公开(公告)号：US12074042B2

公开(公告)日：2024-08-27

申请号：US18161968

申请日：2023-01-31

申请人： Applied Materials, Inc.

发明人： Jason M. Schaller ,  Steve Hongkham ,  Charles T. Carlson ,  Tuan A. Nguyen ,  Swaminathan T. Srinivasan ,  Khokan Chandra Paul

IPC分类号： H01L21/67 ,  H01L21/687

CPC分类号： H01L21/6719 ,  H01L21/67167 ,  H01L21/68707 ,  H01L21/68742

摘要： Exemplary substrate processing systems may include a factory interface and a load lock coupled with the factory interface. The systems may include a transfer chamber coupled with the load lock. The transfer chamber may include a robot configured to retrieve substrates from the load lock. The systems may include a chamber system positioned adjacent and coupled with the transfer chamber. The chamber system may include a transfer region laterally accessible to the robot. The transfer region may include a plurality of substrate supports disposed about the transfer region. Each substrate support of the plurality of substrate supports may be vertically translatable. The transfer region may also include a transfer apparatus rotatable about a central axis and configured to engage substrates and transfer substrates among the plurality of substrate supports. The chamber system may also include a plurality of processing regions vertically offset and axially aligned with an associated substrate support.

公开(公告)号：US20240170251A1

公开(公告)日：2024-05-23

申请号：US17993566

申请日：2022-11-23

申请人： Applied Materials, Inc.

发明人： William Herron Park, JR. ,  Charles T. Carlson ,  Luke Bonecutter

IPC分类号： H01J37/317 ,  C23C14/48

CPC分类号： H01J37/3171 ,  C23C14/48 ,  H01J2237/0473

摘要： An ion implantation system including an ion source for generating an ion beam, an end station for holding a substrate to be implanted by the ion beam, and a linear accelerator disposed between the ion source and the end station and adapted to accelerate the ion beam, the linear accelerator including at least one acceleration stage including a resonator and a resonator coil disposed within a resonator chamber, wherein the resonator coil is a tubular body having a plurality of coaxial layers, including an inner layer, a middle layer, and an outer layer, wherein the outer layer is formed of a dielectric material.

公开(公告)号：US11948817B2

公开(公告)日：2024-04-02

申请号：US17965491

申请日：2022-10-13

申请人： Applied Materials, Inc.

发明人： Charles T. Carlson ,  Jason M. Schaller ,  Luke Bonecutter ,  David Blahnik

IPC分类号： H01L21/67 ,  B65G47/90 ,  H01L21/68 ,  H01L21/687

CPC分类号： H01L21/67196 ,  B65G47/907 ,  H01L21/68 ,  H01L21/68707 ,  H01L21/67167

摘要： Exemplary substrate processing systems may include a transfer region housing defining an internal volume. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft concentric with and counter-rotatable to the first shaft. The transfer apparatus may include a first end effector coupled with the first shaft. The first end effector may include a plurality of first arms. The transfer apparatus may also include a second end effector coupled with the second shaft. The second end effector may include a plurality of second arms having a number of second arms equal to the number of first arms of the first end effector.

公开(公告)号：US20230124350A1

公开(公告)日：2023-04-20

申请号：US17506185

申请日：2021-10-20

申请人： Applied Materials, Inc.

发明人： Costel Biloiu ,  David T. Blahnik ,  Wai-Ming Tam ,  Charles T. Carlson ,  Frank Sinclair

IPC分类号： H05H7/02 ,  H05H9/00 ,  H05H7/12

摘要： An exciter for a high frequency resonator. The exciter may include an exciter coil inner portion, extending along an exciter axis, an exciter coil loop, disposed at a distal end of the exciter coil inner portion. The exciter may also include a drive mechanism, including at least a rotation component to rotate the exciter coil loop around the exciter axis.

公开(公告)号：US11596051B2

公开(公告)日：2023-02-28

申请号：US17108747

申请日：2020-12-01

申请人： Applied Materials, Inc.

发明人： Costel Biloiu ,  Charles T. Carlson ,  Frank Sinclair ,  Paul J. Murphy ,  David T. Blahnik

IPC分类号： H05H7/22 ,  H01J37/317

摘要： An apparatus may include a drift tube assembly, arranged to transmit an ion beam. The drift tube assembly may include a first ground electrode; an RF drift tube assembly, disposed downstream of the first ground electrode; and a second ground electrode, disposed downstream of the RF drift tube assembly. The RF drift tube assembly may define a triple gap configuration. The apparatus may include a resonator, where the resonator comprises a toroidal coil, having a first end, connected to a first RF drift tube of the RF drift tube assembly, and a second end, connected to a second RF drift tube of the RF drift tube assembly.

公开(公告)号：US20220009106A1

公开(公告)日：2022-01-13

申请号：US17473188

申请日：2021-09-13

申请人： Applied Materials, Inc.

