公开(公告)号：US20090284708A1

公开(公告)日：2009-11-19

申请号：US12477953

申请日：2009-06-04

申请人： Ibrahim Abdulhalim

发明人： Ibrahim Abdulhalim

IPC分类号： G02F1/21 ,  G02F1/03

CPC分类号： G02B6/29361 ,  B82Y20/00 ,  G02B5/3083 ,  G02B6/272 ,  G02B6/2766 ,  G02B6/2793 ,  G02B6/29302 ,  G02B6/29358 ,  G02B6/29395 ,  G02B6/29397

摘要： Novel, polarization-insensitive, birefringent, broadband tunable filter arrangements that allow high throughput, based on a combination of tunable birefringent layers or polarization dependent filters, in combination with one or more of the following components (i) thin film achromatic quarter waveplates based on the form birefringence of dielectric subwavelength grating structures, (ii) nano wire-grid polarizers made of metallic wire grids; (iii) omnidirectional dielectric mirrors, (iv) polarization conversion mirrors, (v) reflective polarized beam splitters for circularly polarized light, (vi) metallic subwavelength gratings with lines having Gaussian profile, and (vii) Faraday mirror. All of these components may be implemented in thin film form on one or more substrates, such that a compact and cost effective filter can be produced. The birefringent layers can be any birefringent or magneto-optic layer but especially liquid crystals. The use of novel polarization conversion disposition of the components of the filter results in a filter having high throughput.

摘要翻译： 基于可调双折射层或偏振相关滤光器的组合的新型偏振不敏感双折射宽带可调谐滤光器布置，其结合一个或多个以下组件（i）基于以下的组分的薄膜无彩色四分之一波片 电介质亚波长光栅结构的形式双折射，（ii）由金属线栅制成的纳米线栅偏振器; （iii）全向电介质反射镜，（iv）偏振转换镜，（v）用于圆偏振光的反射偏振分束器，（vi）具有高斯分布线的金属亚波长光栅，和（vii）法拉第镜。 所有这些部件可以在一个或多个基板上以薄膜形式实现，使得可以产生紧凑且成本有效的过滤器。 双折射层可以是任何双折射或磁光层，但特别是液晶。 使用过滤器的组件的新颖的偏振转换配置产生具有高生产量的过滤器。

公开(公告)号：US20090231584A1

公开(公告)日：2009-09-17

申请号：US12428401

申请日：2009-04-22

申请人： Ibrahim Abdulhalim ,  Mike Adel ,  Michael Friedmann ,  Michael Faeyrman

发明人： Ibrahim Abdulhalim ,  Mike Adel ,  Michael Friedmann ,  Michael Faeyrman

IPC分类号： G01B11/00

CPC分类号： G01B11/26 ,  G01B11/14 ,  G01N21/9501 ,  G03F7/70633 ,  H01L22/12 ,  H01L23/544 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2223/5446 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

摘要翻译： 提出了一种测量两个上覆或隔行周期结构之间的对准误差的方法和系统。 覆盖或隔行的周期性结构被入射辐射照射，并且检测由上覆或隔行的周期性结构引起的入射辐射的衍射辐射以提供输出信号。 然后可以从输出信号确定上覆或隔行周期性结构之间的未对准。

公开(公告)号：US20050157297A1

公开(公告)日：2005-07-21

申请号：US11062255

申请日：2005-02-18

申请人： Ibrahim Abdulhalim ,  Mike Adel ,  Michael Friedmann ,  Michael Faeyrman

发明人： Ibrahim Abdulhalim ,  Mike Adel ,  Michael Friedmann ,  Michael Faeyrman

IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L23/544

CPC分类号： G01B11/26 ,  G01B11/14 ,  G01N21/9501 ,  G03F7/70633 ,  H01L22/12 ,  H01L23/544 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2223/5446 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

摘要翻译： 提出了一种测量两个上覆或隔行周期结构之间的对准误差的方法和系统。 覆盖或隔行的周期性结构被入射辐射照射，并且检测由上覆或隔行的周期性结构引起的入射辐射的衍射辐射以提供输出信号。 然后可以从输出信号确定上覆或隔行周期性结构之间的未对准。

公开(公告)号：US06590656B2

公开(公告)日：2003-07-08

申请号：US09960898

申请日：2001-09-21

申请人： Yiping Xu ,  Ibrahim Abdulhalim

发明人： Yiping Xu ,  Ibrahim Abdulhalim

IPC分类号： G01J400

CPC分类号： G03F7/70625 ,  G01B11/0641 ,  G01N21/211 ,  G01N21/4788 ,  G01N21/55 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/213 ,  G01N2021/556 ,  G01N2021/95615 ,  G03F7/70491 ,  G03F7/70616 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.