Abstract:
A method and a micromechanical component which counteract manufacturing-process-related mechanical stresses in the membrane are provided. The membrane is formed on a substrate in a layer system and spans a cavity in the substrate. The layer system includes at least one base layer formed on the substrate for circuit elements. At least one structured masking layer is also formed on the base layer for defining the circuit elements. The masking layer is structured in the area of the membrane in such a way that mechanical stresses acting in the area of the membrane under vacuum are at least partially compensated, the intrinsic stress of the masking layer being taken into account in the layout of the structuring.
Abstract:
A method for adjusting an acceleration sensor which includes a substrate and a seismic mass, the acceleration sensor having first and further first electrodes attached to the substrate on a first side, counter-electrodes of the seismic mass being situated between the first and further first electrodes, the acceleration sensor having further second electrodes on a second side and further fourth electrodes on a fourth side opposite the second side, an essentially equal first excitation voltage being applied to the first and further first electrodes in a first step for exciting a first deflection of the seismic mass along a first direction, the first deflection being compensated in a second step by applying a first compensation voltage to the further second and further fourth electrodes.
Abstract:
A capacitive pressure sensor made up of two silicon on insulator (SOI) wafers lying opposite of each other and joined to each other in a vacuum-tight manner, a recess being formed between the two wafers. The first wafer exclusively supports the evaluation circuits required for measuring the applied pressure and a capacitive electrode, and the second wafer has a recess formed by surface micromechanics processes, in which the counter electrode to the capacitive electrode of the first wafer is situated. The second wafer at the same time forms a cover for the first wafer.
Abstract:
A method for adjusting an acceleration sensor which includes a substrate and a seismic mass, the acceleration sensor having first and further first electrodes attached to the substrate on a first side, counter-electrodes of the seismic mass being situated between the first and further first electrodes, the acceleration sensor having further second electrodes on a second side and further fourth electrodes on a fourth side opposite the second side, an essentially equal first excitation voltage being applied to the first and further first electrodes in a first step for exciting a first deflection of the seismic mass along a first direction, the first deflection being compensated in a second step by applying a first compensation voltage to the further second and further fourth electrodes.
Abstract:
A yaw rate sensor having a substrate which has a main plane of extension, and a Coriolis element is proposed. The Coriolis element is excitable to a vibration along a third direction which is perpendicular to the main plane of extension. A Coriolis deflection of the Coriolis element along a first direction which is parallel to the main plane of extension may be detected using a detection arrangement. The detection arrangement includes a Coriolis electrode which is connected to the Coriolis element, and a corresponding counterelectrode. Both the Coriolis electrode and the counterelectrode may be excited to a vibration along the third direction.
Abstract:
A method and a micromechanical component which counteract manufacturing-process-related mechanical stresses in the membrane are provided. The membrane is formed on a substrate in a layer system and spans a cavity in the substrate. The layer system includes at least one base layer formed on the substrate for circuit elements. At least one structured masking layer is also formed on the base layer for defining the circuit elements. The masking layer is structured in the area of the membrane in such a way that mechanical stresses acting in the area of the membrane under vacuum are at least partially compensated, the intrinsic stress of the masking layer being taken into account in the layout of the structuring.
Abstract:
A yaw-rate sensor and a method for operating a yaw-rate sensor having a first Coriolis element and a second Coriolis element are proposed, the yaw-rate sensor having a substrate having a main plane of extension, the yaw-rate sensor having a first drive element for driving the first Coriolis element in parallel to a second axis, the yaw-rate sensor having a second drive element for driving the second Coriolis element in parallel to the second axis, the yaw-rate sensor having detection means for detecting deflections of the first Coriolis element and of the second Coriolis element in parallel to a first axis due to a Coriolis force, the second axis being situated perpendicularly to the first axis, the first and second axis being situated in parallel to the main plane of extension, the first and second drive elements being mechanically coupled to each other via a drive coupling element.