公开(公告)号：US09820368B2

公开(公告)日：2017-11-14

申请号：US14824141

申请日：2015-08-12

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00

CPC classification number: H05G2/008

Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.

公开(公告)号：US20170048959A1

公开(公告)日：2017-02-16

申请号：US14824280

申请日：2015-08-12

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00 ,  G01J1/42

CPC classification number: H05G2/008 ,  G01J1/429 ,  H05G2/005

Abstract: In a laser produced plasma (LPP) extreme ultraviolet (EUV) system, a droplet is irradiated by a laser pulse to produce a plasma in a chamber. This generates forces that cause the plasma to destabilize and subsequent droplets to have their flight trajectory and speed altered as they approach the plasma. This destabilization is detectable from oscillations in the amount of EUV energy generated. To reduce the oscillations by stabilizing the plasma and travel of the droplets, a proportional-integral (PI) controller algorithm is used to modify an energy of subsequent laser pulses based on the EUV energy generated in the chamber. By modifying the energy of subsequent laser pulses, the plasma stabilizes, which reduces effects on droplet flight and stabilizes the amount of EUV energy generated, allowing the plasma chamber to operate for longer intervals and to lower the amount of reserve power maintained by a laser source.

Abstract translation: 在激光产生的等离子体（LPP）极紫外（EUV）系统中，通过激光脉冲照射液滴，以在室中产生等离子体。 这产生使等离子体不稳定并且随后的液滴使其飞行轨迹和速度在接近等离子体时改变的力。 这种不稳定性可以由产生的EUV能量的振荡来检测。 为了通过稳定等离子体和液滴的行程来减少振荡，使用比例积分（PI）控制器算法来修改基于腔室中产生的EUV能量的后续激光脉冲的能量。 通过修改后续激光脉冲的能量，等离子体稳定，这降低了对液滴飞行的影响，并稳定了产生的EUV能量的量，允许等离子体室工作更长的间隔，并降低由激光源维持的备用功率的量 。

公开(公告)号：US20170048957A1

公开(公告)日：2017-02-16

申请号：US14824141

申请日：2015-08-12

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00

CPC classification number: H05G2/008

Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.

Abstract translation: 一种方法包括提供包含当转换成等离子体时发射极紫外（EUV）光的成分的靶材料; 将第一辐射束引导到目标材料以将能量传递到目标材料以改变目标材料的几何分布以形成修改的靶; 将第二射束照射到修改的目标物上，第二辐射束将至少部分改性靶转换成发射EUV光的等离子体; 测量与所述目标材料和所述修改的目标物中的一种或多种相对于所述第一辐射束相关联的一个或多个特性; 以及基于所述一个或多个测量特性将预定辐射量从所述第一射线辐射传送到预定能量范围内。

公开(公告)号：US20160029471A1

公开(公告)日：2016-01-28

申请号：US14874164

申请日：2015-10-02

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  Robert Jay Rafac ,  Igor Vladimirovich Fomenkov ,  Daniel John William Brown ,  Daniel James Golich

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G21K5/02 ,  H01S3/10 ,  H05G2/005

Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.

公开(公告)号：US11096266B2

公开(公告)日：2021-08-17

申请号：US16859042

申请日：2020-04-27

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00

Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.

公开(公告)号：US10663866B2

公开(公告)日：2020-05-26

申请号：US15270072

申请日：2016-09-20

Applicant: ASML Netherlands B.V.

Inventor： Alexander Anthony Schafgans ,  Igor Vladimirovich Fomenkov ,  Yezheng Tao ,  Rostislav Rokitski ,  Robert Jay Rafac ,  Daniel John William Brown ,  Cory Alan Stinson

IPC: G03F7/20 ,  G02B5/28 ,  G02B5/20 ,  G02B27/14 ,  G02B27/42 ,  H01S3/00 ,  H01S3/23 ,  H01S3/223

Abstract: An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.

公开(公告)号：US20190274210A1

公开(公告)日：2019-09-05

申请号：US16418652

申请日：2019-05-21

Applicant: ASML Netherlands B.V.

Inventor： Robert Jay Rafac ,  John Tom Stewart ,  Andrew David LaForge

IPC: H05G2/00

Abstract: A first target is provided to an interior of a vacuum chamber, a first light beam is directed toward the first target to form a first plasma from target material of the first target, the first plasma being associated with a directional flux of particles and radiation emitted from the first target along a first emission direction, the first emission direction being determined by a position of the first target; a second target is provided to the interior of the vacuum chamber; and a second light beam is directed toward the second target to form a second plasma from target material of the second target, the second plasma being associated with a directional flux of particles and radiation emitted from the second target along a second emission direction, the second emission direction being determined by a position of the second target, the first and second emission directions being different.

公开(公告)号：US10314153B2

公开(公告)日：2019-06-04

申请号：US15724104

申请日：2017-10-03

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00

Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.

公开(公告)号：US20180343730A1

公开(公告)日：2018-11-29

申请号：US16057101

申请日：2018-08-07

Applicant: ASML Netherlands B.V.

Inventor： Robert Jay Rafac ,  John Tom Stewart ,  Andrew David LaForge

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/005 ,  H05G2/006

Abstract: A first target is provided to an interior of a vacuum chamber, a first light beam is directed toward the first target to form a first plasma from target material of the first target, the first plasma being associated with a directional flux of particles and radiation emitted from the first target along a first emission direction, the first emission direction being determined by a position of the first target; a second target is provided to the interior of the vacuum chamber; and a second light beam is directed toward the second target to form a second plasma from target material of the second target, the second plasma being associated with a directional flux of particles and radiation emitted from the second target along a second emission direction, the second emission direction being determined by a position of the second target, the first and second emission directions being different.

公开(公告)号：US20170048960A1

公开(公告)日：2017-02-16

申请号：US14824289

申请日：2015-08-12

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G1/30 ,  H05G2/003

Abstract: In a laser produced plasma (LPP) extreme ultraviolet (EUV) system, a plasma created from droplets irradiated by a laser pulse can become destabilized. The instability of the plasma can reduce the amount of EUV energy generated over time. While other systems seek to stabilize the plasma by varying a pulse width of the laser pulses, the systems and methods described herein stabilize the plasma by varying an intensity of the laser pulses. The intensity of the laser pulses is varied based on a comparison of the amount of EUV energy generated from current pulse to an expected amount of EUV energy. The intensity of the laser pulses can be varied on a pulse-by-pulse basis by an EUV controller that instructs a pulse actuator.

Abstract translation: 在激光产生的等离子体（LPP）极紫外（EUV）系统中，由激光脉冲照射的液滴产生的等离子体变得不稳定。 等离子体的不稳定性可以减少随时间产生的EUV能量的量。 虽然其他系统通过改变激光脉冲的脉冲宽度来寻求稳定等离子体，但是本文所述的系统和方法通过改变激光脉冲的强度来稳定等离子体。 激光脉冲的强度基于从当前脉冲产生的EUV能量与预期的EUV能量的比较而变化。 激光脉冲的强度可以通过指示脉冲致动器的EUV控制器逐脉冲地改变。