Pulsed high-voltage silicon quantum dot fluorescent lamp
    21.
    发明授权
    Pulsed high-voltage silicon quantum dot fluorescent lamp 有权
    脉冲高压硅量子点荧光灯

    公开(公告)号:US07883387B2

    公开(公告)日:2011-02-08

    申请号:US11898344

    申请日:2007-09-11

    IPC分类号: H01J9/00 B05D5/06 B05D5/12

    CPC分类号: H01J9/223 H01J63/06

    摘要: In a method for making a pulsed high-voltage silicon quantum dot fluorescent lamp, an excitation source is made by providing a first substrate, coating the first substrate with a buffer layer of titanium, coating the buffer layer with a catalytic layer of a material selected from a group consisting of nickel, aluminum and platinum and providing a plurality of nanometer discharging elements one the catalytic layer. An emission source is made by providing a second substrate, coating the second substrate with a transparent electrode film of titanium nitride and coating the transparent electrode film with a silicon quantum dot fluorescent film comprising silicon quantum dots. A pulsed high-voltage source is provided between the excitation source and the emission source to generate a pulsed field-effect electric field to cause the nanometer discharging elements to release electrons and accelerate the electrons to excite the silicon quantum dots to emit pulsed visible light.

    摘要翻译: 在制造脉冲高压硅量子点荧光灯的方法中,通过提供第一衬底,用钛的缓冲层涂覆第一衬底来制造激发源,用选择的材料的催化层涂覆缓冲层 由镍,铝和铂组成的一组,并提供多个纳米排放元件,一个催化层。 通过提供第二基板来制造发光源,用氮化钛的透明电极膜涂覆第二基板,并且用包含硅量子点的硅量子点荧光膜涂覆透明电极膜。 在激发源和发射源之间提供脉冲高压源以产生脉冲场效应电场,以使纳米放电元件释放电子并加速电子以激发硅量子点发射脉冲的可见光。

    White-light fluorescent lamp having luminescence layer with silicon quantum dots
    22.
    发明授权
    White-light fluorescent lamp having luminescence layer with silicon quantum dots 失效
    具有硅量子点的发光层的白光荧光灯

    公开(公告)号:US07569984B2

    公开(公告)日:2009-08-04

    申请号:US11454949

    申请日:2006-06-19

    IPC分类号: H01J1/62 H01J9/24

    摘要: A structure is formed by putting glass plates between a luminescence generating device and an electron emitting device so that a vacuum is formed in between. After in putting a high-voltage, an electron beam is emitted from the electron emitting device using low power. In the end, silicon quantum dots in the luminescence generating device are excited to generate a white light. The present invention has a good optoelectronic transformation efficiency.

    摘要翻译: 通过将玻璃板置于发光装置和电子发射装置之间形成一种结构,从而在其间形成真空。 放置高电压后,使用低功率的电子发射装置发射电子束。 最后,发光发生器件中的硅量子点被激发以产生白光。 本发明具有良好的光电转换效率。

    WHITE-LIGHT FLUORESCENT LAMP HAVING LUMINESCENCE LAYER WITH SILICON QUANTUM DOTS
    23.
    发明申请
    WHITE-LIGHT FLUORESCENT LAMP HAVING LUMINESCENCE LAYER WITH SILICON QUANTUM DOTS 失效
    具有硅量子点的发光层的白色荧光灯

    公开(公告)号:US20090167146A1

    公开(公告)日:2009-07-02

    申请号:US11454949

    申请日:2006-06-19

    IPC分类号: H01J1/62

    摘要: A structure is formed by putting glass plates between a luminescence generating device and an electron emitting device so that a vacuum is formed in between. After in putting a high-voltage, an electron beam is emitted from the electron emitting device using low power. In the end, silicon quantum dots in the luminescence generating device are excited to generate a white light. The present invention has a good optoelectronic transformation efficiency.

    摘要翻译: 通过将玻璃板置于发光装置和电子发射装置之间形成一种结构,从而在其间形成真空。 放置高电压后,使用低功率的电子发射装置发射电子束。 最后,发光发生器件中的硅量子点被激发以产生白光。 本发明具有良好的光电转换效率。

    Silicon-rich-oxide white light photodiode
    24.
    发明授权
    Silicon-rich-oxide white light photodiode 失效
    富硅氧化物白光光电二极管

    公开(公告)号:US07569864B2

    公开(公告)日:2009-08-04

    申请号:US11416146

    申请日:2006-05-03

    IPC分类号: H01L31/12 H01L31/00

    CPC分类号: H01L33/502 H01L33/0079

    摘要: A white light photodiode has a film layer and an ultraviolet (UV) photodiode. The film layer is made of an oxide rich in silicon; and is formed through a chemical vapor deposition. A white light can be generated by exciting the film layer with a UV light from the UV photodiode.

    摘要翻译: 白光光电二极管具有膜层和紫外(UV)光电二极管。 膜层由富含硅的氧化物制成; 并通过化学气相沉积形成。 可以通过用UV光电二极管的紫外线激发膜层来产生白光。

    Method for fabricating crystalline silicon thin films
    27.
    发明申请
    Method for fabricating crystalline silicon thin films 失效
    制造晶体硅薄膜的方法

    公开(公告)号:US20080118662A1

    公开(公告)日:2008-05-22

    申请号:US11603043

    申请日:2006-11-22

    IPC分类号: C23C16/453

    CPC分类号: C23C16/24 C23C16/56

    摘要: An amorphous silicon (Si) film is taken to form a metal silicide of Si—Al(aluminum) under a high temperature. Al atoms is diffused into the amorphous Si film for forming the metal silicide of Si—Al as nucleus site. Then through heating and annealing, a microcrystalline or nano-crystalline silicon thin film is obtained. The whole process is only one process and is done in only one reacting chamber.

    摘要翻译: 取非晶硅(Si)膜在高温下形成Si-Al(铝)的金属硅化物。 Al原子扩散到非晶Si膜中,用于形成Si-Al的金属硅化物作为核部位。 然后通过加热和退火,获得微晶或纳米晶硅薄膜。 整个过程只是一个过程,只在一个反应​​室中完成。

    Method for fabricating crystalline silicon thin films
    29.
    发明授权
    Method for fabricating crystalline silicon thin films 失效
    制造晶体硅薄膜的方法

    公开(公告)号:US07485560B2

    公开(公告)日:2009-02-03

    申请号:US11603043

    申请日:2006-11-22

    IPC分类号: H01L21/44

    CPC分类号: C23C16/24 C23C16/56

    摘要: An amorphous silicon (Si) film is taken to form a metal silicide of Si—Al(aluminum) under a high temperature. Al atoms is diffused into the amorphous Si film for forming the metal silicide of Si—Al as nucleus site. Then through heating and annealing, a microcrystalline or nano-crystalline silicon thin film is obtained. The whole process is only one process and is done in only one reacting chamber.

    摘要翻译: 取非晶硅(Si)膜在高温下形成Si-Al(铝)的金属硅化物。 Al原子扩散到非晶Si膜中,用于形成Si-Al的金属硅化物作为核部位。 然后通过加热和退火,获得微晶或纳米晶硅薄膜。 整个过程只是一个过程,只在一个反应​​室中完成。