PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    21.
    发明申请
    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD 审中-公开
    等离子体加工设备和等离子体处理方法

    公开(公告)号:US20110253672A1

    公开(公告)日:2011-10-20

    申请号:US12855206

    申请日:2010-08-12

    IPC分类号: C23F1/12 H01L21/306 C23F1/08

    摘要: The present invention is intended to improve the uniformity in a distribution function of incident ion energy inside a wafer surface, and realize uniform plasma processing (etching or the like) inside the wafer surface. In a plasma processing apparatus, a bias application portion of a placement electrode on which a wafer is placed is divided into an inner electrode and an outer electrode at positions near the center of the wafer and the edge thereof. Each of a first bias power and a second bias power to be used to accelerate ions incident on the wafer is bifurcated, and the resultant bias powers are fed to the inner electrode and outer electrode using a power distributor by adjusting the power ratio.

    摘要翻译: 本发明旨在提高晶片表面内的入射离子能的分布函数的均匀性,并且在晶片表面内实现均匀的等离子体处理(蚀刻等)。 在等离子体处理装置中,放置晶片的放置电极的偏置施加部分在晶片的中心和边缘附近的位置被分成内电极和外电极。 用于加速入射在晶片上的离子的第一偏置功率和第二偏置功率分别被分叉,并且通过调节功率比,使用功率分配器将所得到的偏置功率馈送到内部电极和外部电极。

    Plasma processing apparatus and method for venting the same to atmosphere
    22.
    发明授权
    Plasma processing apparatus and method for venting the same to atmosphere 有权
    等离子体处理装置和方法,用于将其排放到大气中

    公开(公告)号:US08029874B2

    公开(公告)日:2011-10-04

    申请号:US12035759

    申请日:2008-02-22

    IPC分类号: H05H1/24

    CPC分类号: C23C16/4401

    摘要: In a plasma processing apparatus provided with control means, gas supply means includes a first gas supply path for supplying a vent gas into a processing chamber by way of a shower plate and a second gas supply path for supplying a vent gas into the processing chamber without via the shower plate, and the control means is capable of adjusting a flow rate of the vent gas of at least one of the first and second gas supply paths in such a manner that a pressure on a back side of the shower plate becomes a pressure that is a positive pressure relative to a pressure in the processing chamber and less than a withstand pressure of the shower plate.

    摘要翻译: 在设置有控制装置的等离子体处理装置中,气体供给装置包括用于通过淋浴板将排放气体供给到处理室中的第一气体供给路径和用于将排出气体供给到处理室中的第二气体供给路径, 并且控制装置能够调节第一和第二气体供给路径中的至少一个的排出气体的流量,使得淋浴板的背侧的压力成为压力 这是相对于处理室中的压力的​​正压力并且小于喷淋板的耐受压力。

    ELECTRONIC APPARATUS AND METHOD OF CONTROLLING ELECTRONIC APPARATUS
    24.
    发明申请
    ELECTRONIC APPARATUS AND METHOD OF CONTROLLING ELECTRONIC APPARATUS 有权
    电子设备和控制电子设备的方法

    公开(公告)号:US20110205071A1

    公开(公告)日:2011-08-25

    申请号:US13008548

    申请日:2011-01-18

    IPC分类号: G08B17/00 H02H5/04

    摘要: An electronic apparatus includes: a temperature measurement section that measures a temperature of a heat generation source generating heat by consuming power or a temperature of an inner position of a casing of which the temperature changes due to the heat generation of the heat generation source; and an environmental temperature calculation section that calculates a temperature which is calculated using a predetermined relational equation that is different in accordance with a model from a difference between a first temperature measured by the temperature measurement section at a point in time when the heat generation source starts consuming a predetermined amount of power and a second temperature measured by the temperature measurement section at a point in time after the passage of a predetermined period from the start of consumption of a predetermined amount of power by the heat generation source as an environmental temperature in an environment where the casing is placed.

