公开(公告)号：US08573007B2

公开(公告)日：2013-11-05

申请号：US13370820

申请日：2012-02-10

申请人： Osamu Sakamoto ,  Chikao Tanaka ,  Seiji Miyazaki ,  Satoru Ohkawa ,  Takahiro Murakami

发明人： Osamu Sakamoto ,  Chikao Tanaka ,  Seiji Miyazaki ,  Satoru Ohkawa ,  Takahiro Murakami

IPC分类号： C03B5/235 ,  C03B5/02 ,  C03B3/00

CPC分类号： C03B5/2353 ,  C03B3/026 ,  C03B5/025 ,  C03B5/04 ,  Y02P40/55

摘要： The present invention provides a process for producing a molten glass which can produce a molten glass having a good quality, a glass-melting furnace, a process for producing glass products and an apparatus for producing glass products.While an oxygen combustion burner 20 is rotated by a motor 38, glass raw material particles (not shown) are dropped into a high-temperature gas phase atmosphere produced by a flame F of the oxygen combustion burner 20, to be changed into liquid glass particles. By rotation of an outlet (nozzle) of the oxygen combustion burner 20, the falling position of the liquid glass particles 26, changes with time. Accordingly, generation of bubbles caused by continuous fall of the liquid glass particles in a particular position on a molten glass liquid surface is prevented. Accordingly, it is possible to produce a molten glass having a good quality with few bubbles.

摘要翻译： 本发明提供一种能够生产质量好的熔融玻璃的熔融玻璃的制造方法，玻璃熔融炉，玻璃制品的制造方法以及玻璃制品的制造装置。 当氧气燃烧器20由电动机38旋转时，将玻璃原料颗粒（未示出）落入由氧燃烧器20的火焰F产生的高温气相环境中，变成液态玻璃颗粒 。 通过氧燃烧器20的出口（喷嘴）的旋转，液态玻璃颗粒26的下降位置随时间而变化。 因此，防止了液晶玻璃颗粒在熔融玻璃液面上的特定位置的连续下降引起的气泡的产生。 因此，可以制造质量好，泡沫少的熔融玻璃。

公开(公告)号：US08102092B2

公开(公告)日：2012-01-24

申请号：US12161931

申请日：2007-01-19

申请人： Kenji Tomohara ,  Seiji Miyazaki ,  Mitsuhiro Koga ,  Makoto Matsumoto ,  Hiroshi Koga ,  Shinichi Sakamoto

发明人： Kenji Tomohara ,  Seiji Miyazaki ,  Mitsuhiro Koga ,  Makoto Matsumoto ,  Hiroshi Koga ,  Shinichi Sakamoto

IPC分类号： H02K1/06

CPC分类号： H02K1/148 ,  H02K15/022 ,  H02K2201/06 ,  Y10T29/49009

摘要： Split cores comprising laminated iron cores each having formed thereon a tooth, and a yoke and a pole piece which are connected to the tooth at both ends thereof, and arranged and connected together into an annular shape to make a stator. Both ends of the yokes and both ends of the pole pieces are displaced in one circumferential direction by laminated iron core from a top laminated layer of the iron cores of the split cores to a bottom laminated layer of the iron cores or split cores.

摘要翻译： 分离芯包括各自形成有齿的层叠铁芯，以及轭和极片，其两端连接到齿，并且被布置并连接在一起成环形以形成定子。 磁轭的两端和磁极片的两端在一个圆周方向上通过层叠的铁芯从分裂芯的铁芯的顶层叠层向铁芯或分裂芯的底层叠层移位。

公开(公告)号：US07365036B2

公开(公告)日：2008-04-29

申请号：US11746986

申请日：2007-05-10

申请人： Seiji Miyazaki ,  Kei Maeda

发明人： Seiji Miyazaki ,  Kei Maeda

IPC分类号： C03C10/02 ,  C03C10/04

CPC分类号： H01J29/028 ,  C03B32/02 ,  C03C8/24 ,  C03C10/0009 ,  C03C10/0036 ,  H01J9/185 ,  H01J29/864 ,  H01J2329/864 ,  Y02P40/57

摘要： Provided is a crystallized glass spacer for a field emission display resistant to charging with application of an electric field and resistant to chipping or cracking thanks to high fracture toughness.An SiO2—TiO2-based glass is subjected to a reduction and crystallization heat treatment at 600-900° C. in a hydrogen atmosphere or in a mixed atmosphere of hydrogen and nitrogen, to obtain a crystallized glass spacer for FED consisting essentially of, in molar percentage, SiO2: 20-50%, TiO2: 25-45%, MgO+CaO+SrO+BaO+ZnO: 20-50%, B2O3+Al2O3: 0-10% and ZrO2: 0-10%, and containing as a principal crystal at least one crystal selected from BaXTi8O16-based crystals (X=0.8-1.5), Ba2TiSi2O8-based crystals and TiO2-based crystals.

