution structure using dielectric-to-dielectric bonding; removing the second substrate; forming a second redistribution structure on the waveguide structure; and connecting a photonic package to the second redistribution structure, wherein the photonic package is optically coupled to the waveguides.
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公开(公告)号:US12051650B2
公开(公告)日:2024-07-30
申请号:US17412966
申请日:2021-08-26
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Jiun Yi Wu , Chen-Hua Yu , Chung-Shi Liu
IPC: H01L23/538 , H01L21/48 , H01L23/498 , H01L25/00 , H01L25/065 , H01L23/00
CPC classification number: H01L23/5383 , H01L21/4857 , H01L21/486 , H01L23/49816 , H01L23/49822 , H01L23/49833 , H01L25/0652 , H01L25/50 , H01L24/16 , H01L24/32 , H01L24/73 , H01L2224/16227 , H01L2224/32225 , H01L2224/73204
Abstract: A semiconductor structure includes a first redistribution structure, a first local interconnect component disposed on the first redistribution structure, and a first interconnect structure over a second side of the first local interconnect component. The first local interconnect component includes a first plurality of redistribution layers. The first plurality of redistribution layers includes a first plurality of conductive features on a first side of the first local interconnect component. Each of the first plurality of conductive features are coupled to respective conductive features of the first redistribution structure. The first interconnect structure includes a second plurality of conductive features and a third plurality of conductive features. The second plurality of conductive features are electrically coupled to the third plurality of conductive features through the first local interconnect component.
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