公开(公告)号：US20050106493A1

公开(公告)日：2005-05-19

申请号：US10714998

申请日：2003-11-17

Applicant: Bang-Chien Ho ,  Jian-Hong Chen

Inventor： Bang-Chien Ho ,  Jian-Hong Chen

IPC: G03C5/00 ,  G03F7/00 ,  G03F7/038 ,  G03F7/40

CPC classification number: G03F7/40 ,  G03F7/0035 ,  G03F7/038

Abstract: A method is described for reducing the space width of holes in a first resist pattern and simultaneously removing unwanted holes to change the pattern density in the resulting second pattern. This technique provides holes with a uniform space width as small as 100 nm or less that is independent of pattern density in the second pattern. A positive resist is patterned to form holes with a first pattern density and first space width. A water soluble negative resist is coated over the first resist and selectively exposed to form a second patterned layer consisting of water insoluble plugs in unwanted holes in the first pattern and a thin water insoluble layer on the first resist pattern in unexposed portions. The plugs may form dense and isolated hole arrays while the thin insoluble layer reduces space width to the same extent in remaining holes in the second pattern.

Abstract translation: 描述了一种用于减小第一抗蚀剂图案中的孔的空间宽度并同时去除不需要的孔以改变所得第二图案中的图案密度的方法。 该技术提供具有小于100nm或更小的均匀空间宽度的孔，其与第二图案中的图案密度无关。 图案化正性抗蚀剂以形成具有第一图案密度和第一空间宽度的孔。 将水溶性负性抗蚀剂涂覆在第一抗蚀剂上并选择性地暴露以形成第二图案层，该第二图案层由第一图案中不想要的孔中的水不溶性塞子和未曝光部分中的第一抗蚀剂图案上的薄水不溶性层组成。 塞子可以形成致密和隔离的孔阵列，而薄不溶层在第二图案中的剩余孔中减小相同程度的空间宽度。

公开(公告)号：US06538086B1

公开(公告)日：2003-03-25

申请号：US09514921

申请日：2000-02-28

Applicant: Sheng-Yueh Chang ,  Bang-Chein Ho ,  Jui-Fa Chang ,  Jian-Hong Chen ,  Ming-Chia Tai

Inventor： Sheng-Yueh Chang ,  Bang-Chein Ho ,  Jui-Fa Chang ,  Jian-Hong Chen ,  Ming-Chia Tai

IPC: C08F3402

CPC classification number: C08F232/04 ,  C08F232/08 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106

Abstract: The present invention relates to a polymer with at least one pericyclic protective group such as 2-methyl-2-bicyclo[2,2,1]heptanyl. The resist composition containing the polymer can be used as a chemically amplified resist and exhibits strong etch resistance. In addition, a line-and-space pattern of 0.1 &mgr;m pitch can be resolved successfully using the resist composition.

Abstract translation: 本发明涉及具有至少一个周环保护基团的聚合物，例如2-甲基-2-双环[2,2,1]庚基。 含有该聚合物的抗蚀剂组合物可以用作化学放大型抗蚀剂并具有很强的抗蚀刻性。 此外，可以使用抗蚀剂组合物成功地解决0.1μm间距的线间距图案。

公开(公告)号：US06303725B1

公开(公告)日：2001-10-16

申请号：US09675875

申请日：2000-09-29

Applicant: Sheng-Yueh Chang ,  Bang-Chein Ho ,  Jian-Hong Chen ,  Ting-Chun Liu ,  Tzu-Yu Lin

Inventor： Sheng-Yueh Chang ,  Bang-Chein Ho ,  Jian-Hong Chen ,  Ting-Chun Liu ,  Tzu-Yu Lin

IPC: C08F3400

CPC classification number: C08F32/00 ,  C09D4/00 ,  C08F232/00

Abstract: The present invention provides a cyclic dione polymer, which is a homopolymer or a copolymer of a cyclic dione monomer selected from those represented by formulae (I) and (II) wherein A and B may be the same or different and are independently selected from the group consisting of halogen, hydrogen, C3-20 cyclic or pericyclic alkyl, C1-20 linear and branched alkyl, C6-20 aryl, C7-20 arylalkyl, C7-20 alkylaryl, silyl, alkylsilyl, germyl, alkylgermyl, alkoxycarbonyl, acyl, and a heterocylic group; or, A and B are linked together to form a C3-20 saturated or unsaturated cyclic hydrocarbon group or a substituted or unsubstituted heterocyclic group; C is selected from the group consisting of oxygen, sulfur, —CH2—, and —SiH2—, wherein each R1 is independently selected from C1-20 alkyl and phenyl.

