公开(公告)号：US20030079685A1

公开(公告)日：2003-05-01

申请号：US10012609

申请日：2001-10-30

Inventor： Donald A. Anderson ,  Brice A. Johnson ,  James B. Andersen

IPC: B05C011/00

CPC classification number: B29C70/541 ,  B29C70/382

Abstract: A compliant marking tool for attachment to a fiber placement machine that is capable of marking detail locations on a work piece positioned on the fiber placement machine. The marking tool has a flexible member that is configured and adapted to bow and twist in response to the marking tool contacting the work piece. A holder is pivotably connected to the flexible member. A marking member is positioned in the holder and is capable of moving within the holder. The flexing of the flexible member along with the pivoting of the holder and the movement of the marking member allow the marking tool to follow the contours of the work piece and mark detail locations without damaging or at least minimizing the potential of damaging the work piece.

Abstract translation: 一种用于连接到光纤贴片机的兼容标记工具，其能够标记位于纤维铺放机上的工件上的细节位置。 标记工具具有柔性构件，其被构造和适于响应于标记工具接触工件而弯曲和扭曲。 保持器可枢转地连接到柔性构件。 标记部件定位在支架内并且能够在支架内移动。 柔性构件的弯曲以及保持器的枢转和标记构件的移动允许标记工具跟随工件的轮廓并标记细节位置，而不损害或至少最小化损坏工件的可能性。

公开(公告)号：US20030075106A1

公开(公告)日：2003-04-24

申请号：US10027611

申请日：2001-10-24

Inventor： Brian Craig Lee ,  Steven W. Steinfield ,  Winthrop D. Childers ,  Mark A. Van Veen ,  Mohammad M. Samii

IPC: B05C011/00

CPC classification number: B41J2/17553 ,  A61J3/00 ,  A61K9/2072 ,  A61K9/2086 ,  A61K9/209 ,  A61K9/2095 ,  A61K9/7007 ,  A61M15/008 ,  A61M15/025 ,  B41J2/04 ,  B41J2/17513

Abstract: A fluid ejection cartridge for dispensing a bioactive fluid including a first reservoir containing the bioactive fluid and a first fluid ejector fluidically coupled to the first reservoir. The first fluid ejector ejects at least a drop of the bioactive fluid onto the ingestible sheet.

Abstract translation: 一种用于分配生物活性流体的流体喷射盒，包括含有生物活性流体的第一储存器和与第一储存器流体耦合的第一流体喷射器。 第一流体喷射器将至少一滴生物活性流体喷射到可摄取的片材上。

公开(公告)号：US20030061988A1

公开(公告)日：2003-04-03

申请号：US09968136

申请日：2001-09-28

Inventor： Jen Show Hsieh

IPC: B05C011/00

CPC classification number: B05C13/02 ,  G11B33/0422 ,  G11B33/0444

Abstract: A disc painting or treating machine includes one or more holder devices, and a device for moving non-circular discs onto the holder devices. The holder devices each includes a non-circular opening for receiving and for correctly positioning the non-circular disc on the holder device, and for allowing the non-circular disc to be correctly printed or painted or treated by a treating device. A positioning device is disposed beside the holder devices and includes a non-circular surface for engaging with and for correctly positioning the non-circular discs.

Abstract translation: 盘式涂装机包括一个或多个保持装置，以及用于将非圆盘移动到支架装置上的装置。 保持装置每个都包括非圆形开口，用于接收和用于将非圆盘正确地定位在保持器装置上，并且用于允许非圆盘被正确地打印或涂刷或由处理装置处理。 定位装置设置在保持器装置的旁边，并且包括用于与非圆形盘接合并用于正确定位非圆形盘的非圆形表面。

公开(公告)号：US20030056725A1

公开(公告)日：2003-03-27

申请号：US10251475

申请日：2002-09-18

Applicant: Dainippon Screen Mfg. Co., Ltd.

Inventor： Tsutomu Ueyama ,  Izuru Iseki ,  Norio Sato ,  Katsuyuki Machida ,  Hakaru Kyuragi

IPC: B05C011/00 ,  C23C016/00

CPC classification number: B32B37/10 ,  B05D1/286 ,  B32B37/025 ,  B32B38/0036 ,  B32B41/00 ,  B32B2309/12 ,  B32B2309/68 ,  B32B2457/14 ,  H01L21/67092 ,  H01L21/67253

Abstract: Prior to the start of transfer of an insulation film to a substrate, the degree of opening of a butterfly valve is set small so that evaporation of a solvent component contained in the insulation film is suppressed and the fluidity of the insulation film is ensured at the start of the transfer. On the other hand, the butterfly valve is totally opened at the start of the transfer, so that the pressure inside a thin film forming chamber rapidly decreases and transfer of the insulation film to the substrate is performed always in a low-pressure state (high-degree of vacuum).

