公开(公告)号：US20190066985A1

公开(公告)日：2019-02-28

申请号：US16110201

申请日：2018-08-23

Applicant: Tokyo Electron Limited

Inventor： Jun HIROSE ,  Kaoru OOHASHI

IPC: H01J37/32 ,  H01L21/683

Abstract: An assembly provided with a coolant flow channel includes a base in which the coolant flow channel is formed; and a protrusion component that is disposed in the coolant flow channel, wherein the protrusion component is liftable or rotatable.

公开(公告)号：US20180350569A1

公开(公告)日：2018-12-06

申请号：US15989291

申请日：2018-05-25

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kengo KANEKO ,  Jun HIROSE

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/683 ,  H01L21/311

CPC classification number: H01L21/3065 ,  H01J37/32724 ,  H01J2237/2001 ,  H01J2237/334 ,  H01L21/31116 ,  H01L21/31138 ,  H01L21/31144 ,  H01L21/32137 ,  H01L21/67069 ,  H01L21/67103 ,  H01L21/67248 ,  H01L21/6831 ,  H01L21/6833

Abstract: A plasma processing method according to an exemplary embodiment includes a process of applying a first plasma processing to a substrate in a chamber, and a process of applying a second plasma processing to the substrate in the chamber. In the process of applying the first plasma processing, a plurality of first heaters in a chuck main body of an electrostatic chuck are driven, and a plurality of second heaters in the chuck main body are driven. In the process of applying the second plasma processing, the driving of at least the plurality of second heaters is stopped.