摘要:
A device for burnishing and smoothing metal parts, particularly suitable for use in mechanical-galvanic processes, comprising a main body having a fastening disc to which guides are radially coupled and the body of which includes at least three mobile propelling systems which are actuated by electro-mechanical means and move in a synchronized concentric manner, approaching and moving away from the central point and acting on a rotating frame from equidistant angles. The frame is configured to secure pieces to be treated and it also has a detachable head that is disposed centrally above a cylindrical tank. The propelling systems, provided with brushes, move from an open position in which they remain separate from one another and at a distance from the center, into a closed position in which they are joined to one another in the center of the tank, coming into contact with the structure containing the parts to be treated.
摘要:
There is provided a shape memory alloy wire with a length of polycrystalline shape memory alloy having an alloy composition including at least one member selected from the group consisting of Cu in at least 10 wt. %, Fe in at least 5 wt. %, Au in at least 5 wt. %, Ag in at least 5 wt. %, Al in at least 5 wt. %, In in at least 5 wt. %, Mn in at least 5 wt. %, Zn in at least 5 wt. % and Co in at least 5 wt. %, and having a martensite crystal structure consisting of one of 2H, 18R1, M18R, and 6R. The length of polycrystalline shape memory alloy has a cross sectional wire diameter greater than 1 micron and less than 500 microns, an oligocrystalline morphology including polycrystalline grains that span the wire diameter and a wire surface with a surface roughness that is no greater than about 100 nanometers.
摘要:
A current-leveling electrode for improving electroplating and electrochemical polishing uniformity in the electrochemical plating or electropolishing of metals on a substrate is disclosed. The current-leveling electrode includes a base electrode and at least one sub-electrode carried by the base electrode. The at least one sub-electrode has a width which is less than a width of the base electrode to impart a generally tapered, stepped or convex configuration to the current-leveling electrode.
摘要:
A method of electrolytically polishing Fe-, Co-, and Ni alloys, particularly nickel superalloys, wherein at least one fluorine compound is mixed into the electrolyte, which electrolyte is based on a strong acid and is further comprised of at least one weakly polar organic compound and a fluorinated surfactant. The preferred fluorine compound is HBF.sub.4, added the amount of 5 to 40 vol. %. Other fluorine compounds which perform well are ammonium bifluoride, HF, and sodium fluosilicate.