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    REACTOR MANIFOLDS
    2.
    发明申请
    REACTOR MANIFOLDS 有权

    公开(公告)号：US20230069359A1

    公开(公告)日：2023-03-02

    申请号：US18045419

    申请日：2022-10-10

    Applicant: ASM IP HOLDING B.V.

    Inventor： Shuyang Zheng ,  Jereld Lee Winkler ,  Ankit Kimtee ,  Eric James Shero ,  Mimoh Kwatra ,  Dinkar Nandwana ,  Todd Robert Dunn ,  Carl Louis White

    IPC: C23C16/455

    Abstract: Herein disclosed are systems and methods related to semiconductor processing device including a manifold including a bore configured to deliver a gas to a reaction chamber, the manifold including a first block mounted to a second block, the first and second mounted blocks cooperating to at least partially define the bore. The manifold may further comprise an insulator cap disposed about the first block or the second block. The semiconductor processing device may comprise at least three valve blocks mounted to the second block so that a precursor backflow is prevented. Heater rod(s) can extend through the second block to a location adjacent the first block.

    FLUSH FIXTURE FOR SHOWERHEAD
    3.
    发明申请
    FLUSH FIXTURE FOR SHOWERHEAD 有权

    公开(公告)号：US20210310123A1

    公开(公告)日：2021-10-07

    申请号：US17212821

    申请日：2021-03-25

    Applicant: ASM IP HOLDING B.V.

    Inventor： Ankit Kimtee

    IPC: C23C16/455 ,  C23C16/44 ,  H01L21/67

    Abstract: The present disclosure pertains to embodiments of a flush fixture for flushing a showerhead assembly. The flush fixture includes two distinct cavities, an inner cavity and an outer cavity surrounding the inner cavity and not fluidly connected to the inner cavity. When the flush fixture is mounted to a showerhead, inner apertures are in fluid connection with the inner cavity and one or more exhaust holes are in fluid connection with the outer cavity. Separately accessing the inner apertures and the one or more exhaust holes allows the showerhead to be properly flushed.

    ALIGNMENT FIXTURE FOR A REACTOR SYSTEM
    6.
    发明申请
    ALIGNMENT FIXTURE FOR A REACTOR SYSTEM 有权

    公开(公告)号：US20210280448A1

    公开(公告)日：2021-09-09

    申请号：US17190615

    申请日：2021-03-03

    Applicant: ASM IP Holding B.V.

    Inventor： Surojit Ganguli ,  Todd Robert Dunn ,  Ankit Kimtee

    IPC: H01L21/68 ,  H01L21/67 ,  H01L21/687 ,  C23C16/455 ,  C23C16/458

    Abstract: An alignment fixture for a reactor system may comprise a fixture body comprising an inner perimeter at least partially defining a shape which comprises an inner space of the fixture body, wherein the inner space is configured to receive a susceptor of a reactor system; and/or a measuring protrusion coupled to the fixture body at a first position and protruding from the fixture body toward the inner space. The measuring protrusion may comprise an indicator between the fixture body and a measuring protrusion end of the measuring protrusion.

    FILTER SYSTEM FOR A REACTOR SYSTEM
    7.
    发明申请
    FILTER SYSTEM FOR A REACTOR SYSTEM 有权

    公开(公告)号：US20210205758A1

    公开(公告)日：2021-07-08

    申请号：US17136764

    申请日：2020-12-29

    Applicant: ASM IP Holding B.V.

    Inventor： Ankit Kimtee ,  Rohan Rane

    IPC: B01D61/14 ,  B01D46/52

    Abstract: A filter system of a reactor system may comprise a filter vessel comprising an outer wall; a filter plate disposed in the filter vessel; and a filter disposed on the filter plate. The filter plate may comprise a first plate face and a second plate face with a plate body spanning therebetween; a first plate hole disposed through the plate body spanning between the first plate face and the second plate face; and/or a plate hole rim protruding from the first plate surface. The plate hole rim may be disposed at or proximate a plate hole edge defining the first plate hole, and/or at least partially surrounding the first plate hole. The first filter may be disposed on the first plate face, and the first filter may engage with the plate hole rim such that the plate hole rim positions the first filter in a desired position.

    TEMPERATURE CONTROL SYSTEM FOR LIQUID SOURCES
    9.
    发明公开
    TEMPERATURE CONTROL SYSTEM FOR LIQUID SOURCES 审中-公开

    公开(公告)号：US20230287565A1

    公开(公告)日：2023-09-14

    申请号：US18117514

    申请日：2023-03-06

    Applicant: ASM IP Holding B.V.

    Inventor： Ankit Kimtee ,  Pawan Sharma ,  Sudhanshu Biyani

    IPC: C23C16/448 ,  C23C16/52

    CPC classification number: C23C16/448 ,  C23C16/52 ,  H01L21/67248

    Abstract: A reactor system for use in semiconductor processing that makes use of a liquid source for deposition that needs to be maintained within a specific temperature control band or range. The reactor system includes a temperature control system that includes a heating and cooling apparatus for providing both heating and cooling of a vessel that stores the liquid source to maintain the liquid source within a desired temperature control band or range. In this manner, the heating and cooling apparatus may be used in a reactor system in which the vessel needs to be cooled, needs to be heated, or uses concurrent or alternating heating and cooling to provide enhanced control of the source temperature within a particular temperature control band.

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