METHOD OF MAKING PATTERN DATA, AND MEDIUM FOR STORING THE PROGRAM FOR MAKING THE PATTERN DATA
    21.
    发明申请
    METHOD OF MAKING PATTERN DATA, AND MEDIUM FOR STORING THE PROGRAM FOR MAKING THE PATTERN DATA 有权
    制作图案数据的方法和存储图形数据的程序的介质

    公开(公告)号:US20090241086A1

    公开(公告)日:2009-09-24

    申请号:US12405265

    申请日:2009-03-17

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5068 G03F1/36 G03F1/68

    摘要: A method of making pattern data of a photomask pattern includes: the processes of adding, to each of first cells, information of the first cell higher than the first cell on the basis of a hierarchical structure; selecting, from the first cells included in one level of the hierarchical structure, the first cell identical to one of the first cells included in a level higher than the one level and the first cell placed inside two or more of the first cells included in a level immediately higher than the one level, and forming a cell group with the selected first cells; making pattern data of the first cells not included in the cell group in consideration of the optical proximity effect and forming a fourth cell group with second cells including the pattern data; and replacing the first cells with the corresponding second cells in input data.

    摘要翻译: 制作光掩模图案的图案数据的方法包括:基于层次结构向第一单元中的每一个添加高于第一单元的第一单元的信息的处理; 从包括在所述分级结构的一个级别中的所述第一个单元中选择与包括在高于所述一个级别的级别中的所述第一单元格中的一个单元相同的第一单元格,以及放置在包括在所述第一单元格中的所述第一单元格中的所述第一单元格内的所述第一单元格 水平立即高于一个水平,并形成具有所选择的第一个细胞的细胞组; 考虑到光学邻近效应,使未包含在单元组中的第一单元的图形数据形成,并且使第二单元组具有包括图形数据的第二单元; 并在输入数据中用相应的第二个单元替换第一个单元。

    Image forming apparatus and power supply
    22.
    发明授权
    Image forming apparatus and power supply 有权
    成像设备和电源

    公开(公告)号:US07558501B2

    公开(公告)日:2009-07-07

    申请号:US11333484

    申请日:2006-01-17

    IPC分类号: G03G15/00 G03G15/16

    摘要: An image forming apparatus includes a high-voltage power supply having a piezoelectric transformer. The power supply includes a positive output voltage generation circuit and a negative output voltage generation circuit. Each of the positive output voltage generation circuit and the negative output voltage generation circuit includes a piezoelectric transformer, a piezoelectric transformer driving circuit, an output voltage detection circuit, and a drive control circuit for outputting a control signal for controlling the piezoelectric transformer driving circuit using a signal from the output voltage detection circuit and an output voltage setting signal for setting an output voltage. The positive output voltage generation circuit and the negative output voltage generation circuit are simultaneously turned on when the output polarity of the high-voltage power supply with a piezoelectric transformer is switched.

    摘要翻译: 图像形成装置包括具有压电变压器的高压电源。 电源包括正输出电压产生电路和负输出电压产生电路。 正输出电压产生电路和负输出电压产生电路中的每一个包括压电变压器,压电变压器驱动电路,输出电压检测电路和驱动控制电路,用于输出用于控制压电变压器驱动电路的控制信号,所述控制信号使用 来自输出电压检测电路的信号和用于设定输出电压的输出电压设定信号。 当切换具有压电变压器的高电压电源的输出极性时,正输出电压产生电路和负输出电压产生电路同时导通。

    Engine blow-by gas returning apparatus
    23.
    发明申请
    Engine blow-by gas returning apparatus 审中-公开
    发动机窜气回送装置

    公开(公告)号:US20090090337A1

    公开(公告)日:2009-04-09

    申请号:US12230092

    申请日:2008-08-22

    IPC分类号: F02B25/06

    摘要: A blow-by gas returning apparatus is arranged to allow blow-by gas leaking from a combustion chamber of an engine into a crank chamber to flow in an intake passage through a returning passage, and to regulate a flow rate of the blow-by gas by a PCV valve placed in the returning passage. A supercharger is placed in the intake passage. The PCV valve is adapted to change a position of the valve element by electromagnetic force to change a passage opening area. A check valve is placed integral with the PCV valve in the returning passage between the valve element of the PCV valve and the intake passage. The check valve is arranged to inhibit back-flow of the gas from the intake passage.

