Photosensitive member, electrophotographic apparatus and image forming
method using same
    21.
    发明授权
    Photosensitive member, electrophotographic apparatus and image forming method using same 失效
    感光构件,电子照相设备和使用其的成像方法

    公开(公告)号:US5376485A

    公开(公告)日:1994-12-27

    申请号:US611642

    申请日:1990-11-13

    IPC分类号: G03G5/047 G03G5/06

    CPC分类号: G03G5/0696 G03G5/047

    摘要: An photosensitive member suitable for use in the electrophotographic apparatus of reversal development-type is formed by an electroconductive support, a charge-generation layer and a charge-transport layer disposed in this order. The charge-generation layer comprises oxytitanium phthalocyanine and the charge-transport layer is formed in a thickness of 22 microns or larger. The oxytitanium phthalocyanine is highly sensitive so that a low dark-part potential of 600V or lower (absolute) is sufficient. Because of the low dark-part potential and the thick charge transport layer, image defect, such as fog and black spots are effectively suppressed.

    摘要翻译: 适用于反转显影型的电子照相设备的感光构件由依次设置的导电性支持体,电荷产生层和电荷输送层形成。 电荷产生层包含氧钛酞菁,电荷传输层的厚度为22微米或更大。 氧钛酞菁是高度敏感的,使得600V或更低(绝对)的低暗部电位就足够了。 由于暗部电位低,电荷输送层厚,因此有效地抑制了雾点和黑点等图像缺陷。

    Electrophotographic photosensitive member and apparatus including same
    22.
    发明授权
    Electrophotographic photosensitive member and apparatus including same 失效
    电子照相感光构件及包括其的设备

    公开(公告)号:US5362588A

    公开(公告)日:1994-11-08

    申请号:US920637

    申请日:1992-07-28

    CPC分类号: G03G15/751 G03G5/02

    摘要: An electrophotographic photosensitive member is formed by a cylindrical substrate and a photosensitive layer disposed on the cylindrical substrate. The cylindrical substrate has a circumferential end section adjacent to at least one longitudinal end of the cylindrical substrate, and the circumferential end section has the photosensitive layer thereon removed and has been subjected to cutting. The electrophotographic photosensitive member is characterized by the circumferential end section having a smooth surface on the cylindrical substrate. The photosensitive member co-operates with a peripheral member, such as a spacer or a sealing member, at the end section in performing a stable electrophotographic process.

    摘要翻译: 电子照相感光构件由圆柱形基底和设置在圆柱形基底上的感光层形成。 圆筒形基板具有与圆柱形基板的至少一个纵向端部相邻的圆周端部分,并且圆周端部部分具有去除其上的感光层并且已经被切割。 电子照相感光构件的特征在于圆柱形基底上的圆周端部具有光滑的表面。 在执行稳定的电子照相处理时,感光构件在端部与外围构件例如间隔件或密封构件协作。

    Electrophotographic photosensitive member with substituted nylon
interlayer
    23.
    发明授权
    Electrophotographic photosensitive member with substituted nylon interlayer 失效
    带有取代尼龙夹层的电子照相感光构件

    公开(公告)号:US5017449A

    公开(公告)日:1991-05-21

    申请号:US468838

    申请日:1990-01-19

    IPC分类号: G03G5/06 G03G5/14

    CPC分类号: G03G5/142

    摘要: An electrophotographic photosensitive member comprises an electroconductive support, and at least an undercoating layer, a charge generation layer and a charge transport layer, laid successively on the electroconductive support in this order, and the undercoating layer contains N-methoxymethylated nylon 6 containing not more than 10 ppm of components having a molecular weight of not more than 1,000.

    摘要翻译: 电子照相感光构件包括导电载体,以及至少底涂层,电荷产生层和电荷输送层,依次铺设在导电载体上,底涂层含有不超过载体的N-甲氧基甲基化尼龙6 10ppm的分子量不大于1,000的组分。

    Exposure apparatus and device manufacturing method
    24.
    发明授权
    Exposure apparatus and device manufacturing method 失效
    曝光装置和装置制造方法

    公开(公告)号:US08634061B2

    公开(公告)日:2014-01-21

    申请号:US12787037

    申请日:2010-05-25

    IPC分类号: G03B27/52 G03F7/20

    摘要: An exposure apparatus for exposing a substrate to a light comprises a projection optical system including an optical element and configured to project a light from an original onto the substrate, an adjusting device configured to adjust at least one of a position, an orientation and a shape of the optical element, and a controller configured to obtain an adjusting amount of the optical element based on a value of an objective function relating to an optical characteristic of the projection optical system, and to control the adjusting device based on the obtained adjusting amount. The objective function includes a variable which represents an upper limit of the adjusting amount.

