公开(公告)号：US20180321602A1

公开(公告)日：2018-11-08

申请号：US15764594

申请日：2016-10-05

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Adrianus Hendrik KOEVOETS ,  Michael Leo NELSON ,  Jacobus Cornelis Gerardus VAN DER SANDEN ,  Geoffrey O'CONNOR ,  Michael Andrew CHIEDA ,  Tammo UITTERDIJK

IPC: G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70875 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/67248 ,  H01L21/6831

Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.

公开(公告)号：US20180284625A1

公开(公告)日：2018-10-04

申请号：US15994492

申请日：2018-05-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE

IPC: G03F7/20 ,  H01L21/687 ,  C23C16/44

CPC classification number: G03F7/70716 ,  C23C16/44 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70975 ,  H01L21/6875 ,  Y10T29/49

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US20180267412A1

公开(公告)日：2018-09-20

申请号：US15918478

申请日：2018-03-12

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Wilhelmus Franciscus Johannes SIMONS ,  Martijn HOUBEN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Rogier Hendrikus Magdalena CORTIE ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Gerben PIETERSE ,  Siegfried Alexander TROMP ,  Theodorus Wilhelmus POLET ,  Jim Vincent OVERKAMP ,  Van Vuong VY

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US20180203365A1

公开(公告)日：2018-07-19

申请号：US15920788

申请日：2018-03-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes ROSET ,  Nicolaas TEN KATE ,  Sergei SHULEPOV ,  Raymond Wilhelmus Louis LAFARRE

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.

公开(公告)号：US20160179014A1

公开(公告)日：2016-06-23

申请号：US14973421

申请日：2015-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes ROSET ,  Nicolaas TEN KATE ,  Sergei SHULEPOV ,  Raymond Wilhelmus Louis LAFARRE

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.

Abstract translation: 一种具有流体处理结构的光刻设备，其被配置为将浸没流体包含在与衬底台的上表面相邻的空间中和/或位于所述衬底台的凹部中的衬底上，所述盖包括平面主体，所述平面主体在使用中 从衬底的上表面延伸到基板的上主表面的周边部分，以覆盖凹部的边缘和基板的边缘之间的间隙，以及浸没流体膜破坏器，其构造成破坏基板 在衬底台相对于流体处理结构移动期间，在盖的边缘和由流体处理结构容纳的浸没流体之间形成浸没流体膜。

公开(公告)号：US20160018744A1

公开(公告)日：2016-01-21

申请号：US14772721

申请日：2014-02-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Satish ACHANTA ,  Matteo FILIPPI ,  Yogesh KARADE ,  Antonius Johannes Maria NELLISSEN ,  Ronal VAN DER WILK ,  Hendrikus Christoffel Maria VAN DOREMALEN ,  Wilhelmus Jacobus Johannes WELTERS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70708

Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.

Abstract translation: 一种制造用于光刻设备的物体保持器的方法，所述物体保持器包括一个或多个电功能部件，所述方法包括：使用包括与所述物体保持器的主体不同的载体片的复合结构和层状结构 包括一个或多个层并形成在载体片上; 将复合结构连接到主体的表面，使得层状结构位于载体片和主体的表面之间; 并从复合结构中移除载体片，使分层结构连接到主体。

公开(公告)号：US20150220003A1

公开(公告)日：2015-08-06

申请号：US14690032

申请日：2015-04-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas TEN KATE ,  Raymond Wilhelmus Louis LAFARRE

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.

Abstract translation: 一种用于光刻设备的工作台，该工作台具有形成在工作台的上表面中的集水开口，该容器开口通过工作台与桌子的环境流体连通，在桌子的表面的排水开口处，除了 上表面。