公开(公告)号：US20060119821A1

公开(公告)日：2006-06-08

申请号：US11246036

申请日：2005-10-06

申请人： Miwako Ando ,  Yoshinori Ohsaki

发明人： Miwako Ando ,  Yoshinori Ohsaki

IPC分类号： G03B27/52

CPC分类号： G03F7/706

摘要： Provided is an exposure apparatus including a projection optical system for projecting an exposure pattern onto an object to be exposed, a measurement device for measuring an optical performance of the projection optical system by guiding light to the projection optical system through a measurement pattern to detect interference fringes formed by the light emitted from the projection optical system, and an adjustment portion for adjusting a numerical aperture of the light that illuminates the measurement pattern, in which the adjustment portion adjusts the numerical aperture so that the visibility of the interference fringes V, which is defined as V=(Imax−Imin)/(Imax+Imin), is equal to or more than 0.3, where Imax represents the maximum amount of light of the interference fringes, and Imin represents the minimum amount of light of the interference fringes, when the measurement device measures an optical performance of the projection optical system.

摘要翻译： 本发明提供一种曝光装置，包括用于将曝光图案投影到被曝光物体上的投影光学系统，用于通过测量图案将光引导到投影光学系统以检测干涉来测量投影光学系统的光学性能的测量装置 由投影光学系统发射的光形成的条纹以及用于调节照亮测量图案的光的数值孔径的调节部分，其中调节部分调节数值孔径，使得干涉条纹V的可见度，其中 被定义为V =（I max max -I min min）/（I max max + I min min），是 等于或大于0.3，其中I 最大表示干涉条纹的最大光量，I min表示干涉条纹的最小光量，当 测量装置测量光的性能 e投影光学系统。

公开(公告)号：US20060044536A1

公开(公告)日：2006-03-02

申请号：US11219508

申请日：2005-09-01

申请人： Yoshinori Ohsaki

发明人： Yoshinori Ohsaki

IPC分类号： G03B27/68

CPC分类号： G03F7/706

摘要： An exposure apparatus includes a projection optical system for projecting an exposure pattern, onto an object to be exposed, and a measuring apparatus for measuring, as an interference fringe, optical performance of the projection optical system, wherein the measuring apparatus includes an optical element having opposing first and second surfaces, wherein the first surface has a first measurement pattern, and the second surface has a second measurement pattern and is closer to the projection optical system than the first measurement pattern, and wherein the measuring apparatus introduces light into the projection optical system via first and second measurement patterns.

摘要翻译： 曝光装置包括：投影光学系统，用于将曝光图案投影到待曝光的物体上;以及测量装置，用于测量投影光学系统的光学性能作为干涉条纹，其中测量装置包括具有 相对的第一和第二表面，其中第一表面具有第一测量图案，并且第二表面具有第二测量图案，并且比第一测量图案更靠近投影光学系统，并且其中测量设备将光引入投影光学 系统经由第一和第二测量模式。

公开(公告)号：US20050146693A1

公开(公告)日：2005-07-07

申请号：US11008379

申请日：2004-12-09

申请人： Yoshinori Ohsaki

发明人： Yoshinori Ohsaki

IPC分类号： G03B27/52 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/70341 ,  G03F9/7096

摘要： An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed, a reference mark that serves as a reference for an alignment between the reticle and the object, a first fluid that has a refractive index of 1 or greater, and fills a space between at least part of the projection optical system and the object and a space between at least part of the projection optical system and the reference mark, and an alignment mechanism for aligning the object by using the projection optical system and the first fluid.

摘要翻译： 曝光装置包括：投影光学系统，用于将掩模版上的图案投影到待曝光的物体上;基准标记，其用作参考标号，用于对准所述标线片和所述物体;第一流体，其折射率为1 以上，并且填充投影光学系统的至少一部分与物体之间的空间以及投影光学系统的至少一部分与基准标记之间的空间，以及通过使用投影光学系统对准物体的对准机构 和第一流体。

公开(公告)号：US06649484B2

公开(公告)日：2003-11-18

申请号：US09803969

申请日：2001-03-13

申请人： Yoshinori Ohsaki

发明人： Yoshinori Ohsaki

IPC分类号： H01L2176

CPC分类号： G03F9/7046 ,  G03F9/7049

摘要： A method of measuring a position of a mark in a measurement direction. The method includes a detecting step of detecting a change in information regarding the position of the mark in the measurement direction by moving the mark in another direction different from the measurement direction, a selecting step of selecting a measurement condition on the basis of the change in the information, and a measuring step of measuring the position of the mark with the measurement condition selected in the selecting step.