Abstract translation: 本发明提供环状二酮聚合物，其是选自由式（I）和（II）表示的环状二酮单体的均聚物或共聚物，其中A和B可以相同或不同，并且独立地选自 由卤素，氢，C 3-20环状或脂环族烷基，C 1-20直链和支链烷基，C6-20芳基，C7-20芳基烷基，C7-20烷基芳基，甲硅烷基，烷基甲硅烷基，甲基，烷基锗烷基，烷氧基羰基，酰基和 杂环组 或者A和B连接在一起形成C3-20饱和或不饱和环状烃基或取代或未取代的杂环基; C选自氧，硫，-CH 2 - 和-SiH 2 - ，其中 每个R 1独立地选自C 1-20烷基和苯基。

公开(公告)号：US5555525A

公开(公告)日：1996-09-10

申请号：US302062

申请日：1994-09-07

Applicant: Bang C. Ho ,  Jian-Hong Chen ,  Shu-Yin Yang ,  Yih-Her Chang

Inventor： Bang C. Ho ,  Jian-Hong Chen ,  Shu-Yin Yang ,  Yih-Her Chang

IPC: B29D11/00 ,  C08F265/06 ,  G02B6/028 ,  G02B6/00 ,  B05D5/06 ,  C08F120/18

CPC classification number: G02B6/02038 ,  B29D11/00682 ,  C08F265/06

Abstract: A continuous manufacturing method is provided by extruding a composite optical fiber from two polymeric solutions containing two different monomers having different refractive indices, and then allowing the monomers to diffuse in a diffusion region such that the two monomers are diffused into each other before the optical fiber is hardened.

Abstract translation: 通过从包含具有不同折射率的两种不同单体的两种聚合物溶液中挤出复合光纤提供连续制造方法，然后允许单体在扩散区域中扩散，使得两个单体在光纤之前彼此扩散 硬化了

公开(公告)号：US5516879A

公开(公告)日：1996-05-14

申请号：US413025

申请日：1995-03-28

Applicant: Wu-Bin Yuo ,  Wen-Jeng Lin ,  Hsin-Herng Wang ,  Jian-Hong Chen

Inventor： Wu-Bin Yuo ,  Wen-Jeng Lin ,  Hsin-Herng Wang ,  Jian-Hong Chen

IPC: C08G63/82 ,  C08G63/02

CPC classification number: C08G63/82

Abstract: A catalyst composition for use in the preparation of poly(butylene terephthalate) from dimethyl terephthalate, comprising: (a) a titanium compound primary catalyst, from about 0.01 PHR to about 1 PHR; and (b) an alkali metal phosphate or alkali metal phosphite co-catalyst, from about 0.001 PHR to about 1 PHR; wherein PHR represents parts of the primary catalyst or the co-catalyst per one hundred parts, by weight, of dimethyl terephthalate. Preferred titanium compounds include tetrabutyl titanate or tetra(isopropyl) titanate; the alkali metal phosphate can be a phosphate salt containing one, two, or three metal groups; and the alkali metal phosphite can be a phosphite salt containing one or two metal groups. With this catalyst composition, the transesterification rate was increased by 10 percent or more. Furthermore, the reaction product poly(butylene terephthalate) shows an increased intrinsic viscosity over those without the co-catalyst, indicating a greater degree of polymerization.

