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公开(公告)号：US20080085475A1
公开(公告)日：2008-04-10
申请号：US11869137
申请日：2007-10-09
Applicant: Ting Tao , Kevin Ray , Scott Beckley , Paul West
Inventor： Ting Tao , Kevin Ray , Scott Beckley , Paul West
IPC: G03C5/30
CPC classification number: G03F7/322 , B41C1/1008 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/22 , B41C2210/24 , B41N3/06
Abstract: Negative-working imagable elements can be imaged and then developed using a lower pH organic-based single-phase developer that is less toxic and corrosive and that can be more readily disposed of after use. This developer has a pH less than 12 and comprises a) an amphoteric surfactant comprising a nitrogen-containing heterocycle, b) an amphoteric surfactant having two or more nitrogen atoms, or c) an amphoteric surfactant of a) and an amphoteric surfactant of b).
Abstract translation: 负性工作的可成像元件可以成像，然后使用较低pH值的基于有机物的单相显影剂显影，其毒性和腐蚀性较差，并且在使用后可以更容易地处理。 该显影剂的pH小于12，包括a）包含含氮杂环的两性表面活性剂，b）具有两个或更多个氮原子的两性表面活性剂，或c）a）的两性表面活性剂和b）的两性表面活性剂， 。
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32.发明申请公开(公告)号：US20080044758A1
公开(公告)日：2008-02-21
申请号：US11494235
申请日：2006-07-27
Applicant: Ting Tao , Scott A. Beckley
Inventor： Ting Tao , Scott A. Beckley
IPC: G03C1/00
CPC classification number: G03F7/033 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/10 , B41C2210/12 , B41C2210/22 , B41C2210/24 , C08F8/14 , C08F2810/30 , C09D4/06 , G03F7/0388 , Y10S430/111 , Y10S430/165 , C08F220/02
Abstract: A radiation-sensitive composition and negative-working imageable element includes a polymeric binder comprising pendant allyl ester groups to provide solvent resistance, excellent digital speed (sensitivity) and can be imaged and developed without a preheat step to provide lithographic printing plates. The polymeric binder can be prepared with a precursor polymer having pendant carboxy groups that are converted to allyl ester groups using an allyl-containing halide in the presence of a base in order to avoid gelation.
Abstract translation: 辐射敏感组合物和负性可成像元件包括聚合物粘合剂，其包含侧链烯丙基酯基团以提供耐溶剂性，优异的数字速度（敏感性），并且可以在没有预热步骤的情况下成像和显影以提供平版印刷版。 聚合物粘合剂可以用具有侧基羧基的前体聚合物制备，其在碱的存在下使用含烯丙基的卤化物转化为烯丙基酯基，以避免凝胶化。
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33.发明授权公开(公告)号：US07332253B1
公开(公告)日：2008-02-19
申请号：US11494235
申请日：2006-07-27
Applicant: Ting Tao , Scott A. Beckley
Inventor： Ting Tao , Scott A. Beckley
CPC classification number: G03F7/033 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/10 , B41C2210/12 , B41C2210/22 , B41C2210/24 , C08F8/14 , C08F2810/30 , C09D4/06 , G03F7/0388 , Y10S430/111 , Y10S430/165 , C08F220/02
Abstract: A radiation-sensitive composition and negative-working imageable element includes a polymeric binder comprising pendant allyl ester groups to provide solvent resistance, excellent digital speed (sensitivity) and can be imaged and developed without a preheat step to provide lithographic printing plates. The polymeric binder can be prepared with a precursor polymer having pendant carboxy groups that are converted to allyl ester groups using an allyl-containing halide in the presence of a base in order to avoid gelation.
Abstract translation: 辐射敏感组合物和负性可成像元件包括聚合物粘合剂，其包含侧链烯丙基酯基团以提供耐溶剂性，优异的数字速度（敏感性），并且可以在没有预热步骤的情况下成像和显影以提供平版印刷版。 聚合物粘合剂可以用具有侧基羧基的前体聚合物制备，其在碱的存在下使用含烯丙基的卤化物转化为烯丙基酯基，以避免凝胶化。
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公开(公告)号：US07326521B1
公开(公告)日：2008-02-05
申请号：US11513995
申请日：2006-08-31
Applicant: Ting Tao , Kevin B. Ray , Scott A. Beckley , Paul R. West
Inventor： Ting Tao , Kevin B. Ray , Scott A. Beckley , Paul R. West
CPC classification number: G03F7/322 , B41C1/1008 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/22 , B41C2210/24 , B41N3/06
Abstract: Negative-working imageable elements can be imaged and then developed using a lower pH organic-based single-phase developer that is less toxic and corrosive and that can be more readily disposed of after use. This developer has a pH less than 12 and comprises a) an amphoteric surfactant comprising a nitrogen-containing heterocycle, b) an amphoteric surfactant having two or more nitrogen atoms, or c) an amphoteric surfactant of a) and an amphoteric surfactant of b).