Abstract translation: 在开始将绝缘膜转移到基板之前，将蝶形阀的开度设定得较小，从而抑制包含在绝缘膜中的溶剂成分的蒸发，并且确保绝缘膜的流动性 开始转账。 另一方面，蝶阀在转移开始时完全打开，使得薄膜形成室内的压力快速下降，绝缘膜向基板的传递始终处于低压状态（高 - 真空度）。

公开(公告)号：US20030041969A1

公开(公告)日：2003-03-06

申请号：US10233878

申请日：2002-09-03

Inventor： Claus Schneider ,  Ralph Trunk ,  Lothar Pfitzner ,  Heinz Schmid

IPC: B05C011/00 ,  B08B003/00

CPC classification number: G01N15/06 ,  B08B3/08 ,  G01N2015/1062

Abstract: A particle measurement configuration measures the particle concentration in a liquid or gaseous medium by way of a particle measuring instrument. In order to avoid erroneous measurements or damage to the particle measuring instrument, a measuring cell is provided which measures temperature or pressure or pH of the medium. A system controller shuts off a valve if threshold values are exceeded and it prevents the particle measuring instrument from being operated outside a predefined specification.

Abstract translation: 颗粒测量结构通过粒子测量仪器测量液体或气体介质中的颗粒浓度。 为了避免对颗粒测量仪器的错误测量或损坏，提供测量介质的温度或压力或pH值的测量单元。 如果超过阈值，则系统控制器关闭阀门，并且防止颗粒测量仪器在预定义的规格之外运行。

公开(公告)号：US20030029380A1

公开(公告)日：2003-02-13

申请号：US10186352

申请日：2002-06-28

Inventor： Masayuki Nakazawa ,  Akira Yamano ,  Chika Honda

IPC: B05C011/00

CPC classification number: B41J2/2056

Abstract: There is described a medical image recording apparatus, which records a medical image on a recording medium based on image data. The apparatus includes an ink-jetting head to emit ink particles onto the recording medium and a controlling section to control the ink-jetting head, so that a total amount of the ink particles per unit area, emitted by the ink-jetting head and adhered onto the recording medium, is maintained at substantially a constant value even if density of a solid-tone image area varies within density range D. With respect to at least one of combinations of values k1, k2 selected under conditions of 0nullk1

Abstract translation: 描述了一种基于图像数据将医学图像记录在记录介质上的医学图像记录装置。 该装置包括喷墨头，用于将墨颗粒发射到记录介质上，以及控制部分，用于控制喷墨头，使得由喷墨头发射并粘附的每单位面积的墨颗粒总量 即使密度图像区域的密度在密度范围D内变化，也保持在基本上恒定的值。对于在0≤k1的条件下选择的值k1，k2的组合中的至少一个， 1，0

公开(公告)号：US20030017262A1

公开(公告)日：2003-01-23

申请号：US10012647

申请日：2001-12-06

Inventor： Sung-Koog Oh ,  Jin-Han Kim ,  Man-Seok Seo ,  Sung-Jin Kim ,  Yun-Ho Kim

IPC: B05D005/06 ,  C23C016/00 ,  B05C011/00

CPC classification number: C03B37/01815

Abstract: An apparatus and method for manufacturing an optical fiber preform by MCVD is disclosed. In the preform manufacturing apparatus, a cylindrical deposition tube receives a source gas through one end and discharges the source gas through the other end. A first heat source is mounted to a guide and forms a first high temperature area inside the deposition tube by heating the outer circumferential surface of the deposition tube. A second heat source is mounted to the guide, apart from the first heat source by a predetermined distance along the length direction of the deposition tube, and forms a second high temperature area inside the deposition tube by heating the outer circumferential surface of the deposition tube. A beat source mover moves the first and second heat sources, maintaining the distance between the first and second heat sources.

Abstract translation: 公开了一种通过MCVD制造光纤预制件的设备和方法。 在预成型体制造装置中，圆筒形沉积管通过一端接收源气体，并将源气体排出另一端。 第一热源安装在引导件上，通过加热沉积管的外圆周表面在沉积管内部形成第一高温区域。 第二热源沿着沉积管的长度方向与第一热源隔开预定距离安装在引导件上，并且通过加热沉积管的外圆周表面形成沉积管内的第二高温区域 。 节拍源移动器移动第一和第二热源，保持第一和第二热源之间的距离。

公开(公告)号：US20020192394A1

公开(公告)日：2002-12-19

申请号：US10199089

申请日：2002-07-22

Applicant: Nissin Electric Co., Ltd.