    摘要翻译: 窜气回送装置被配置为允许从发动机的燃烧室泄漏到曲柄室的窜气通过返回通道在进气通道中流动,并且调节窜气的流量 通过放置在返回通道中的PCV阀。 增压器放置在进气通道中。 PCV阀适于通过电磁力改变阀元件的位置以改变通道开口面积。 止回阀与PCV阀一体放置在PCV阀的阀元件和进气通道之间的返回通道中。 止回阀布置成阻止气体从进气通道的回流。

    Glass substrate for information recording medium and method for producing same
    25.
    发明授权
    Glass substrate for information recording medium and method for producing same 有权
    信息记录介质用玻璃基板及其制造方法

    公开(公告)号:US07500904B2

    公开(公告)日:2009-03-10

    申请号:US10530644

    申请日:2003-12-25

    IPC分类号: B24B1/00

    摘要: A glass substrate for an information recording medium is manufactured by polishing the surface of a raw material glass plate. The polishing of the raw material glass plate is divided into a step for performing a first polishing process to roughly polish the surface of the raw material glass plate to be smooth and a step for performing a second polishing process to finely polish the surface of the roughly polished raw material glass plate to be smoother. The first polishing process uses a polishing pad made of a synthetic resin foam and slides the polishing pad on the raw material glass plate surface while supplying a polishing agent to roughly polish the surface. A pad dressing process is performed on the polishing pad before being used in the first polishing process. The pad dressing process polishes the surface of the polishing pad by sliding the polishing pad on a pad dresser including abrasive grains.

    摘要翻译: 通过对原料玻璃板的表面进行研磨来制造信息记录介质用玻璃基板。 将原料玻璃板的研磨分为进行第一研磨工序的步骤,以将原料玻璃板的表面大致抛光为光滑的工序,以及进行第二研磨工序的步骤,以粗略地研磨粗面玻璃的表面 抛光原料玻璃板更平滑。 第一抛光工艺使用由合成树脂泡沫制成的抛光垫,并将抛光垫在原料玻璃板表面上滑动,同时提供抛光剂以大致抛光表面。 在第一抛光工艺中使用之前,在抛光垫上进行衬垫修整处理。 抛光垫修整工艺通过将抛光垫滑动到包括磨料颗粒的砂轮修整器上来抛光抛光垫的表面。

    Method of polishing a glass substrate for use as an information recording medium
    27.
    发明授权
    Method of polishing a glass substrate for use as an information recording medium 有权
    抛光用作信息记录介质的玻璃基板的方法

    公开(公告)号:US07429209B2

    公开(公告)日:2008-09-30

    申请号:US10530647

    申请日:2003-12-25

    IPC分类号: B24B1/00

    CPC分类号: B24B37/042 G11B5/8404

    摘要: An information recording medium glass substrate manufactured by polishing the surface of a raw material glass plate. The polishing is divided into two steps, a step for performing a first polishing process to roughly polish the surface of the raw material glass plate to be smooth and a step for performing a second polishing process to finely polish the surface of the roughly polished raw material glass plate to be smoother. The second polishing process, using a polishing pad made of foam, is divided into two stages, pre-polishing with a polishing agent including abrasive grains of cerium oxide and post-polishing with a polishing agent including abrasive grains of silicon oxide. A rinsing process is performed between the pre-polishing and the post-polishing to rinse the raw material glass plate after the pre-polishing with a washing liquid to wash away the abrasive grains collected in the polishing pad in pre-polishing during the rinsing process.

