公开(公告)号：US11569628B2

公开(公告)日：2023-01-31

申请号：US17268778

申请日：2019-08-05

Applicant: ASML Netherlands B. V.

Inventor： Herman Philip Godfried ,  Wilhelmus Patrick Elisabeth Maria Op 'T Root

IPC: G03F7/20 ,  H01S3/00 ,  G02B27/14 ,  G02F1/01

Abstract: An apparatus (10) for increasing a pulse length of a pulsed radiation beam, the apparatus comprising: a beam splitter (16) configured to split an input radiation beam (18) into a first beam (24) and a second beam (22); an optical arrangement (12, 14), wherein the beam splitter and the optical arrangement are configured such that at least a portion of the first beam is recombined with the second beam into a modified beam after an optical delay of the first beam caused by the optical arrangement; and at least one optical element (30) in an optical path of the first beam, the at least one optical element configured such that the phase of different parts of a wavefront of the first beam is varied to reduce coherence between the first beam and the second beam.

公开(公告)号：US20200241433A1

公开(公告)日：2020-07-30

申请号：US16639566

申请日：2018-07-02

Applicant: ASML Netherlands B,V.

Inventor： Simon Reinald HUISMAN ,  Sebastianus Adrianus GOORDEN ,  Irwan Dani SETIJA

IPC: G03F9/00

Abstract: An apparatus for determining a characteristic of a feature of an object comprises: a measurement radiation source; a measurement radiation delivery system; a measurement system; a pump radiation source; and a pump radiation delivery system. The measurement radiation source is operable to produce measurement radiation and the measurement radiation delivery system is operable to irradiate at least a part of a top surface of the object with the measurement radiation. The measurement system is operable to receive at least a portion of the measurement radiation scattered from the top surface and is further operable to determine a characteristic of the feature of the object from at least a portion of the measurement radiation scattered from the top surface. The pump radiation source is operable to produce pump radiation and the pump radiation delivery system is operable to irradiate at least a part of the top surface of the object with the pump radiation so as to produce a mechanical response (for example an acoustic wave) in the object.

公开(公告)号：US20200225591A1

公开(公告)日：2020-07-16

申请号：US16633419

申请日：2018-07-18

Applicant: ASML Netherlands B,V. ,  ASML Holding N.V.

Inventor： Han-Kwang NIENHUYS ,  Ronald Peter ALBRIGHT ,  Jacob BRINKERT ,  Yang-Shan HUANG ,  Hendrikus Gijsbertus SCHIMMEL ,  Antonie Hendrik VERWEIJ

IPC: G03F7/20 ,  B01D45/08 ,  B01D45/10

Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.

公开(公告)号：US20180314169A1

公开(公告)日：2018-11-01

申请号：US16026195

申请日：2018-07-03

Applicant: ASML Netherlands B. V.

Inventor： Timotheus Franciscus SENGERS ,  Marcus Adrianus Van De Kerkhof ,  Mark Kroon ,  Kees Van Weert

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70775 ,  G03F7/70058 ,  G03F7/70191 ,  G03F7/70341 ,  G03F7/7055 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.

公开(公告)号：US20180231896A1

公开(公告)日：2018-08-16

申请号：US15893305

申请日：2018-02-09

Applicant: ASML NETHERLANDS B. V.

Inventor： Jun Ye ,  Yu Cao

IPC: G03F7/20

Abstract: A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring the imaging results; imaging the test pattern utilizing the first lithography system and measuring the imaging results; calibrating the imaging model utilizing the imaging results corresponding to the reference lithography system, where the calibrated imaging model has a first set of parameter values; tuning the calibrated imaging model utilizing the imaging results corresponding to the first lithography system, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first lithography system based on a difference between the first set of parameter values and the second set of parameter values.

公开(公告)号：US20160154322A1

公开(公告)日：2016-06-02

申请号：US15003768

申请日：2016-01-21

Applicant: ASML Netherlands B. V.

Inventor： Yang-Shan Huang ,  Theodorus Petrus Maria Cadee

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70725 ,  G03F7/70758

Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.

公开(公告)号：US07834980B2

公开(公告)日：2010-11-16

申请号：US11642982

申请日：2006-12-21

Applicant: Johannes Jacobus Matheus Baselmans ,  Andrey S. Tychkov

Inventor： Johannes Jacobus Matheus Baselmans ,  Andrey S. Tychkov

IPC: G03B27/42

CPC classification number: G03F7/70358 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70583

Abstract: A method of lithography is disclosed that includes conditioning a radiation beam using an illumination system of a lithographic apparatus, imparting the radiation beam with a pattern in its cross-section, and projecting the patterned beam of radiation as an exposure field onto a substrate, wherein a periodic interference pattern is present in the exposure field, and relative motion is established between the substrate and a component in the illumination system, such that the periodic interference pattern is displaced in a direction which is not parallel to a direction of repetition of the periodic interference pattern.

