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公开(公告)号:US20230032854A1
公开(公告)日:2023-02-02
申请号:US17965491
申请日:2022-10-13
Applicant: Applied Materials, Inc.
Inventor: Charles T. Carlson , Jason M. Schaller , Luke Bonecutter , David Blahnik
IPC: H01L21/67 , B65G47/90 , H01L21/687 , H01L21/68
Abstract: Exemplary substrate processing systems may include a transfer region housing defining an internal volume. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft concentric with and counter-rotatable to the first shaft. The transfer apparatus may include a first end effector coupled with the first shaft. The first end effector may include a plurality of first arms. The transfer apparatus may also include a second end effector coupled with the second shaft. The second end effector may include a plurality of second arms having a number of second arms equal to the number of first arms of the first end effector.
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公开(公告)号:US11476135B2
公开(公告)日:2022-10-18
申请号:US16922447
申请日:2020-07-07
Applicant: Applied Materials, Inc.
Inventor: Charles T. Carlson , Jason M. Schaller , Luke Bonecutter , David Blahnik
IPC: H01L21/68 , H01L21/67 , B65G47/90 , H01L21/687
Abstract: Exemplary substrate processing systems may include a transfer region housing defining an internal volume. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft concentric with and counter-rotatable to the first shaft. The transfer apparatus may include a first end effector coupled with the first shaft. The first end effector may include a plurality of first arms. The transfer apparatus may also include a second end effector coupled with the second shaft. The second end effector may include a plurality of second arms having a number of second arms equal to the number of first arms of the first end effector.
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公开(公告)号:US20210343500A1
公开(公告)日:2021-11-04
申请号:US17378327
申请日:2021-07-16
Applicant: APPLIED Materials, Inc.
Inventor: Costel Biloiu , Michael Honan , Robert B. Vopat , David Blahnik , Charles T. Carlson , Frank Sinclair , Paul Murphy
IPC: H01J37/30 , H01J37/317 , H01J23/213 , H01J23/18 , H01J25/02 , H01J25/58 , H01J37/32 , H01P7/00 , H01P7/08 , H01P7/06
Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.
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公开(公告)号:US11094504B2
公开(公告)日:2021-08-17
申请号:US16734746
申请日:2020-01-06
Applicant: APPLIED Materials, Inc.
Inventor: Costel Biloiu , Michael Honan , Robert B Vopat , David Blahnik , Charles T. Carlson , Frank Sinclair , Paul Murphy
IPC: H01J37/30 , H01J37/317 , H01J23/213 , H01J23/18 , H01J25/02 , H01J25/58 , H01J37/32 , H01P7/00 , H01P7/08 , H01P7/06
Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.
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公开(公告)号:US10991547B2
公开(公告)日:2021-04-27
申请号:US16582261
申请日:2019-09-25
Applicant: APPLIED Materials, Inc.
Inventor: Morgan Evans , Charles T. Carlson , Rutger Meyer Timmerman Thijssen , Ross Bandy , Ryan Magee
IPC: B81C1/00 , G02B5/18 , H01L21/3065 , H01L21/308 , H01J37/305
Abstract: A carrier proximity mask and methods of assembling and using the carrier proximity mask may include providing a first carrier body, second carrier body, and set of one or more clamps. The first carrier body may have one or more openings formed as proximity masks to form structures on a first side of a substrate. The first and second carrier bodies may have one or more contact areas to align with one or more contact areas on a first and second sides of the substrate. The set of one or more clamps may clamp the substrate between the first carrier body and the second carrier body at contact areas to suspend work areas of the substrate between the first and second carrier bodies. The openings to define edges to convolve beams to form structures on the substrate.
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公开(公告)号:US20210090858A1
公开(公告)日:2021-03-25
申请号:US16582261
申请日:2019-09-25
Applicant: APPLIED Materials, Inc.