    摘要翻译: 电子设备包括:温度测量部,其通过消耗功率或由于发热源的发热引起的温度变化的壳体的内部位置的温度来测量产生热量的发热源的温度; 以及环境温度计算部,其计算使用与根据模型不同的预定关系式,根据由所述发热源开始的时刻由所述温度测量部测量的第一温度之间的差计算出的温度 消耗由所述温度测量部测量的预定量的功率和第二温度,所述预定量的功率和所述第二温度是在由所述发热源从预定量的功率开始消耗的预定时间段之后的时间点作为环境温度 放置外壳的环境

    MAGNETIC CIRCUIT FOR SPEAKER DEVICE AND SPEAKER DEVICE
    25.
    发明申请
    MAGNETIC CIRCUIT FOR SPEAKER DEVICE AND SPEAKER DEVICE 审中-公开
    用于扬声器装置和扬声器装置的磁电路

    公开(公告)号:US20110164781A1

    公开(公告)日:2011-07-07

    申请号:US13063381

    申请日:2008-10-27

    IPC分类号: H04R1/00 H04R9/06

    CPC分类号: H04R9/06

    摘要: A speaker device includes a diaphragm (2), frame (3) vibratably supporting the diaphragm (2) in the vibration direction, and a driving part (4) provided at the frame (3), applying vibration to the diaphragm (2) in response to an audio signal. The driving part (4) includes a magnetic circuit (40) forming a magnetic gap (40G) in a different direction in respect with the vibration direction of the diaphragm (2), a voice coil support part (6) having a voice coil (60) and vibrating along the magnetic gap (40G), and a vibration direction converter part (7) direction converting the vibration of the voice coil support part (6) and transmitting the vibration to the diaphragm (2). The magnetic circuit (40) includes a pair of magnetic gaps (40G, 40G) having different directions of magnetic flux. The pair of magnetic gaps (40G,40G) are arranged side by side in the vibration direction of the voice coil support part (6) and the voice coil (60) supported by the voice coil support part (6) is planarly arranged so as to itinerate in the pair of magnetic gaps (40G, 40G).

    摘要翻译: 扬声器装置包括:隔膜(2),在振动方向上可振动地支撑隔膜(2)的框架(3)和设置在框架(3)处的驱动部分(4),向隔膜(2)施加振动 响应音频信号。 驱动部件(4)包括形成与隔膜(2)的振动方向不同的方向的磁隙(40G)的磁路(40),具有音圈(2)的音圈支撑部(6) 60),并且沿着磁隙(40G)振动,并且振动方向转换器部(7)的方向转换音圈支撑部(6)的振动并将振动传递到隔膜(2)。 磁路(40)包括具有不同磁通方向的一对磁隙(40G,40G)。 一对磁隙(40G,40G)沿着音圈支撑部(6)的振动方向并排布置,并且由音圈支撑部(6)支撑的音圈(60)平面布置成 以在一对磁隙(40G,40G)中进行行程。

    SPEAKER DEVICE
    26.
    发明申请
    SPEAKER DEVICE 审中-公开
    扬声器设备

    公开(公告)号:US20110116662A1

    公开(公告)日:2011-05-19

    申请号:US13002802

    申请日:2008-07-10

    IPC分类号: H04R9/06

    摘要: A speaker device includes a vibrating body including a diaphragm and a voice coil supported by a part of the diaphragm and a magnetic circuit including a first magnetic pole part having a magnet and a second magnetic pole part different from the first magnetic pole part and arranged spaced apart from the first magnetic pole part. The voice coil is arranged between the first magnetic pole part and the second magnetic pole part, the vibrating body includes a conducting part formed at a part or whole of the diaphragm, in the proximity of the voice coil, and the conducting part is arranged between the first magnetic pole part and the second magnetic pole part.