发明人： Paul Z. Wirth ,  Charles T. Carlson ,  Jason M. Schaller

IPC分类号： B25J11/00 ,  B25J9/12 ,  B25J9/00 ,  H01L21/687 ,  B25J9/04 ,  H01L21/677

摘要： Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a transfer apparatus having a central hub including a shaft extending at a distal end through the transfer region housing into the transfer region. The transfer apparatus may include a lateral translation apparatus coupled with an exterior surface of the transfer region housing, and configured to provide at least one direction of lateral movement of the shaft. The systems may also include an end effector coupled with the shaft within the transfer region. The end effector may include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports in the transfer region.

公开(公告)号：US20210013068A1

公开(公告)日：2021-01-14

申请号：US16922536

申请日：2020-07-07

申请人： Applied Materials, Inc.

发明人： Jason M. Schaller ,  Charles T. Carlson ,  Luke Bonecutter ,  David Blahnik ,  Karuppasamy Muthukamatchi ,  Jeff Hudgens ,  Benjamin Riordon

IPC分类号： H01L21/67 ,  B65G47/90 ,  H01L21/68 ,  H01L21/687

摘要： Exemplary substrate processing systems may include a transfer region housing defining a transfer region, and including substrate supports and a transfer apparatus. The transfer apparatus may include a central hub having a housing, and including a first shaft and a second shaft. The housing may be coupled with the second shaft, and may define an internal housing volume. The transfer apparatus may include a plurality of arms equal to a number of substrate supports of the plurality of substrate supports. Each arm of the plurality of arms may be coupled about an exterior of the housing. The transfer apparatus may include a plurality of arm hubs disposed within the internal housing volume. Each arm hub of the plurality of arm hubs may be coupled with an arm of the plurality of arms through the housing. The arm hubs may be coupled with the first shaft of the central hub.

公开(公告)号：US20210008727A1

公开(公告)日：2021-01-14

申请号：US16922805

申请日：2020-07-07

申请人： Applied Materials, Inc.

发明人： Paul Z. Wirth ,  Charles T. Carlson ,  Jason M. Schaller

IPC分类号： B25J11/00 ,  B25J9/00 ,  B25J9/12

摘要： Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a transfer apparatus having a central hub including a shaft extending at a distal end through the transfer region housing into the transfer region. The transfer apparatus may include a lateral translation apparatus coupled with an exterior surface of the transfer region housing, and configured to provide at least one direction of lateral movement of the shaft. The systems may also include an end effector coupled with the shaft within the transfer region. The end effector may include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports in the transfer region.

公开(公告)号：US10854483B2

公开(公告)日：2020-12-01

申请号：US16157808

申请日：2018-10-11

申请人： Applied Materials, Inc.

发明人： Jason M. Schaller ,  Robert Brent Vopat ,  Charles T. Carlson ,  Jeffrey Charles Blahnik ,  Timothy J. Franklin ,  David Blahnik ,  Aaron Webb

IPC分类号： F27D1/18 ,  H01L21/67 ,  H01L21/673 ,  H01L21/687

摘要： Apparatuses for annealing semiconductor substrates, such as a batch processing chamber, are provided herein. The batch processing chamber includes a chamber body enclosing an internal volume, a cassette moveably disposed within the internal volume and a plug coupled to a bottom wall of the cassette. The chamber body has a hole through a bottom wall of the chamber body and is interfaced with one or more heaters operable to maintain the chamber body at a temperature of greater than 290° C. The cassette is configured to be raised to load a plurality of substrates thereon and lowered to seal the internal volume. The plug is configured to move up and down within the internal volume. The plug includes a downward-facing seal configured to engage with a top surface of the bottom wall of the chamber body and close the hole through the bottom wall of the chamber body.

公开(公告)号：US11982359B2

公开(公告)日：2024-05-14

申请号：US16936012

申请日：2020-07-22

申请人： Applied Materials, Inc.

发明人： Benjamin Riordon ,  Anantha K. Subramani ,  Charles T. Carlson

IPC分类号： F16K1/20 ,  F16K49/00 ,  H01L21/67

CPC分类号： F16K1/2042 ,  F16K1/2007 ,  F16K49/005 ,  H01L21/67017

摘要： Described are isolation valves, and chamber systems incorporating and methods of using the isolation valves. In some embodiments, an isolation valve may include a valve body and a flapper assembly. The valve body may define a first fluid volume, a second fluid volume, and a seating surface. The flapper assembly may include a flapper disposed inside the valve body having a flapper surface complimentary to the seating surface. The flapper may be pivotable within the valve body to a first position such that the flapper surface may be away from the seating surface to allow fluid flow between the first fluid volume and the second fluid volume. The flapper may be pivotable within the valve body to a second position such that the flapper surface may be proximate the seating surface to form a non-contact seal to restrict fluid flow between the first fluid volume and the second fluid volume.