摘要:
An photosensitive member suitable for use in the electrophotographic apparatus of reversal development-type is formed by an electroconductive support, a charge-generation layer and a charge-transport layer disposed in this order. The charge-generation layer comprises oxytitanium phthalocyanine and the charge-transport layer is formed in a thickness of 22 microns or larger. The oxytitanium phthalocyanine is highly sensitive so that a low dark-part potential of 600V or lower (absolute) is sufficient. Because of the low dark-part potential and the thick charge transport layer, image defect, such as fog and black spots are effectively suppressed.
摘要:
An electrophotographic photosensitive member is formed by a cylindrical substrate and a photosensitive layer disposed on the cylindrical substrate. The cylindrical substrate has a circumferential end section adjacent to at least one longitudinal end of the cylindrical substrate, and the circumferential end section has the photosensitive layer thereon removed and has been subjected to cutting. The electrophotographic photosensitive member is characterized by the circumferential end section having a smooth surface on the cylindrical substrate. The photosensitive member co-operates with a peripheral member, such as a spacer or a sealing member, at the end section in performing a stable electrophotographic process.
摘要:
An electrophotographic photosensitive member comprises an electroconductive support, and at least an undercoating layer, a charge generation layer and a charge transport layer, laid successively on the electroconductive support in this order, and the undercoating layer contains N-methoxymethylated nylon 6 containing not more than 10 ppm of components having a molecular weight of not more than 1,000.
摘要:
An exposure apparatus for exposing a substrate to a light comprises a projection optical system including an optical element and configured to project a light from an original onto the substrate, an adjusting device configured to adjust at least one of a position, an orientation and a shape of the optical element, and a controller configured to obtain an adjusting amount of the optical element based on a value of an objective function relating to an optical characteristic of the projection optical system, and to control the adjusting device based on the obtained adjusting amount. The objective function includes a variable which represents an upper limit of the adjusting amount.
摘要:
The present invention provides an exposure apparatus comprising a projection optical system including an optical element of which at least one of a position, orientation, and shape can be regulated, a regulator configured to regulate the at least one of the position, orientation, and shape of the optical element, and a controller configured to calculate, using quadratic programming, a regulation amount of the optical element that minimizes a value of an objective function expressed by a first dummy variable serving as an upper limit of a linear optical characteristic value of the projection optical system, and a second dummy variable serving as an upper limit of a quadratic optical characteristic value of the projection optical system, and to control the regulator based on the calculated regulation amount.
摘要:
An exposure apparatus for exposing a substrate to a light comprises a projection optical system including an optical element and configured to project a light from an original onto the substrate, an adjusting device configured to adjust at least one of a position, an orientation and a shape of the optical element, and a controller configured to obtain an adjusting amount of the optical element based on a value of an objective function relating to an optical characteristic of the projection optical system, and to control the adjusting device based on the obtained adjusting amount. The objective function includes a variable which represents an upper limit of the adjusting amount.
摘要:
An aberration changing optical system to be used with a projection optical system of a projection exposure apparatus, includes an optical element having at least one of a cylindrical surface and a toric surface and being rotatable about and tiltable to an optical axis of the optical system. In another form, the aberration changing optical system includes an optical element having different refracting powers in two orthogonal directions or having a refracting power only in one direction, the optical element being made rotatable about and tiltable to an optical axis of the optical system.
摘要:
An electrophotographic photosensitive member comprises a conductive support and a photosensitive layer which comprises a charge generation layer and a charge transport layer, characterized in that the charge generation layer contains a polycarbonate resin, and the electrophotographic photosensitive member is electrostatically charged by applying a direct current voltage to a charging member in contact with the surface of said electrophotographic photosensitive member.
摘要:
An electrophotographic photosensitive member having a surface layer comprising a bisphenol Z-type polycarbonate resin is charged by contact charging. The charged electrophotographic photosensitive member is then subjected to imagewise exposure to form an electrostatic latent image on the photosensitive member, the thus formed electrostatic latent image on the electrophotographic photosensitive member is developed. The electrophotographic photosensitive member shows good resistance to wearing and toner sticking when subjected to electrophotographic image formation including a contact charging process.
摘要:
The present invention provides an electrophotographic photosensitive member comprising a conductive support and a photosensitive layer provided thereon, wherein the surface layer of the electrophotographic photosensitive member contains a polymer having a component unit represented by the following Formula (1) and a polymer having a component unit represented by the following Formula (2) and a component unit represented by the following Formula (3) in a certain proportion. ##STR1##