Abstract translation: 负性工作的可成像元件可以成像，然后使用较低毒性和腐蚀性的较低pH的基于有机的单相显影剂显影，并且使用后可以更容易地处理。 该显影剂的pH小于12，包括a）包含含氮杂环的两性表面活性剂，b）具有两个或更多个氮原子的两性表面活性剂，或c）a）的两性表面活性剂和b）的两性表面活性剂， 。
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公开(公告)号：US07300726B1
公开(公告)日：2007-11-27
申请号：US11551259
申请日：2006-10-20
Applicant: Jayanti Patel , Shashikant Saraiya , Ting Tao
Inventor： Jayanti Patel , Shashikant Saraiya , Ting Tao
CPC classification number: B41C1/1016 , B41C2201/04 , B41C2201/14 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41M5/368 , Y10S430/165
Abstract: Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a combination of two different polymeric binders one of which has an acid number of at least 30, which combination of polymers provides improved post-development bakeability (more quickly baked or cured at lower temperatures) and desired digital speed with no loss in chemical resistance.
Abstract translation: 正性可成像元件包括辐射吸收化合物和在具有亲水表面的基底上的内层和外层。 内层包含两种不同聚合物粘合剂的组合，其中一种具有至少30的酸值，聚合物的组合提供了改进的显影后烘烤性（在较低温度下更快地烘烤或固化）和所需的数字速度，没有损失 耐化学性。
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Patent Agency Ranking
公开(公告)号：US07172850B2
公开(公告)日：2007-02-06
申请号：US10891727
申请日：2004-07-15
Applicant: Heidi M. Munnelly , Kevin B. Ray , Ting Tao , Shashikant Saraiya , Kouji Hayashi , Jianbing Huang
Inventor： Heidi M. Munnelly , Kevin B. Ray , Ting Tao , Shashikant Saraiya , Kouji Hayashi , Jianbing Huang
IPC: G03F7/028 , G03F7/033 , G03F7/09 , G03F7/00 , C08F220/44
CPC classification number: B41C1/1008 , B41C2210/04 , B41C2210/08 , B41C2210/22 , B41C2210/24 , B41M5/368 , G03F7/0212 , G03F7/033 , Y10S430/111 , Y10S430/145
Abstract: The present invention provides an imageable element including a lithographic substrate and an imageable layer disposed on the substrate. The imageable layer includes a radically polymerizable component, an initiator system capable of generating radicals sufficient to initiate a polymerization reaction upon exposure to imaging radiation, and a polymeric binder having a hydrophobic backbone and including both constitutional units having a pendant cyano group attached directly to the hydrophobic backbone, and constitutional units having a pendant group including a hydrophilic poly(alkylene oxide) segment. The invention also provides a method for preparing a suitable polymeric binder. The method comprises contacting a combination of co-monomers in a solvent mixture consisting essentially of a (C1–C6) alkanol and water.
Abstract translation: 本发明提供一种可成像元件，包括平版印刷基板和设置在基板上的可成像层。 可成像层包括可自由基聚合的组分，能够产生足以在暴露于成像辐射时引发聚合反应的自由基的引发剂体系，以及具有疏水骨架的聚合物粘合剂，并且包括具有氰基侧基的两个结构单元直接连接到 疏水骨架和具有包括亲水性聚（环氧烷）链段）侧基的结构单元。 本发明还提供了制备合适的聚合物粘合剂的方法。 该方法包括将基本上由（C 1 -C 12 -C 6）烷醇组成的溶剂混合物中的共聚单体的组合与水接触。
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公开(公告)号：US07060409B2
公开(公告)日：2006-06-13
申请号：US10384988
申请日：2003-03-10
Applicant: Ting Tao , Jeffrey James Collins , Thomas Jordan , Scott A. Beckley
Inventor： Ting Tao , Jeffrey James Collins , Thomas Jordan , Scott A. Beckley
CPC classification number: B41M5/368 , B41C1/1008 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
Abstract: Imageable elements with improved dot stability are disclosed. The imageable elements comprise a layer of an imageable composition over a support. The imageable composition comprises an infrared absorbing compound, an acid generator, an acid activatable crosslinking agent, a polymeric binder, and about 0.01 wt % to 1 wt % of an added onium compound. The elements may be thermally imaged and developed to produce images useful as lithographic printing plates.