摘要翻译： 提供一种用于场致发射显示器的结晶玻璃间隔件，其耐电荷施加，并且由于高断裂韧性而耐碎裂或破裂。 在氢气气氛或氢气的混合气氛中，在600-900℃下进行SiO 2/2TiO 2基玻璃的还原和结晶热处理 和氮气，以获得基本上由SiO 2：20-50％，TiO 2：25-45％的摩尔百分比组成的FED的结晶玻璃间隔物，MgO + CaO + SrO + BaO + ZnO：20〜50％，B 2 O 3 + 3 + 2 + 3 0〜10％，ZrO 2：0〜10％，作为主晶体含有至少一种选自Ba x Ti 8 O 2的结晶， （X = 0.8-1.5），Ba 2 O 3 Si 2 O 2 O 8 - 基于晶体和TiO 2的晶体。

公开(公告)号：US20070225144A1

公开(公告)日：2007-09-27

申请号：US11746986

申请日：2007-05-10

申请人： Seiji MIYAZAKI ,  Kei MAEDA

发明人： Seiji MIYAZAKI ,  Kei MAEDA

IPC分类号： C03C10/02

CPC分类号： H01J29/028 ,  C03B32/02 ,  C03C8/24 ,  C03C10/0009 ,  C03C10/0036 ,  H01J9/185 ,  H01J29/864 ,  H01J2329/864 ,  Y02P40/57

摘要： Provided is a crystallized glass spacer for a field emission display resistant to charging with application of an electric field and resistant to chipping or cracking thanks to high fracture toughness. An SiO2—TiO2-based glass is subjected to a reduction and crystallization heat treatment at 600-900° C. in a hydrogen atmosphere or in a mixed atmosphere of hydrogen and nitrogen, to obtain a crystallized glass spacer for FED consisting essentially of, in molar percentage, SiO2: 20-50%, TiO2: 25-45%, MgO+CaO+SrO+BaO+ZnO: 20-50%, B2O3+Al2O3: 0-10% and ZrO2: 0-10%, and containing as a principal crystal at least one crystal selected from BaXTi8O16-based crystals (X=0.8-1.5), Ba2TiSi2O8-based crystals and TiO2-based crystals.

摘要翻译： 提供一种用于场致发射显示器的结晶玻璃间隔件，其耐电荷施加，并且由于高断裂韧性而耐碎裂或破裂。 在氢气气氛或氢气的混合气氛中，在600-900℃下进行SiO 2/2TiO 2基玻璃的还原和结晶热处理 和氮气，以获得基本上由SiO 2：20-50％，TiO 2：25-45％的摩尔百分比组成的FED的结晶玻璃间隔物，MgO + CaO + SrO + BaO + ZnO：20〜50％，B 2 O 3 + 3 + 2 + 3 0〜10％，ZrO 2：0〜10％，作为主晶体含有至少一种选自Ba x Ti 8 O 2的结晶， （X = 0.8-1.5），Ba 2 O 3 Si 2 O 2 O 8 - 基于晶体和TiO 2的晶体。

公开(公告)号：US06477254B1

公开(公告)日：2002-11-05

申请号：US09246845

申请日：1999-02-09

申请人： Seiji Miyazaki ,  Kazuo Takaragi

发明人： Seiji Miyazaki ,  Kazuo Takaragi

IPC分类号： H04L908

CPC分类号： H04L9/085 ,  H04L9/3066

摘要： In a data encryption/decryption method including an encryption step and a decryption step. In the encryption step, there are prepared n pairs of secret keys and public keys in a public-key cryptographic scheme, where n is a positive integer. A new key is generated in accordance with at least one of the public keys. Data is encrypted in a common-key cryptographic scheme by use of the new key. There is prepared a (k,n) threshold logic (k is an integer equal to or less than n) having terms associated with the new key and the n public keys. A calculation of the threshold logic is conducted by use of the new key and the n public keys, and encrypted data and a result of the calculation of the threshold logic are stored. In the decryption step, the new key is restored from k secret keys selected from the n secret keys and the stored result of the threshold logic calculation in accordance with a threshold reverse logic corresponding to the threshold logic and stored data is decrypted by the restored key in the common-key cryptographic scheme.

