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公开(公告)号：US20230143962A1
公开(公告)日：2023-05-11
申请号：US17913013
申请日：2021-03-10
Applicant: ASML Netherlands B.V.
Inventor： Rostislav Rokitski , Philip M. Conklin , Cory Alan Stinson , Alexander Anthony Schafgans , Christoffel Johannes Liebenberg
CPC classification number: H01S3/2333 , H01S3/1003 , H01S3/0085 , H01S3/2232 , H01S3/10061
Abstract: Systems, apparatuses, and methods are provided for dual-pass amplification of laser beams along a common beam path. An example method can include generating a first laser beam and a second laser beam. Subsequently, the example method can include performing dual-pass amplification of the first laser beam and the second laser beam along a common beam path. In some aspects, the first laser beam can include a first wavelength, the second laser beam can include a second wavelength different from the first wavelength.
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公开(公告)号：US20180081280A1
公开(公告)日：2018-03-22
申请号：US15270072
申请日：2016-09-20
Applicant: ASML Netherlands B.V.
Inventor： Alexander Anthony Schafgans , Igor Vladimirovich Fomenkov , Yezheng Tao , Rostislav Rokitski , Robert Jay Rafac , Daniel John William Brown , Cory Alan Stinson
Abstract: An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.
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公开(公告)号：US20160165709A1
公开(公告)日：2016-06-09
申请号：US14562237
申请日：2014-12-05
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Daniel J. Golich , Michael Kats , John T. Stewart , Rostislav Rokitski
IPC: H05G2/00
CPC classification number: H05G2/008 , H01S3/005 , H01S3/0064 , H01S3/0085 , H01S3/2232 , H01S3/2316 , H01S3/2383 , H05G2/003 , H05G2/005 , H05G2/006
Abstract: A method and apparatus for protecting the seed laser a laser produced plasma (LPP) extreme ultraviolet (EUV) light system are disclosed. An isolation stage positioned on an optical path diverts light reflected from further components in the LPP EUV light system from reaching the seed laser. The isolation stage comprises two AOMs that are separated by a delay line. The AOMs, when open, direct light onto the optical path and, when closed, direct light away from the optical path. The delay introduced by the delay line is determined so that the opening and the closing of the AOMs can be timed to direct a forward-moving pulse onto the optical path and to divert reflected light at other times. The isolation stage can be positioned between gain elements to prevent amplified reflected light from reaching the seed laser and other potentially harmful effects.
Abstract translation: 公开了一种用于保护激光产生等离子体（LPP）极紫外（EUV）光系统的种子激光器的方法和装置。 位于光路上的隔离级将从LPP EUV光系统中的其它部件反射的光转移到种子激光器。 隔离级包括由延迟线分开的两个AOM。 AOM在打开时将光线引导到光路上，并且在关闭时将光引导离开光路。 确定由延迟线引入的延迟，使得可以定时将AOM的打开和关闭定时以将向前移动的脉冲引导到光路上并在其它时间转移反射光。 隔离级可以位于增益元件之间，以防止放大的反射光到达种子激光器和其他潜在的有害影响。
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公开(公告)号：US10663866B2
公开(公告)日：2020-05-26
申请号：US15270072
申请日：2016-09-20
Applicant: ASML Netherlands B.V.
Inventor： Alexander Anthony Schafgans , Igor Vladimirovich Fomenkov , Yezheng Tao , Rostislav Rokitski , Robert Jay Rafac , Daniel John William Brown , Cory Alan Stinson
Abstract: An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.
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