Abstract translation: 公开了具有改善的点稳定性的可成像元件。 可成像元件包括在支撑件上的可成像组合物的层。 可成像组合物包含红外吸收化合物，酸产生剂，可酸活化的交联剂，聚合物粘合剂和约0.01重量％至1重量％的加入的鎓化合物。 元件可以被热成像和显影以产生用作平版印刷版的图像。
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公开(公告)号：US20060073415A1
公开(公告)日：2006-04-06
申请号：US10958957
申请日：2004-10-05
Applicant: Jayanti Patel , Ting Tao , Scott Beckley , John Kalamen
Inventor： Jayanti Patel , Ting Tao , Scott Beckley , John Kalamen
IPC: G03C1/76
CPC classification number: B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , C08F212/10 , C08F220/44 , C08L83/04 , C09D125/14 , Y10S430/106 , Y10S430/108 , Y10S430/111 , Y10S430/165 , C08L2666/14
Abstract: Multilayer, thermally imageable elements useful as lithographic printing plate precursors are disclosed. The imageable elements comprise a substrate, an underlayer over the substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer contains a co-polymer that alkylene glycol side chains, polyalkylene glycol side chains, side chains that have silyl groups substituted with three alkoxy and/or phenoxy groups, and/or side chains that have alkyl ammonium side chains. The imageable elements have excellent resistance to press room chemicals.
Abstract translation: 公开了可用作平版印刷版前体的多层可热成像元件。 可成像元件包括衬底，衬底上的底层，衬底上的底层，以及衬底上的顶层。 顶层包含具有亚烷基二醇侧链，聚亚烷基二醇侧链，具有被三个烷氧基和/或苯氧基取代的甲硅烷基的侧链和/或具有烷基铵侧链的侧链的共聚物。 可成像元件具有优异的耐冲击室化学品。
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公开(公告)号：US07014983B1
公开(公告)日：2006-03-21
申请号：US10958957
申请日：2004-10-05
Applicant: Jayanti Patel , Ting Tao , Scott Beckley , John Kalamen
Inventor： Jayanti Patel , Ting Tao , Scott Beckley , John Kalamen
CPC classification number: B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , C08F212/10 , C08F220/44 , C08L83/04 , C09D125/14 , Y10S430/106 , Y10S430/108 , Y10S430/111 , Y10S430/165 , C08L2666/14
Abstract: Multilayer, thermally imageable elements useful as lithographic printing plate precursors are disclosed. The imageable elements comprise a substrate, an underlayer over the substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer contains a co-polymer that alkylene glycol side chains, polyalkylene glycol side chains, side chains that have silyl groups substituted with three alkoxy and/or phenoxy groups, and/or side chains that have alkyl ammonium side chains. The imageable elements have excellent resistance to press room chemicals.
Abstract translation: 公开了可用作平版印刷版前体的多层可热成像元件。 可成像元件包括衬底，衬底上的底层，衬底上的底层，以及衬底上的顶层。 顶层包含具有亚烷基二醇侧链，聚亚烷基二醇侧链，具有被三个烷氧基和/或苯氧基取代的甲硅烷基的侧链和/或具有烷基铵侧链的侧链的共聚物。 可成像元件具有优异的耐冲击室化学品。
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40.发明授权Selected polymeric sulfonate acid generators and their use in processes for imaging radiation-sensitive elements 失效选择的聚合磺酸产酸剂及其在辐射敏感元件成像过程中的应用公开(公告)号：US06977131B2
公开(公告)日：2005-12-20
申请号：US10159891
申请日：2002-05-30
Applicant: Ting Tao
Inventor： Ting Tao
CPC classification number: B41C1/1008 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/0045 , G03F7/038 , Y10S430/115 , Y10S430/118 , Y10S430/128
Abstract: A radiation-sensitive patterning composition comprising: (1) at least one acid generating compound selected from the group of compounds of formulae (I) or (II): wherein R1, R2, R3, R4, R5, and R6, are individually selected from the group consisting of a hydrogen atom, nitro group, hydroxyl group, a carbonyl group, a halogen atom, a cyano group and an unsubstituted or substituted alkyl group, an unsubstituted or substituted cycloalkyl group; an unsubstituted or substituted alkoxy group, or an unsubstituted or substituted aryl group; wherein X+ represents an onium ion selected from the group consisting of diazonium, iodonium, sulfonium, phosphonium, bromonium, chloronium, oxysulfoxonium, oxysulfonium, sulfoxonium, selenium, tellurium and arsenium; and wherein n is an integer from 4 to 100; (2) at least one cross-linking agent cross-linkable by an acid; (3) at least one polymer compound capable of reacting with the cross-linking agent; and (4) at least one infrared absorbing compound.
Abstract translation: 一种辐射敏感性图案化组合物，其包含：（1）至少一种选自式（I）或（II）的化合物的产酸化合物：其中R 1，R 2， R 3，R 3，R 4，R 5和R 6各自独立地选自 由氢原子，硝基，羟基，羰基，卤素原子，氰基和未取代或取代的烷基组成的基团，未取代或取代的环烷基; 未取代或取代的烷氧基，或未取代或取代的芳基; 其中X + +表示选自重氮，碘鎓，锍，鏻，溴鎓，氯鎓，氧化亚砜，氧锍，氧化锍，硒，碲和砷的鎓离子; 并且其中n为4至100的整数; （2）至少一种可被酸交联的交联剂; （3）能够与交联剂反应的至少一种高分子化合物; 和（4）至少一种红外吸收化合物。
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