公开(公告)号：US11342198B2

公开(公告)日：2022-05-24

申请号：US16052875

申请日：2018-08-02

Applicant: Tokyo Electron Limited

Inventor： Yuichi Terashita ,  Kousuke Yoshihara ,  Koji Takayanagi ,  Toshinobu Furusho ,  Takashi Sasa

IPC: H01L21/67

Abstract: Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.

公开(公告)号：US11273464B2

公开(公告)日：2022-03-15

申请号：US16986412

申请日：2020-08-06

Applicant: Tokyo Electron Limited

Inventor： Satoshi Shimmura ,  Yuji Sakai ,  Kenta Shibasaki ,  Koji Takayanagi ,  Kenji Yada ,  Hiroichi Inada ,  Shinichi Seki ,  Kento Ogata

IPC: B05C11/10 ,  B05B14/30 ,  B05C11/08 ,  B05C13/02

Abstract: A substrate processing apparatus includes a cover member placed to surround a substrate held by a rotary holder; a collecting member placed in an exhaust path formed between the cover member and the rotary holder; and a solvent supply placed above the collecting member and configured to supply a solvent to the collecting member. The solvent supply includes an inner storage space surrounding the substrate; an outer storage space surrounding the inner storage space; and a partition wall extending along a circumferential direction to partition the inner storage space and the outer storage space. Multiple communication holes are extended to penetrate the partition wall such that the solvent introduced into the outer storage space flows to the inner storage space. Multiple dripping holes are extended to penetrate a bottom wall of the inner storage space such that the solvent within the inner storage space drops toward the collecting member.

公开(公告)号：US10734251B2

公开(公告)日：2020-08-04

申请号：US14101669

申请日：2013-12-10

Applicant: TOKYO ELECTRON LIMITED

Inventor： Koji Takayanagi ,  Yukie Minekawa ,  Yuichi Yoshida ,  Kousuke Yoshihara ,  Yuichi Terashita ,  Toshinobu Furusho ,  Takashi Sasa

IPC: H01L21/00 ,  F04B49/06 ,  F04B43/00 ,  H01L21/67

Abstract: A filtration efficiency, which is similar to the filtration efficiency obtained when a plurality of filters are provided, can be obtained by one filter, and decrease in throughput can be prevented. Based on a control signal from a control unit 101, a resist liquid L is sucked into a pump 70 through a filter. A part of the resist liquid sucked in the pump is discharged from a discharge nozzle 7. The remaining resist liquid is returned to a supply conduit 51b on a primary side of the filter. A process is synthesized by adding a replenishment amount equal to the discharge amount to the return amount. The discharge of the synthesized process liquid and the filtration thereof by the filter are performed the number of times corresponding to a rate between the discharge amount and the return amount.

公开(公告)号：US10074546B2

公开(公告)日：2018-09-11

申请号：US14485914

申请日：2014-09-15

Applicant: Tokyo Electron Limited

Inventor： Yuichi Terashita ,  Kousuke Yoshihara ,  Koji Takayanagi ,  Toshinobu Furusho ,  Takashi Sasa

IPC: B01D19/00 ,  H01L21/67

CPC classification number: H01L21/67017

Abstract: Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.

公开(公告)号：US09576829B1

公开(公告)日：2017-02-21

申请号：US15336856

申请日：2016-10-28

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hiroshi Marumoto ,  Koji Takayanagi ,  Kenji Adachi

IPC: B01D19/00 ,  H01L21/67 ,  B01D36/00

CPC classification number: H01L21/6715 ,  B01D19/0031 ,  B01D19/0036 ,  B01D36/001 ,  H01L21/67017

Abstract: According to an embodiment of the present disclosure, a process liquid supply apparatus operating method is provided. The method includes filling a filter unit with a process liquid from an upstream side of the filter unit to a downstream side of the filter unit after newly mounting or replacing the filter unit and repeating a depressurization filtering process and a pressurization filtering process for a predetermined number of times. The depressurization filtering process depressurizes the process liquid in the downstream side of the filter unit and thereby allows the process liquid to permeate through the filter unit. The pressurization filtering process pressurizes the process liquid from the upstream side of the filter unit and thereby allows the process liquid to permeate through the filter unit.

Abstract translation: 根据本公开的实施例，提供了一种处理液体供应装置操作方法。 该方法包括在新安装或更换过滤器单元之后，将过滤液从过滤器单元的上游侧填充到过滤器单元的下游侧，并重复进行预定数量的减压过滤和加压过滤处理 的时代。 减压过滤处理对过滤器单元的下游侧的处理液进行减压，从而允许处理液体透过过滤器单元。 加压过滤过程从过滤器单元的上游侧对工艺液体进行加压，从而允许处理液体渗透过滤单元。