Abstract translation: 公开了一种光刻方法，其包括使用光刻设备的照明系统来调节辐射束，使辐射束在其横截面上具有图案，并将图案化的辐射束作为曝光场投射到衬底上，其中 在曝光场中存在周期性干涉图案，并且在基板和照明系统中的部件之间建立相对运动，使得周期性干涉图案在不平行于周期性重复方向的方向上移位 干扰模式。

公开(公告)号：US20080218712A1

公开(公告)日：2008-09-11

申请号：US12153245

申请日：2008-05-15

Applicant: Rene Theodorus Petrus Compen ,  Joost Jeroen Ottens

Inventor： Rene Theodorus Petrus Compen ,  Joost Jeroen Ottens

IPC: G03B27/52

CPC classification number: G03F7/70925 ,  G03F7/707

Abstract: An immersion lithographic apparatus includes a cleaning system for cleaning a component in the immersion lithographic apparatus in situ. The cleaning system is arranged to provide a cleaning environment in proximity of a predetermined position on a component to be cleaned. The system is also arranged to provide the cleaning environment substantially independent of a type of contamination present at the predetermined position.

Abstract translation: 浸没式光刻设备包括用于原位清洗浸没式光刻设备中的部件的清洁系统。 清洁系统被布置成在要清洁的部件上的预定位置附近提供清洁环境。 该系统还布置成提供基本上与在预定位置处存在的污染物类型无关的清洁环境。

公开(公告)号：US20080187845A1

公开(公告)日：2008-08-07

申请号：US11701517

申请日：2007-02-02

Applicant: Richard Johannes Franciscus Van Haren ,  Ewoud Vreugdenhil

Inventor： Richard Johannes Franciscus Van Haren ,  Ewoud Vreugdenhil

IPC: G03F7/004

CPC classification number: G03F7/405 ,  G03F7/0757 ,  G03F7/091 ,  G03F7/11

Abstract: A method of providing a pattern on a substrate is disclosed. The method includes providing a layer of photoresist on the substrate, providing a layer of top coating over the layer of photoresist, lithographically exposing the photoresist layer and developing the photoresist to form a structure, covering the structure with a coating layer, inducing a chemical reaction between the photoresist and the coating layer, which reaction does not occur in the top coating, to form regions of modified coating layer, and removing unmodified coating layer to leave behind a patterned structure formed from the regions of modified coating layer.

Abstract translation: 公开了一种在衬底上提供图案的方法。 该方法包括在衬底上提供一层光致抗蚀剂，在光致抗蚀剂层上提供顶层涂层，光刻曝光光致抗蚀剂层并显影光致抗蚀剂以形成结构，用涂层覆盖该结构，引起化学反应 在光致抗蚀剂和涂层之间，在顶涂层中不发生该反应，以形成改性涂层的区域，并除去未改性的涂层以留下由改性涂层的区域形成的图案化结构。

公开(公告)号：US20070090853A1

公开(公告)日：2007-04-26

申请号：US11546551

申请日：2006-10-12

Applicant: Boris Menchtchikov ,  Frederik De Jong

Inventor： Boris Menchtchikov ,  Frederik De Jong

IPC: G01R31/26

CPC classification number: G03F7/70633 ,  G03F7/70341 ,  G03F7/70425 ,  G03F7/70783 ,  G03F7/70875

Abstract: The invention provides a method for correcting thermally-induced field deformations of a lithographically exposed substrate. First, a model is provided to predict thermally-induced field deformation information of a plurality of fields of the substrate. The pre-specified exposure information used to configure an exposure of the fields is then modified based on the thermally-induced deformation information as predicted by the model. Finally a pattern is exposed onto the fields in accordance with the pre-specified exposure information as modified. The predicting of thermally-induced field deformation information by the model includes predicting of deformation effects of selected points on the substrate. It is based on a time-decaying characteristic as energy is transported across substrate; and a distance between the selected points and an edge of the substrate.

Abstract translation: 本发明提供了一种用于校正光刻曝光的基底的热诱导场变形的方法。 首先，提供模型来预测衬底的多个场的热诱导场变形信息。 然后基于由模型预测的热诱导变形信息来修改用于配置场的曝光的预定曝光信息。 最后，根据修改的预先指定的曝光信息，将图案暴露在场上。 通过模型预测热诱导场变形信息包括预测基底上选定点的变形效应。 它是基于时间衰减的特性，因为能量被传送到基板上; 以及所选择的点与衬底的边缘之间的距离。