Abstract translation: 一种用于从对苯二甲酸二甲酯制备聚（对苯二甲酸丁二醇酯）的催化剂组合物，包括：（a）钛化合物一次催化剂，约0.01PHR至约1PHR; 和（b）约0.001PHR至约1PHR的碱金属磷酸盐或碱金属亚磷酸盐助催化剂; 其中PHR代表每100重量份对苯二甲酸二甲酯的主要催化剂或助催化剂的部分。 优选的钛化合物包括钛酸四丁酯或钛酸四（异丙基）酯; 碱金属磷酸盐可以是含有一个，两个或三个金属基团的磷酸盐; 碱金属亚磷酸盐可以是含有一个或两个金属基团的亚磷酸盐。 使用该催化剂组合物，酯交换率提高10％以上。 此外，反应产物聚（对苯二甲酸丁二醇酯）显示出比不含助催化剂的反应产物增加的特性粘度，表明聚合度更高。

公开(公告)号：US5434277A

公开(公告)日：1995-07-18

申请号：US22962

申请日：1993-04-02

Applicant: Herng-Dar Hwu ,  Hung Y. Hsu ,  Jian-Hong Chen ,  Shu-Fang Jiang

Inventor： Herng-Dar Hwu ,  Hung Y. Hsu ,  Jian-Hong Chen ,  Shu-Fang Jiang

IPC: C07C51/41 ,  C07F19/00

CPC classification number: C07C51/412

Abstract: A method for the preparation of metallic salts of fatty acids comprising the steps of: (a) reacting alkali hydroxide with a fatty acid in a saponification reaction to form an alkali soap; (b) reacting the alkali soap with an aqueous metallic salt solution in a double decomposition reaction to cause the production of metallic fatty acid salt; (c) performing at least one cycle of an alternating alkalinization-acidization reaction by adding an aqueous alkali hydroxide solution to the metallic fatty acid salt to raise the solution pH, followed by adding an acidic aqueous salt solution contain the same metal ions to lower the solution pH. High purity metallic salts of fatty acids can be obtained without a solvent washing step and the metallic fatty acid salts prepared from this invention can be effectively used as photolyzing agent to initiate and/or accelerate the photo-degradation of plastics.

Abstract translation: 一种制备脂肪酸金属盐的方法，包括以下步骤：（a）在皂化反应中使碱金属氢氧化物与脂肪酸反应形成碱性皂; （b）在双重分解反应中使碱性皂与金属盐水溶液反应，以产生金属脂肪酸盐; （c）通过向金属脂肪酸盐中加入碱金属氢氧化物水溶液进行交替碱化 - 酸化反应的至少一个循环以提高溶液的pH，然后加入含有相同金属离子的酸性盐水溶液以降低 溶液pH值。 不用溶剂洗涤步骤即可获得高纯度的脂肪酸金属盐，并且由本发明制备的金属脂肪酸盐可有效地用作光引发剂以引发和/或加速塑料的光降解。

公开(公告)号：US20130019353A1

公开(公告)日：2013-01-17

申请号：US13545647

申请日：2012-07-10

Applicant: Bernard HaoChih LIU ,  Fang-Yi Liao ,  Jian-Hong Chen

Inventor： Bernard HaoChih LIU ,  Fang-Yi Liao ,  Jian-Hong Chen

IPC: G01Q60/58

CPC classification number: G01Q60/38 ,  G01Q60/40 ,  G01Q60/42 ,  G01Q60/58

Abstract: A thermal probe includes a support element, a conductive pattern and a tip. The support element has a slit or a through hole and has a first surface and a second surface which is opposite to the first surface. The conductive pattern is disposed at the first surface. The tip has a base and a pinpoint. The pinpoint is disposed at the base and passes through the slit or the through hole and highlights from the first surface. The base is connected with the second surface. The tip of the thermal probe of the invention can be replaced, and user can choose the best combination of the tip, conductive pattern and support element according to their needs.

Abstract translation: 热探针包括支撑元件，导电图案和尖端。 支撑元件具有狭缝或通孔，并且具有与第一表面相对的第一表面和第二表面。 导电图案设置在第一表面。 尖端具有基部和精确点。 精确位置设置在基座处并穿过狭缝或通孔并从第一表面突出。 基座与第二表面相连。 可以更换本发明的热探针的尖端，用户可以根据需要选择尖端，导电图案和支撑元件的最佳组合。

公开(公告)号：US20110214031A1

公开(公告)日：2011-09-01

申请号：US12714467

申请日：2010-02-27

Applicant: Yao-Tsu Chang ,  Ming-Haw Jing ,  Chong-Dao Lee ,  Jian-Hong Chen ,  Zih-Heng Chen

