摘要:
The present invention provides a storage apparatus for storing a semiconductor element or a reticle and having a filter therein. The storage apparatus includes a first cover and a second cover, which are assembled together to form an inner space therebetween for accommodating a reticle or a semiconductor element. The second cover of the storage apparatus is composed of a body and a plate. Further, the second cover includes at least one aperture for communicating the inner space and an outer of the storage apparatus. The plate has a corresponding portion positionally corresponding to the aperture of the body. The filter is sandwiched between the body and the plate and covered the aperture so that when the air passes through the aperture of the body, the filter can filter and rid the air of impurities.
摘要:
The present invention provides a storage apparatus, ex. reticle pod, FOUP, FOSB or any kind of wafer pod, for storing a semiconductor element, ex. wafer, or a reticle and having a filter module therein. The storage apparatus is composed of a first cover and a second cover, which are assembled together to form an inner space therebetween for accommodating a reticle or a semiconductor element. The second cover of the storage apparatus comprises at least one aperture for communicating the inner space and an exterior of the storage apparatus and a filter module for covering the aperture.
摘要:
A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device.
摘要:
A container for holding a single wafer includes a door with a latching mechanism having a cam with a pair of opposing wings extending laterally therefrom. The cam is selectively rotatably shiftable between a first favored position wherein the wings are completely within the door enclosure to enable the door to be engaged and disengaged from the door frame, and a second favored position wherein the wings extend laterally outward from the door enclosure so as to engage in the latch recesses in the door frame when the door is engaged in the door frame. The cam wings may include a ramped portion thereon for drawing the door into closer engagement in the door frame when the cam is rotated from the first favored position to the second favored position. Also, the latching mechanism may further include a spring disposed to provide a biasing force for urging the latching mechanism toward each of the first and second favored positions, and soft-stop dampening springs for decelerating the cam in a controlled fashion at the first and second favored positions and for absorbing vibrations resulting from the collision of the cam with a fixed stop on the door chassis.
摘要:
A reticle SMIF pod includes a dome having a plurality of latchkeys and a cassette having a plurality of primary engagement locations thereon into which the latchkeys are intended to engage when sealing the cassette to the dome. A plurality of secondary engagement locations are positioned in the cassette above the plurality of primary engagement locations to prevent the cassette from falling should the plurality of latchkeys fail to engage in the primary engagement locations.
摘要:
A reticle-processing system includes a reticle-carrying container, a transfer rail for transferring the reticle-carrying container, a light exposure apparatus for printing a circuit pattern, and a reticle stocker for keeping a plurality of reticles. Orientation changer detects the orientation of the reticle-carrying container and changes it appropriately and is located in a path from the reticle stocker to a printing position in the light exposure apparatus. The orientation changer includes a rotary drive for rotating the reticle-carrying container, an orientation detector 83 for detecting the orientation of the reticle-carrying container, which is provided in the path from the reticle stocker to the printing position in the light exposure apparatus, and a controller for, when the orientation detected by the orientation detector is shifted by 180 degrees, controlling the rotary drive so as to correct the orientation.
摘要:
The present disclosure pertains to a wafer box for transporting semiconductor wafers, typically in a coin stack configuration. The wafer box includes an outer box and at least one inner box. The semiconductor wafers are placed in the inner box or boxes, typically with appropriate separators and interleaves. The outer box includes a tray portion and a lid portion. The tray portion includes posts rising from its floor which are received by sleeves in the inner box. Shock absorbing rings are placed on the posts both above and below the inner box or boxes in order to provide protection against vertical shocks. Moreover, the outer box includes radially pivoting latching elements with padded bumper elements. These padded bumper elements are brought to an upright position to urge against the inner box or boxes in order to provide horizontal or lateral shock protection.
摘要:
A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
摘要:
A first substrate carrier is provided that includes a body adapted to store one or more substrates; and either (1) a bottom surface having one or more coupling features that extend into a storage region of the body or (2) coupling features that extend alongside the body, so that the substrate carrier's overall height is not increased by the entire height of the coupling feature. Numerous other aspects are provided.
摘要:
A system for opening a substrate carrier includes a substrate carrier having an openable portion. The substrate carrier also has an opening mechanism coupled to the openable portion. A substrate transfer location has a support adapted to support a substrate carrier. The substrate transfer location also has an actuator mechanism. The actuator mechanism is positioned relative to the support so as to interact with the opening mechanism of the substrate carrier. The actuator mechanism of the substrate transfer location and the opening mechanism of the substrate carrier are adapted to interface with each other at the substrate transfer location so as to employ movement of the substrate carrier to achieve opening and closing of the substrate carrier.