摘要翻译： 在包括加密步骤和解密步骤的数据加密/解密方法中。 在加密步骤中，在公钥加密方案中准备了n对密钥和公钥，其中n是正整数。 根据至少一个公共密钥生成新的密钥。 数据通过使用新密钥以公共密钥加密方案进行加密。 准备具有与新密钥和n个公钥相关联的术语的（k，n）阈值逻辑（k是等于或小于n的整数）。 通过使用新密钥和n个公钥进行阈值逻辑的计算，并且存储加密数据和阈值逻辑的计算结果。 在解密步骤中，根据与阈值逻辑相对应的阈值反向逻辑，从n个秘密密钥中选出的k个秘密密钥和阈值逻辑计算的存储结果中恢复新密钥，并且存储的数据被恢复的密钥解密 在共密密码方案中。

公开(公告)号：US06466668B1

公开(公告)日：2002-10-15

申请号：US09236590

申请日：1999-01-26

申请人： Seiji Miyazaki ,  Kazuo Takaragi

发明人： Seiji Miyazaki ,  Kazuo Takaragi

IPC分类号： H04L930

CPC分类号： G06F7/725 ,  G06F7/728

摘要： In an IC card incorporating residual multiplier hardware for implementing a high-speed algorithm for a residual multiplication arithmetic, a method and a device capable of executing public key encryption processing such as an elliptic curve encryption processing at a high speed. Residual arithmetic succeeding to generation of a random number and residual arithmetic in a signature generating processing can be executed by using a residual multiplier. Further, in order to use effectively the residual multiplier for arithmetic operation on an elliptic curve, the point on the elliptic curve is transformed from a two-dimensional affine coordinate system to a three-dimensional coordinate system. Additionally, multiplicative inverse arithmetic for realizing reverse transformation from the three-dimensional coordinate system to the two-dimensional affine coordinate system as well as for determining a signature s can be executed only with the residual multiplication arithmetic. By making use of the residual multiplier in this manner, the processing speed can be increased. Computation complexity can be reduced by storing previously those parameters which are used frequently and constant multiplies of a base point of the elliptic curve in the form of tables, which also contributes to increasing of processing speed.

摘要翻译： 在包含用于实现用于残余乘法运算的高速算法的残余乘法器硬件的IC卡中，能够以高速执行诸如椭圆曲线加密处理之类的公钥加密处理的方法和装置。 可以通过使用剩余乘数来执行在签名生成处理中继续生成随机数和残差算术的剩余算术。 此外，为了有效地使用用于椭圆曲线上的算术运算的剩余乘数，将椭圆曲线上的点从二维仿射坐标系变换为三维坐标系。 另外，用于实现从三维坐标系到二维仿射坐标系的反向变换以及用于确定签名s的乘法逆运算只能用剩余乘法运算来执行。 通过以这种方式利用剩余乘数，可以提高处理速度。 可以通过先前存储经常使用的那些参数和椭圆曲线的基点的恒定倍数以表的形式来减少计算复杂度，这也有助于提高处理速度。

公开(公告)号：US5793472A

公开(公告)日：1998-08-11

申请号：US940287

申请日：1997-09-30

申请人： Kazuhiko Hori ,  Kei Nara ,  Seiji Miyazaki

发明人： Kazuhiko Hori ,  Kei Nara ,  Seiji Miyazaki

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/20 ,  G03F7/70466 ,  G03F9/70 ,  G03F9/7076

摘要： Alignment between a mask and a photosensitive substrate is performed using a first reference mark formed on the mask and a second reference mark formed on the photosensitive substrate. After that, the mask and the photosensitive substrate are relatively moved, so that an image of one of a light-shielding pattern and a light-transmitting pattern formed at a position different from the first reference mark on the mask is formed on the second reference mark on the photosensitive substrate. Then, a circuit pattern formed on the mask is transferred onto the photosensitive substrate, and a partial region including the second reference mark is exposed with the image of one of the light-shielding pattern and the light-transmitting pattern.