    摘要翻译: 通过对原料玻璃板的表面进行研磨而制造的信息记录介质玻璃基板。 抛光分为两个步骤,用于执行第一抛光处理以粗糙地将原料玻璃板的表面抛光为光滑的步骤以及用于进行第二抛光工艺以精细抛光粗抛光原料的表面的步骤 玻璃板更平滑。 使用由泡沫制成的抛光垫的第二抛光工艺被分为两个阶段,用包括氧化铈磨粒的抛光剂进行预抛光,并用包括氧化硅磨粒的抛光剂进行后抛光。 在预抛光和后抛光之间进行漂洗处理,以在用抛光垫预先抛光后冲洗原料玻璃板,以便在漂洗过程中预抛光时洗去在抛光垫中收集的磨料颗粒 。

    Method for real time monitoring and verifying optical proximity correction model and method
    28.
    发明授权
    Method for real time monitoring and verifying optical proximity correction model and method 有权
    用于实时监测和验证光学邻近校正模型和方法的方法

    公开(公告)号:US07392502B2

    公开(公告)日:2008-06-24

    申请号:US11169616

    申请日:2005-06-30

    IPC分类号: G06F17/50

    摘要: This invention relates to a method for real time monitoring and verifying optical proximity correction (OPC) models and methods in production. Prior to OPC is performed on the integrated circuit layout, a model describing the optical, physical and chemical processes involving lithography should be obtained accurately and precisely. In general, the model is calibrated using the measurements obtained by running wafers through the same lithography, patterning, and etch processes. In this invention, a novel real time method for verifying and monitoring the calibrated model on a production or monitor wafer is presented: optical proximity corrected (OPC-ed) test and verification structures are placed on scribe lines or cut lines of the production or monitor wafer, and with pre-determined schedule, the critical dimensions and images of these test and verification structures are monitored across wafer and across exposure field.

    摘要翻译: 本发明涉及一种用于实时监测和验证生产中的光学邻近校正(OPC)模型和方法的方法。 在对集成电路布局进行OPC之前,应准确准确地描述涉及光刻的光学,物理和化学过程的模型。 通常,使用通过相同的光刻,图案化和蚀刻工艺运行晶片获得的测量来校准模型。 在本发明中,提出了一种用于在生产或监控晶圆上验证和监测校准模型的新型实时方法:将光学邻近校正(OPC-ed)测试和验证结构放置在生产或监视器的划线或切割线上 晶圆,并且具有预定的时间表,这些测试和验证结构的关键尺寸和图像在晶片和曝光场之间进行监控。

    LIGHT EMITTING MATERIAL AND LIGHT EMITTING DEVICE
    30.
    发明申请
    LIGHT EMITTING MATERIAL AND LIGHT EMITTING DEVICE 有权
    发光材料和发光装置

    公开(公告)号:US20080009627A1

    公开(公告)日:2008-01-10

    申请号:US11764436

    申请日:2007-06-18

    IPC分类号: H01J1/63 C07D217/02

    摘要: Provided is a light emitting material of which a light emitting device having high luminous efficiency and high stability and capable of being provided at a low cost can be formed. A light emitting material includes the following partial structural formula (1): wherein at least one of R1 to R10 represents a substituent except a hydrogen atom, a total number of benzene ring structures in R1 to R10 is 3 or more, and R1 to R10 include a trifluoromethyl group, or a linear, branched, or cyclic alkyl or alkoxyl group having 2 or more carbon atoms a hydrogen atom of which may be substituted by a halogen atom.

    摘要翻译: 提供了可以形成具有高发光效率和高稳定性并能够以低成本提供的发光器件的发光材料。 发光材料包括以下部分结构式(1):其中R 1至R 10中的至少一个表示除氢原子之外的取代基,总数 R 1至R 10中的苯环结构为3个或更多个,R 1至R 10中的苯环结构包括 三氟甲基或具有2个以上碳原子的直链,支链或环状的烷基或烷氧基,其氢原子可被卤素原子取代。