    摘要翻译: 用于将基板曝光的曝光装置包括:投影光学系统,包括光学元件并被配置为将来自原稿的光投射到基板上;调节装置,被配置为调节位置,取向和形状中的至少一个 以及控制器,被配置为基于与投影光学系统的光学特性相关的目标函数的值来获得光学元件的调整量,并且基于获得的调节量来控制调节装置。 目标函数包括表示调整量的上限的变量。

    Exposure apparatus and method of manufacturing device
    25.
    发明授权
    Exposure apparatus and method of manufacturing device 有权
    曝光装置及其制造方法

    公开(公告)号:US08102503B2

    公开(公告)日:2012-01-24

    申请号:US12251780

    申请日:2008-10-15

    CPC分类号: G03F7/70258

    摘要: The present invention provides an exposure apparatus comprising a projection optical system including an optical element of which at least one of a position, orientation, and shape can be regulated, a regulator configured to regulate the at least one of the position, orientation, and shape of the optical element, and a controller configured to calculate, using quadratic programming, a regulation amount of the optical element that minimizes a value of an objective function expressed by a first dummy variable serving as an upper limit of a linear optical characteristic value of the projection optical system, and a second dummy variable serving as an upper limit of a quadratic optical characteristic value of the projection optical system, and to control the regulator based on the calculated regulation amount.

    摘要翻译: 本发明提供一种曝光装置,包括投影光学系统,该投影光学系统包括能够调节位置,取向和形状中的至少一个的光学元件,被配置为调节位置,取向和形状中的至少一个的调节器 以及控制器,被配置为使用二次规划来计算最小化由作为所述光学元件的线性光学特性值的上限的第一虚拟变量表示的目标函数的值的调节量 投影光学系统和作为投影光学系统的二次光学特性值的上限的第二虚拟变量,并且基于计算出的调节量来控制调节器。

    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    26.
    发明申请
    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 失效
    曝光装置和装置制造方法

    公开(公告)号:US20100302524A1

    公开(公告)日:2010-12-02

    申请号:US12787037

    申请日:2010-05-25

    IPC分类号: G03B27/54

    摘要: An exposure apparatus for exposing a substrate to a light comprises a projection optical system including an optical element and configured to project a light from an original onto the substrate, an adjusting device configured to adjust at least one of a position, an orientation and a shape of the optical element, and a controller configured to obtain an adjusting amount of the optical element based on a value of an objective function relating to an optical characteristic of the projection optical system, and to control the adjusting device based on the obtained adjusting amount. The objective function includes a variable which represents an upper limit of the adjusting amount.

    摘要翻译: 用于将基板曝光的曝光装置包括:投影光学系统,包括光学元件并被配置为将来自原稿的光投射到基板上;调节装置,被配置为调节位置,取向和形状中的至少一个 以及控制器,被配置为基于与投影光学系统的光学特性相关的目标函数的值来获得光学元件的调整量,并且基于获得的调节量来控制调节装置。 目标函数包括表示调整量的上限的变量。

    Aberration correcting optical system
    27.
    发明授权
    Aberration correcting optical system 失效
    畸变校正光学系统

    公开(公告)号:US06924937B2

    公开(公告)日:2005-08-02

    申请号:US09438491

    申请日:1999-11-12

    IPC分类号: G02B27/00 G03F7/20 G02B13/08

    摘要: An aberration changing optical system to be used with a projection optical system of a projection exposure apparatus, includes an optical element having at least one of a cylindrical surface and a toric surface and being rotatable about and tiltable to an optical axis of the optical system. In another form, the aberration changing optical system includes an optical element having different refracting powers in two orthogonal directions or having a refracting power only in one direction, the optical element being made rotatable about and tiltable to an optical axis of the optical system.

    摘要翻译: 与投影曝光设备的投影光学系统一起使用的像差变化光学系统包括具有圆柱形表面和复曲面表面中的至少一个并且可围绕光学系统的光轴旋转并可倾斜的光学元件。 在另一种形式中,像差变化光学系统包括在两个正交方向上具有不同屈光力或仅在一个方向上具有折射能力的光学元件,该光学元件可围绕光学系统的光轴旋转并可倾斜。