Inventor： Akinori Ebe ,  Naoto Kuratani ,  Eiji Takahashi

IPC: H05H001/24 ,  B05C011/00

CPC classification number: H01L31/182 ,  C23C16/24 ,  C23C16/509 ,  C23C16/52 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/0262 ,  Y02E10/546 ,  Y02P70/521

Abstract: A method of forming a thin polycrystalline silicon film and a thin film forming apparatus allowing inexpensive formation of a thin polycrystalline silicon film at a relatively low temperature with high productivity. More specifically, a method of forming a thin polycrystalline silicon film and a thin film forming apparatus in which a state of plasma is controlled to achieve an emission intensity ratio of hydrogen atom radicals (Hnull) of one or more to the emission intensity of SiH* radicals in the plasma. The thin film forming apparatus of a plasma CVD type includes a deposition chamber accommodating a deposition target substrate, a discharging electrode for plasma formation connected to a discharging power source, a gas supply device for supplying a gas and an exhaust device, and further includes an emission-spectrometer and a probe measuring device as well as a control portion for controlling at least one of the power supply, the gas supply and gas exhausting, for maintaining a desired state of plasma based on information detected by them.

Abstract translation: 一种形成薄多晶硅膜的方法和一种薄膜形成装置，其允许在相对低的温度下以高生产率廉价地形成薄多晶硅膜。 更具体地，形成薄多晶硅膜的方法和薄膜形成装置，其中控制等离子体的状态以实现一个或多个氢原子自由基（Hbeta）与发光强度SiH *的发射强度比 等离子体中的自由基。 等离子体CVD型薄膜形成装置包括容纳沉积靶基板的沉积室，与放电电源连接的等离子体形成用放电电极，用于供给气体的气体供给装置和排气装置，还包括： 发射光谱仪和探针测量装置以及用于控制电源，气体供应和气体排出中的至少一个的控制部分，用于基于由它们检测的信息来维持期望的等离子体状态。

公开(公告)号：US20020153099A1

公开(公告)日：2002-10-24

申请号：US10167937

申请日：2002-06-10

Inventor： Albert Wang ,  Scott Baron ,  Prasad Padmanabhan ,  Gerald M. Cox

IPC: C23F001/00 ,  B05C011/00

CPC classification number: G03F7/427 ,  H01L21/31138

Abstract: A system is disclosed for speeding workpiece thoughput in low pressure, high temperature semiconductor processing reactor. The system includes apparatus for loading a workpiece into a chamber at atmospheric pressure, bringing the chamber down to an intermediate pressure, and heating the wafer while under the intermediate pressure. The chamber is then pumped down to the operating pressure. The preferred embodiments involve single wafer plasma ashers, where a wafer is loaded onto lift pins at a position above a wafer chuck, the pressure is rapidly pumped down to about 40 Torr by rapidly opening and closing an isolation valve, and the wafer is simultaneously lowered to the heated chuck. Alternatively, the wafer can be pre-processed to remove an implanted photoresist crust at a first temperature and the chamber then backfilled to about 40 Torr for further heating to close to the chuck temperature. At 40 Torr, the heat transfer from the chuck to the wafer is relatively fast, but still slow enough to avoid thermal shock. In the interim, the pump line is further pumped down to operating pressure (about 1 Torr) behind the isolation valve. The chamber pressure is then again reduced by opening the isolation valve, and the wafer is processed.

Abstract translation: 公开了一种用于在低压，高温半导体处理反应器中加速工件加工的系统。 该系统包括用于在大气压力下将工件装载到室中的装置，使室降至中间压力，并在中间压力下加热晶片。 然后将腔室泵送到操作压力。 优选实施例涉及单晶片等离子体灰化器，其中将晶片加载到晶片卡盘上方位置的升降销上，通过快速打开和关闭隔离阀将压力快速泵送至约40托，同时降低晶片 到加热的卡盘。 或者，可以预先处理晶片以在第一温度下去除植入的光致抗蚀剂的外壳，然后将该腔重新填充至约40托，以进一步加热以接近卡盘温度。 在40乇时，从卡盘到晶片的热传递相对较快，但仍然足够慢以避免热冲击。 在此期间，泵管线进一步被泵送到隔离阀后面的工作压力（约1乇）。 然后通过打开隔离阀再次减小腔室压力，并且处理晶片。

公开(公告)号：US20020144651A1

公开(公告)日：2002-10-10

申请号：US10118246

申请日：2002-04-09

Applicant: CFS BAKEL B.V.

Inventor： Hendrikus Antonius Jacobus Kuenen

IPC: B05C011/00

CPC classification number: A21C9/04 ,  A23P20/12 ,  B05B14/48

Abstract: An air unit for the removal of excess particulate coating material that is present on products which are in a coating machine comprises, for blowing surplus particulate material off the products, at least one suction member for drawing off air, with particulate material present therein, from the coating machine, separating means for removing particulate material from the air drawn off, and circulating means for feeding at least a portion of the air drawn off to the blowing member.

Abstract translation: 用于去除存在于涂布机中的产品上的多余颗粒涂料的空气单元包括用于从产品中吹出多余的颗粒材料的至少一个抽吸构件，用于从其中存在的颗粒材料抽出空气， 涂布机，用于从被排出的空气中除去颗粒材料的分离装置，以及用于将抽出的空气的至少一部分供给到吹风构件的循环装置。