Inventor: Morgan Evans , Charles T. Carlson , Rutger Meyer Timmerman Thijssen , Ross Bandy , Ryan Magee
IPC: H01J37/305 , G02B5/18
Abstract: A carrier proximity mask and methods of assembling and using the carrier proximity mask may include providing a first carrier body, second carrier body, and set of one or more clamps. The first carrier body may have one or more openings formed as proximity masks to form structures on a first side of a substrate. The first and second carrier bodies may have one or more contact areas to align with one or more contact areas on a first and second sides of the substrate. The set of one or more clamps may clamp the substrate between the first carrier body and the second carrier body at contact areas to suspend work areas of the substrate between the first and second carrier bodies. The openings to define edges to convolve beams to form structures on the substrate.
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公开(公告)号:US20210090843A1
公开(公告)日:2021-03-25
申请号:US16582249
申请日:2019-09-25
Applicant: APPLIED Materials, Inc.
Inventor: Morgan Evans , Charles T. Carlson , Rutger Meyer Timmerman Thijssen , Ross Bandy
IPC: H01J37/09 , H01J37/305
Abstract: A carrier proximity mask and methods of assembling and using the carrier proximity mask may include providing a first carrier body, second carrier body, and set of one or more clamps. The first carrier body may have one or more openings formed as proximity masks to form structures on a first side of a substrate. The first and second carrier bodies may have one or more contact areas to align with one or more contact areas on a first and second sides of the substrate. The set of one or more clamps may clamp the substrate between the first carrier body and the second carrier body at contact areas to suspend work areas of the substrate between the first and second carrier bodies. The openings to define edges to convolve beams to form structures on the substrate.
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公开(公告)号:US20210033197A1
公开(公告)日:2021-02-04
申请号:US16936012
申请日:2020-07-22
Applicant: Applied Materials, Inc.
Inventor: Benjamin Riordon , Anatha K. Subramani , Charles T. Carlson
Abstract: Described are isolation valves, and chamber systems incorporating and methods of using the isolation valves. In some embodiments, an isolation valve may include a valve body and a flapper assembly. The valve body may define a first fluid volume, a second fluid volume, and a seating surface. The flapper assembly may include a flapper disposed inside the valve body having a flapper surface complimentary to the seating surface. The flapper may be pivotable within the valve body to a first position such that the flapper surface may be away from the seating surface to allow fluid flow between the first fluid volume and the second fluid volume. The flapper may be pivotable within the valve body to a second position such that the flapper surface may be proximate the seating surface to form a non-contact seal to restrict fluid flow between the first fluid volume and the second fluid volume.
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公开(公告)号:US20210013067A1
公开(公告)日:2021-01-14
申请号:US16922447
申请日:2020-07-07
Applicant: Applied Materials, Inc.
Inventor: Charles T. Carlson , Jason M. Schaller , Luke Bonecutter , David Blahnik
IPC: H01L21/67 , B65G47/90 , H01L21/68 , H01L21/687
Abstract: Exemplary substrate processing systems may include a transfer region housing defining an internal volume. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft concentric with and counter-rotatable to the first shaft. The transfer apparatus may include a first end effector coupled with the first shaft. The first end effector may include a plurality of first arms. The transfer apparatus may also include a second end effector coupled with the second shaft. The second end effector may include a plurality of second arms having a number of second arms equal to the number of first arms of the first end effector.
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公开(公告)号:US20240145271A1
公开(公告)日:2024-05-02
申请号:US17977422
申请日:2022-10-31
Applicant: Applied Materials, Inc.
Inventor: Jason M. Schaller , Michael Carrell , William T. Weaver , Charles T. Carlson
IPC: H01L21/67 , H01L21/677 , H01L21/687
CPC classification number: H01L21/67201 , H01L21/67718 , H01L21/68707
Abstract: A system for transferring semiconductor workpieces from a load lock to an orientation station and onto a platen is disclosed. The system comprises two load locks, a multi-workpiece orientation station, two multi-pick robots that transfer a plurality of workpieces between a respective load lock and the multi-workpiece orientation station, and two backend robots that transfer individual workpieces between the multi-workpiece orientation station and the platen.
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