Inventor： Yao-Tsu Chang ,  Ming-Haw Jing ,  Chong-Dao Lee ,  Jian-Hong Chen ,  Zih-Heng Chen

IPC: H03M13/29 ,  G06F11/10 ,  H03M13/07

CPC classification number: H03M13/1575

Abstract: An error correction decoder includes a syndrome generator and an error correction value generator. The syndrome generator is operable to generate a plurality of syndromes based upon a received signal generated according to a generator polynomial. The error correction value generator is operable to generate a plurality of product values. Each of the product values is generated for one of the syndromes based upon a respective power of the roots of the generator polynomial. The respective power is determined based upon a respective index corresponding to one of the syndromes to be considered and unit positions of the received signal. The error correction value generator is further operable to generate an error correction value according to the product values, and to provide an error correcting device coupled thereto with the error correction value for correcting an error of the received signal.

Abstract translation: 纠错解码器包括校正子发生器和纠错值发生器。 校正子发生器可操作以基于根据生成多项式生成的接收信号来生成多个校正子。 误差校正值发生器可操作以产生多个乘积值。 基于生成多项式的根的相应功率，针对其中一个综合征生成每个产品值。 相应的功率是根据与要考虑的综合症之一相对应的相应索引和接收信号的单元位置来确定的。 误差校正值发生器还可用于根据乘积值产生误差校正值，并提供与其一起耦合的纠错装置和用于校正接收信号误差的纠错值。

公开(公告)号：US20110026876A1

公开(公告)日：2011-02-03

申请号：US12533579

申请日：2009-07-31

Applicant: LON WANG ,  JIAN-HONG CHEN ,  SHIH-MIN CHUO

Inventor： LON WANG ,  JIAN-HONG CHEN ,  SHIH-MIN CHUO

IPC: G02B6/12 ,  G03F7/20

CPC classification number: G02B6/2934 ,  G02B6/107

Abstract: A nano/micro-patterned optical device includes a soft film substrate and nano/micro thin wires. A surface of the soft film substrate includes a nano/micro-pattern formed through a lithography process, and the nano/micro-pattern includes a plurality of depressed grooves. The nano/micro thin wires are placed in the depressed grooves, and used to form a plurality of optical waveguides, in which the optical waveguides include at least one optical coupling region, and the optical coupling region is located on a joining position of the optical waveguides. A fabrication method of the nano/micro-patterned optical device is also provided.

Abstract translation: 纳米/微图案光学器件包括软膜衬底和纳米/微细线。 软膜基板的表面包括通过光刻工艺形成的纳米/微图案，并且纳米/微图案包括多个凹槽。 纳米/微细线被放置在凹槽中，用于形成多个光波导，其中光波导包括至少一个光耦合区域，并且光耦合区域位于光学波导的接合位置 波导。 还提供了纳米/微图案化光学器件的制造方法。

公开(公告)号：US20070190778A1

公开(公告)日：2007-08-16

申请号：US11352815

申请日：2006-02-13

Applicant: Jen-Chieh Shih ,  Bang-Ching Ho ,  Jian-Hong Chen

Inventor： Jen-Chieh Shih ,  Bang-Ching Ho ,  Jian-Hong Chen

IPC: H01L21/4763

CPC classification number: H01L21/76808

Abstract: A method for forming a dual damascene structure in a semiconductor device manufacturing process where via plugs which may include a thickness portion of a plug filling material overlying the process surface is formed by diffusing an acid into a plug filling material layer followed by reacting the acid with the plug filling material layer to form a soluble portion which is then removed using a solvent. A remaining portion of the plug filling material is cured and a BARC layer may be formed over the process surface prior to patterning trenches in an overlying resist layer and forming a dual damascene structure.

Abstract translation: 一种用于在半导体器件制造工艺中形成双镶嵌结构的方法，其中可以包括覆盖在工艺表面上的塞子填充材料的厚度部分的通孔塞通过将酸扩散到塞填充材料层中，然后使酸与 塞子填充材料层以形成可溶部分，然后使用溶剂除去。 塞子填充材料的剩余部分被固化，并且可以在上覆的抗蚀剂层中的沟槽图案形成双重镶嵌结构之前，在工艺表面上形成BARC层。