摘要翻译： 使用形成在掩模上的第一参考标记和形成在感光基板上的第二参考标记来执行掩模和感光基板之间的对准。 之后，掩模和感光基片相对移动，使得形成在与掩模上的第一基准标记不同的位置上的遮光图案和透光图案之一的图像形成在第二基准 在感光基板上标记。 然后，将形成在掩模上的电路图案转印到感光基板上，并且利用遮光图案和透光图案之一的图像露出包括第二参考标记的部分区域。

公开(公告)号：US5760881A

公开(公告)日：1998-06-02

申请号：US540458

申请日：1995-10-10

申请人： Seiji Miyazaki ,  Kei Nara ,  Hiroshi Shirasu ,  Tsuyoshi Narabe

发明人： Seiji Miyazaki ,  Kei Nara ,  Hiroshi Shirasu ,  Tsuyoshi Narabe

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70216 ,  G03F7/70358 ,  G03F9/70

摘要： An exposure apparatus, having an illumination optical system for radiating a light beam from a light source to a pattern area of a mask for transferring the image of the pattern area onto a photosensitive substrate by the light beam passing through the mask, is provided with plural sets of a first reference mark and a second reference mark arranged on the mask and the photosensitive substrate at positions corresponding to each other, and a light-shielding device for shielding the light beams radiated toward the second reference marks, whereby it is possible to re-use the second reference marks in a post-process by preventing the first reference marks on the mask from being superposed on the second reference marks on the photosensitive substrate or from being transferred onto a part near the second reference marks.

摘要翻译： 一种曝光装置，具有照明光学系统，用于将来自光源的光束照射到掩模的图案区域，用于通过通过掩模的光束将图案区域的图像转印到感光基板上，具有多个 设置在彼此对应的位置处的掩模和感光基板上的第一参考标记和第二参考标记的集合，以及用于屏蔽朝向第二参考标记辐射的光束的遮光装置，由此可以重新 - 通过防止掩模上的第一参考标记叠加在感光基板上的第二参考标记上或者被转印到靠近第二参考标记的部分上，从而在后处理中使用第二参考标记。

公开(公告)号：US5625436A

公开(公告)日：1997-04-29

申请号：US689691

申请日：1996-08-13

申请人： Masamitsu Yanagihara ,  Susumu Mori ,  Tsuyoshi Naraki ,  Masami Seki ,  Seiji Miyazaki ,  Tsuyoshi Narabe ,  Hiroshi Chiba

发明人： Masamitsu Yanagihara ,  Susumu Mori ,  Tsuyoshi Naraki ,  Masami Seki ,  Seiji Miyazaki ,  Tsuyoshi Narabe ,  Hiroshi Chiba

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/70275 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70358 ,  G03F7/70858 ,  G03F7/70883 ,  G03F9/70

摘要： In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification.

摘要翻译： 在扫描型曝光装置中，通过以与所述掩模和所述基板相对于所述投影光学系统的倍率相对于投影光学系统沿预定方向扫描所述掩模上的图案区域的整个表面， 提供了多个照明光学系统，用于利用来自各个光源的各个光束照射掩模上的图案区域的各个区域; 多个投影光学系统被布置为对应于各个照明光学系统，所述投影光学系统将由各个照明光学系统照射的区域的各个图像投射到所述基板上的相应的投影区域上; 用于获取和存储基板的形状变化的存储装置; 放大率改变装置，用于根据基板的形状变化来改变至少一个投影光学系统的放大率; 以及成像位置改变装置，用于根据放大率的变化改变经由至少一个投影光学系统投影的所述图像的位置。

公开(公告)号：US5602620A

公开(公告)日：1997-02-11

申请号：US490212

申请日：1995-06-14

申请人： Seiji Miyazaki ,  Kei Nara ,  Masami Seki ,  Masamitsu Yanagihara

发明人： Seiji Miyazaki ,  Kei Nara ,  Masami Seki ,  Masamitsu Yanagihara

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G01B11/00

CPC分类号： G03F9/7003 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70475 ,  G03F7/70791 ,  G03F9/70

摘要： The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction. Then a relative displacement is given by an amount of the orthogonality error between positions of images projected through a first optical system and positions of images projected through a second optical system, and relative positions of the mask and the photosensitive substrate are continuously changed by the amount of the orthogonality error in the first direction in accordance with the position of the mask or photosensitive substrate in the scanning direction.

摘要翻译： 本发明涉及扫描曝光装置和曝光方法，以通过校正掩模或感光基底上的图案的正交性误差来将掩模上的多个区域的图像同时投影到感光基板上。 如果掩模或感光基板上的图案具有在沿着扫描方向进入垂直于扫描方向的第一方向上产生一定角度的偏差的正交性误差，则掩模和感光基板相对于彼此旋转 其平面将每个图案的坐标系中的一个坐标轴与第一方向对齐。 然后通过第一光学系统投影的图像的位置和通过第二光学系统投影的图像的位置之间的正交性误差的量给出相对位移，并且掩模和感光基板的相对位置连续地改变量 根据掩模或感光基板在扫描方向上的位置，在第一方向上的正交性误差。