    摘要翻译: 扬声器装置包括:振动体,其包括隔膜和由所述隔膜的一部分支撑的音圈;以及磁路,其包括具有磁体的第一磁极部和与所述第一磁极部不同的第二磁极部, 除了第一个磁极部分。 音圈布置在第一磁极部分和第二磁极部分之间,振动体包括形成在音圈的一部分或全部的导电部分,在音圈附近,并且导电部分布置在 第一磁极部和第二磁极部。

    Semiconductor memory device and system with redundant element
    27.
    发明授权
    Semiconductor memory device and system with redundant element 有权
    具有冗余元件的半导体存储器件和系统

    公开(公告)号:US07933159B2

    公开(公告)日:2011-04-26

    申请号:US12683029

    申请日:2010-01-06

    IPC分类号: G11C29/00

    CPC分类号: G11C29/848 G11C29/24

    摘要: A semiconductor memory device includes a memory cell array, a redundant element, an address specifying circuit configured to select one of a plurality of addresses as a redundancy address in response to a switchover signal, a decoder circuit configured to select the redundant element in response to an externally applied address that matches the redundancy address selected by the address specifying circuit, and a test mode setting circuit configured to change the switchover signal in response to an externally applied input, thereby to cause the redundancy address assigned to the redundant element to be switched between different ones of the plurality of addresses.

    摘要翻译: 半导体存储器件包括存储单元阵列,冗余元件,地址指定电路,被配置为响应于切换信号选择多个地址之一作为冗余地址;解码器电路,被配置为响应于所述冗余元件选择所述冗余元件 匹配由地址指定电路选择的冗余地址的外部施加的地址和被配置为响应于外部施加的输入而改变切换信号的测试模式设置电路,从而使分配给冗余元件的冗余地址被切换 在多个地址中的不同地址之间。

    FRESNEL LENS
    28.
    发明申请
    FRESNEL LENS 审中-公开
    FRESNEL镜片

    公开(公告)号:US20100302654A1

    公开(公告)日:2010-12-02

    申请号:US12517219

    申请日:2007-11-19

    IPC分类号: G02B3/08

    CPC分类号: G02B3/08 G02B7/028

    摘要: To provide a Fresnel lens wherein changes in focal length due to temperature dependence of the refractive index can be compensated. By introducing a fractal structure into prisms in a peripheral region in which the prism angle is large and therefore the aspect ratio h/p of the prisms is large, the aspect ratio is reduced from h/p to h′/p and the slope of the envelope 20 to the underside of the slopping face is reduced, and thereby a shape in which a change in focal length due to temperature dependence of refractive index can be compensated for by a change in the shape of lenses due to expansion/contraction, is obtained.

    摘要翻译: 为了提供菲涅尔透镜,其中可以补偿由于折射率的温度依赖性导致的焦距的变化。 通过在棱镜角度大的周边区域中引入分形结构到棱镜中,因此棱镜的纵横比h / p大,则纵横比从h / p降低到h'/ p,斜率 减少了到凹面的下侧的包络20,从而可以通过由于伸缩而导致的透镜形状的变化来补偿由于折射率的温度依赖性导致的焦距的变化的形状。 获得。

    VACUUM PROCESSING APPARATUS
    30.
    发明申请
    VACUUM PROCESSING APPARATUS 有权
    真空加工设备

    公开(公告)号:US20100192857A1

    公开(公告)日:2010-08-05

    申请号:US12392127

    申请日:2009-02-25

    IPC分类号: C23C16/50

    CPC分类号: C23C16/4412

    摘要: A vacuum processing apparatus includes a member having a gas passage formed in a center between the pressure adjusting valve of an exhaust system and a turbo-molecular pump, and a particle dispersion prevention unit having plural stationary blades formed to be tilted in a direction opposite the direction of the rotary blade of the turbo-molecular pump on the outer circumference of the member.

    摘要翻译: 真空处理装置包括具有形成在排气系统的压力调节阀和涡轮分子泵之间的中心的气体通道的部件和具有多个静止叶片的颗粒分散防止单元,所述多个固定叶片形成为沿相反方向倾斜 涡轮分子泵的旋转叶片在构件的外周上的方向。