摘要翻译： 测量标记在测量方向上的位置的方法。 该方法包括检测步骤，通过在与测量方向不同的另一个方向上移动标记来检测关于标记在测量方向上的位置的信息的变化;选择步骤，基于变化来选择测量条件 所述信息以及在所述选择步骤中选择的所述测量条件来测量所述标记的位置的测量步骤。

公开(公告)号：US06278514B1

公开(公告)日：2001-08-21

申请号：US09472994

申请日：1999-12-28

申请人： Yoshinori Ohsaki

发明人： Yoshinori Ohsaki

IPC分类号： G03B2742

CPC分类号： G03F7/706

摘要： An exposure apparatus includes a stage on which a substrate to be exposed is provided, a projection optical system for projecting a pattern onto the substrate and an aberration detection system for forming an image of a pattern of a mask formed by light passed through the projection optical system plural times, for detecting an intensity distribution of the image of the pattern of the mask, and for detecting a wavefront aberration of the projection optical system on the basis of the detected intensity distribution.

摘要翻译： 曝光装置包括：设置有要曝光的基板的台，用于将图案投影到基板上的投影光学系统和用于形成通过投影光学的光形成的掩模图案的像差检测系统 系统多次，用于检测掩模的图案的图像的强度分布，并且用于基于检测到的强度分布来检测投影光学系统的波前像差。

公开(公告)号：US6040909A

公开(公告)日：2000-03-21

申请号：US70741

申请日：1998-05-01

申请人： Masanobu Hasegawa ,  Minoru Yoshii ,  Yoshinori Ohsaki

发明人： Masanobu Hasegawa ,  Minoru Yoshii ,  Yoshinori Ohsaki

IPC分类号： G01B11/00 ,  G01B11/26 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  G01B11/14

CPC分类号： G03F7/70691 ,  G03F9/7026

摘要： A detecting system for detecting positional information related to a surface of an object. The detecting system includes a variable pattern generator for projecting an arbitrary pattern image on the surface of the object, a light projecting optical system for projecting a pattern, defined by the variable pattern generator, to the surface of the object along an oblique direction, a light receiving optical system for directing light from an image of the pattern and a light receiving element for detecting the light directed by the light receiving optical system. Surface position information about the surface of the object is detected on the basis of the detection by the light receiving element.

摘要翻译： 一种检测与物体表面相关的位置信息的检测系统。 该检测系统包括用于将任意图案图像投射在物体表面上的可变图案发生器，用于将由可变图案发生器限定的图案沿着倾斜方向投射到物体表面的投光光学系统， 用于引导来自图案的图像的光的光接收光学系统和用于检测由光接收光学系统引导的光的光接收元件。 基于受光元件的检测来检测关于物体表面的表面位置信息。

公开(公告)号：US08400612B2

公开(公告)日：2013-03-19

申请号：US12793873

申请日：2010-06-04

申请人： Kazuki Yamamoto ,  Yoshinori Ohsaki

发明人： Kazuki Yamamoto ,  Yoshinori Ohsaki

IPC分类号： G03B27/68

CPC分类号： G01B9/02083 ,  G01B9/02039 ,  G01B11/2441 ,  G01J9/02 ,  G03B27/42 ,  G03F7/706

摘要： A measurement apparatus, which measures a wavefront aberration of an optical system to be measured, comprises: a calculation unit configured to calculate the wavefront aberration based on an interference fringe generated by light which passed through the optical system to be measured; and a determination unit configured to calculate an evaluation value indicating a wavefront state based on the wavefront aberration calculated by the calculation unit, and determine the calculated wavefront aberration as the wavefront aberration of the optical system if the evaluation value falls within an allowable range.

