公开(公告)号：US11492701B2

公开(公告)日：2022-11-08

申请号：US16813527

申请日：2020-03-09

Applicant: ASM IP HOLDING B.V.

Inventor： Dinkar Nandwana ,  Jereld Lee Winkler ,  Eric James Shero ,  Todd Robert Dunn ,  Carl Louis White

IPC: C23C16/44 ,  H01L21/67 ,  C23C16/455 ,  C23C16/54

Abstract: Herein disclosed are systems and methods related to semiconductor processing device including a manifold including a bore configured to deliver a gas to a reaction chamber, the manifold including a first block mounted to a second block, the first and second mounted blocks cooperating to at least partially define the bore. A supply channel provides fluid communication between a gas source and the bore, and the supply channel is disposed at least partially in the second block. A metallic seal is disposed about the bore at an interface between the first and second block. Advantageously, the metallic seal improves sealing between the interface between the first block and the second block.

公开(公告)号：US20210358790A1

公开(公告)日：2021-11-18

申请号：US17319146

申请日：2021-05-13

Applicant: ASM IP Holding B.V.

Inventor： Surojit Ganguli ,  Todd Robert Dunn ,  Ankit Kimtee

IPC: H01L21/68 ,  H01L29/06 ,  G01N21/03

Abstract: A laser alignment fixture for a reactor system may be used to align components of the reactor system to allow for a uniform deposition of a thin film onto a substrate. The laser alignment fixture may comprise: a lid assembly; and a plurality of laser and sensor assemblies. The laser alignment fixture may align at least: a flow control ring, a susceptor, and a side wall of the reactor system.

公开(公告)号：US20210280448A1

公开(公告)日：2021-09-09

申请号：US17190615

申请日：2021-03-03

Applicant: ASM IP Holding B.V.

Inventor： Surojit Ganguli ,  Todd Robert Dunn ,  Ankit Kimtee

IPC: H01L21/68 ,  H01L21/67 ,  H01L21/687 ,  C23C16/455 ,  C23C16/458

Abstract: An alignment fixture for a reactor system may comprise a fixture body comprising an inner perimeter at least partially defining a shape which comprises an inner space of the fixture body, wherein the inner space is configured to receive a susceptor of a reactor system; and/or a measuring protrusion coupled to the fixture body at a first position and protruding from the fixture body toward the inner space. The measuring protrusion may comprise an indicator between the fixture body and a measuring protrusion end of the measuring protrusion.

公开(公告)号：US20210118668A1

公开(公告)日：2021-04-22

申请号：US17074887

申请日：2020-10-20

Applicant: ASM IP HOLDING B.V.

Inventor： Dinkar Nandwana ,  Eric James Shero ,  Carl Louis White ,  Todd Robert Dunn ,  William George Petro ,  Jereld Lee Winkler ,  Aniket Chitale

IPC: H01L21/02 ,  C23C16/455

Abstract: The present disclosure pertains to embodiments of a semiconductor deposition reactor manifold and methods of using the semiconductor deposition reactor manifold which can be used to deposit semiconductor layers using processes such as atomic layer deposition (ALD). The semiconductor deposition reactor manifold has a bore, a first supply channel, and a second supply channel. Advantageously, the first supply channel and the second supply channel merge with the bore in an offset fashion which leads to reduced cross-contamination within the supply channels.

公开(公告)号：US20200373187A1

公开(公告)日：2020-11-26

申请号：US16875088

申请日：2020-05-15

Applicant: ASM IP HOLDING B.V.

Inventor： Raj Singu ,  Todd Robert Dunn ,  Carl Louis White ,  Herbert Terhorst ,  Eric James Shero ,  Bhushan Zope

IPC: H01L21/683 ,  B25B11/00

Abstract: A workpiece susceptor body can include a front face configured to support a workpiece, a back face opposite the front face, a workpiece contact zone at least partially forming a support boundary on an inner portion of the front face, and a plurality of axial channels disposed within the susceptor body. The workpiece contact zone can be disposed radially inward of an outer edge of a workpiece positioned on the front face in a processing configuration. Each of the plurality of axial channels may connect to corresponding openings extending into an outer portion of the front face. Each of the openings may be disposed radially outward of the workpiece contact zone of the susceptor body.

公开(公告)号：US20190157054A1

公开(公告)日：2019-05-23

申请号：US16251534

申请日：2019-01-18

Applicant: ASM IP Holding B.V.

Inventor： Carl Louis White ,  Mohith Verghese ,  Eric James Shero ,  Todd Robert Dunn

IPC: H01J37/32

Abstract: Multi-zone reactors, systems including a multi-zone reactor, and methods of using the systems and reactors are disclosed. Exemplary multi-zone reactors include a movable susceptor assembly and a moveable plate. The movable susceptor assembly and movable plate can move vertically between reaction zones of a reactor to expose a substrate to multiple processes or reactants.

公开(公告)号：US10276355B2

公开(公告)日：2019-04-30

申请号：US14656588

申请日：2015-03-12

Applicant: ASM IP Holding B.V.

Inventor： Carl Louis White ,  Mohith Verghese ,  Eric James Shero ,  Todd Robert Dunn

IPC: H01J37/32

Abstract: Multi-zone reactors, systems including a multi-zone reactor, and methods of using the systems and reactors are disclosed. Exemplary multi-zone reactors include a movable susceptor assembly and a moveable plate. The movable susceptor assembly and movable plate can move vertically between reaction zones of a reactor to expose a substrate to multiple processes or reactants.

公开(公告)号：US20160268107A1

公开(公告)日：2016-09-15

申请号：US14656588

申请日：2015-03-12

Applicant: ASM IP Holding B.V.

Inventor： Carl Louis White ,  Mohith Verghese ,  Eric James Shero ,  Todd Robert Dunn

IPC: H01J37/32

CPC classification number: H01J37/32899 ,  H01J37/3244 ,  H01J37/32513 ,  H01J37/32715 ,  H01J37/32733

Abstract: Multi-zone reactors, systems including a multi-zone reactor, and methods of using the systems and reactors are disclosed. Exemplary multi-zone reactors include a movable susceptor assembly and a moveable plate. The movable susceptor assembly and movable plate can move vertically between reaction zones of a reactor to expose a substrate to multiple processes or reactants.

Abstract translation: 公开了多区域反应器，包括多区域反应器的系统以及使用该系统和反应器的方法。 示例性多区域反应器包括可移动基座组件和可移动板。 活动基座组件和可移动板可以在反应器的反应区之间垂直移动以将基底暴露于多个过程或反应物。