摘要翻译： 测量要测量的光学系统的波前像差的测量装置包括：计算单元，被配置为基于通过待测量的光学系统的光产生的干涉条纹来计算波前像差; 以及确定单元，被配置为基于由所述计算单元计算的所述波前像差来计算指示波前状态的评估值，并且如果所述评估值在允许范围内，则将所计算的波前像差确定为所述光学系统的波面像差。

公开(公告)号：US08294875B2

公开(公告)日：2012-10-23

申请号：US12169734

申请日：2008-07-09

申请人： Yoshinori Ohsaki

发明人： Yoshinori Ohsaki

IPC分类号： G03B27/68 ,  G03B27/52 ,  G03B27/74 ,  G01B11/02

CPC分类号： G03F7/7085 ,  G03B27/32 ,  G03B27/72 ,  G03F7/706

摘要： The present invention provides an exposure apparatus comprising a projection optical system configured to project a pattern of a reticle onto a substrate, a stage configured to move the substrate; and a sensor unit which is arranged on the stage and configured to receive light having passed through the projection optical system, the sensor unit including an aperture plate which is configured to be used in measuring different optical performances, and on which a plurality of aperture patterns with different shapes or different sizes are formed, and a photoelectric conversion device configured to photoelectrically convert the light beams from the plurality of aperture patterns.

摘要翻译： 本发明提供一种曝光装置，包括：投影光学系统，被配置为将掩模版的图案投影到基板上;阶段，被配置为移动所述基板; 以及传感器单元，其布置在所述台上并且被配置为接收已经穿过所述投影光学系统的光，所述传感器单元包括孔径板，所述孔板被配置为用于测量不同的光学性能，并且多个孔径图案 形成不同形状或不同尺寸的光电转换装置，以及被配置为对来自多个孔径图案的光束进行光电转换的光电转换装置。

公开(公告)号：US07787103B2

公开(公告)日：2010-08-31

申请号：US11873724

申请日：2007-10-17

申请人： Shinichiro Hirai ,  Yoshinori Ohsaki ,  Yoshiyuki Kuramoto

发明人： Shinichiro Hirai ,  Yoshinori Ohsaki ,  Yoshiyuki Kuramoto

IPC分类号： G03B27/54 ,  G03B27/52

CPC分类号： G03B27/54 ,  G03F7/706 ,  G03F7/7085

摘要： A projection exposure apparatus 100 projects the pattern of an original 6 onto a substrate 7 via a projection optical system PL. The projection exposure apparatus 100 includes an original stage 5 which holds the original 6, a substrate stage 8 which holds the substrate 7, and a measurement unit. The measurement unit includes a Fizeau interferometer IF including an optical unit 17 and mirror 22. The optical unit 17 includes a Fizeau surface which splits a light beam into a reference light beam and a test light beam. The mirror 22 reflects the test light beam having passed through the projection optical system PL. The optical unit 17 is mounted on the original stage 5. The mirror 22 is mounted on the substrate stage 8.

摘要翻译： 投影曝光装置100通过投影光学系统PL将原稿6的图案投影到基板7上。 投影曝光装置100包括保持原稿6的原稿台5，保持基板7的基板台8和测量单元。 测量单元包括包括光学单元17和反射镜22的Fizeau干涉仪IF。光学单元17包括将光束分成参考光束和测试光束的Fizeau表面。 反射镜22反射穿过投影光学系统PL的测试光束。 光学单元17安装在原始台5上。反射镜22安装在基板台8上。

公开(公告)号：US20080036990A1

公开(公告)日：2008-02-14

申请号：US11835035

申请日：2007-08-07

申请人： Shinichiro Hirai ,  Tetsuya Mori ,  Seiya Miura ,  Yoshinori Ohsaki

发明人： Shinichiro Hirai ,  Tetsuya Mori ,  Seiya Miura ,  Yoshinori Ohsaki

IPC分类号： G03B27/74

CPC分类号： G03F9/7034 ,  G03F9/7026 ,  G03F9/7088

摘要： An exposure apparatus is disclosed. The apparatus comprises an image sensor, a measurement optical system configured to guide measurement light to obliquely enter the projection optical system, and further guide the measurement light returned from the projection optical system to the image sensor, and a control unit configured to calculate surface position information of the substrate based on the output from the image sensor. The control unit calculates the surface position information of the substrate based on an interval between the image, of a mark arranged on the original stage, formed by the measurement light which has passed through the mark and the image of the mark formed by the measurement light reflected by the mark.

摘要翻译： 公开了一种曝光装置。 该装置包括图像传感器，测量光学系统，被配置为引导测量光倾斜地进入投影光学系统，并且进一步将从投影光学系统返回的测量光引导到图像传感器;以及控制单元，被配置为计算表面位置 基于来自图像传感器的输出的基板的信息。 控制单元基于由穿过标记的测量光形成的原稿台上的标记的图像与由测量光形成的标记的图像之间的间隔来计算基板的表面位置信息 被标记所反映。