LOW TEMPERATURE POLY-SILICON TRANSISTOR ARRAY SUBSTRATE AND FABRICATION METHOD THEREOF, AND DISPLAY DEVICE
    31.
    发明申请
    LOW TEMPERATURE POLY-SILICON TRANSISTOR ARRAY SUBSTRATE AND FABRICATION METHOD THEREOF, AND DISPLAY DEVICE 审中-公开
    低温聚硅晶体管阵列基板及其制造方法及显示装置

    公开(公告)号:US20160300957A1

    公开(公告)日:2016-10-13

    申请号:US15084802

    申请日:2016-03-30

    Abstract: The embodiments of the present invention disclose a low temperature (LTPS) transistor array substrate and a method of fabricating the same, and a display device. The LTPS transistor array substrate comprises a substrate; a poly-silicon semiconductor active region provided on the substrate; agate insulated from the poly-silicon semiconductor active region; and a dielectric spacer region provided on a side wall of the gate, wherein a portion of the poly-silicon semiconductor active region corresponding to the dielectric spacer region comprises a buffer region, and the dielectric spacer region surrounds the side wall of the gate and covers the buffer region.

    Abstract translation: 本发明的实施例公开了低温(LTPS)晶体管阵列基板及其制造方法以及显示装置。 LTPS晶体管阵列基板包括基板; 设置在所述基板上的多晶硅半导体有源区; 与多晶硅半导体有源区绝缘的玛瑙; 以及设置在所述栅极的侧壁上的电介质间隔区,其中与所述电介质间隔区相对应的所述多晶硅半导体有源区的一部分包括缓冲区,并且所述电介质间隔区围绕所述栅极的侧壁 缓冲区。

    LTPS TFT ARRAY SUBSTRATE, ITS MANUFACTURING METHOD, AND DISPLAY DEVICE
    32.
    发明申请
    LTPS TFT ARRAY SUBSTRATE, ITS MANUFACTURING METHOD, AND DISPLAY DEVICE 有权
    LTPS TFT阵列基板,其制造方法和显示装置

    公开(公告)号:US20160247823A1

    公开(公告)日:2016-08-25

    申请号:US14428578

    申请日:2014-07-16

    Abstract: The present disclosure relates to the field of TFT manufacturing process, and provides an LTPS TFT array substrate, its manufacturing method and a display device. The LTPS TFT array substrate includes contact holes through which a source electrode and a drain electrode of the array substrate are connected to an active layer, respectively, wherein a conductive pattern connected to the active layer is provided at a base portion of the contact hole. According to the present disclosure, it is able to form an excellent ohmic contact between the source/drain electrodes and the active layer after the contact holes have been etched, thereby to ensure the display quality of the display device.

    Abstract translation: 本公开涉及TFT制造工艺领域,并提供一种LTPS TFT阵列基板,其制造方法和显示装置。 LTPS TFT阵列基板包括接触孔,阵列基板的源电极和漏电极分别连接到有源层,其中连接到有源层的导电图案设置在接触孔的基部。 根据本公开,在蚀刻接触孔之后,能够在源/漏电极和有源层之间形成优异的欧姆接触,从而确保显示装置的显示质量。

    ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, DISPLAY DEVICE, THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF
    33.
    发明申请
    ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, DISPLAY DEVICE, THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF 有权
    阵列基板及其制造方法,显示装置,薄膜​​晶体管及其制造方法

    公开(公告)号:US20160181289A1

    公开(公告)日:2016-06-23

    申请号:US14646416

    申请日:2014-09-23

    Abstract: An array substrate and manufacturing method thereof, a display device, a thin film transistor and manufacturing method thereof are provided. The manufacturing method of an array substrate includes forming an active material layer (501), a gate insulating layer (204) and a metal thin film (502) on a base substrate (201), and forming a pattern including an active layer (203) and a pattern including a gate electrode (205), a source electrode (206), a drain electrode (207), a gate line (1063) and a data line (1061) by a first patterning process; forming a passivation layer (301) on the base substrate (201), and forming a source contact hole (302), a drain contact hole (303), and an bridge-structure contact hole (1062a) by a second patterning process; forming a transparent conductive thin film (1401) on the base substrate (201), and removing the transparent conductive thin film (1404) partially, so that a source contact section (401), a drain contact section (402), a pixel electrode (403), and an bridge structure (1062) are formed. With the manufacturing method, the use number of patterning processes is decreased.

    Abstract translation: 提供阵列基板及其制造方法,显示装置,薄膜​​晶体管及其制造方法。 阵列基板的制造方法包括在基底基板(201)上形成活性物质层(501),栅极绝缘层(204)和金属薄膜(502),形成包括活性层(203)的图案 )和通过第一图案化工艺包括栅电极(205),源电极(206),漏电极(207),栅线(1063)和数据线(1061)的图案; 在所述基底基板上形成钝化层,通过第二构图工艺形成源极接触孔,漏极接触孔和桥接结构接触孔; 在所述基底基板上形成透明导电薄膜,将所述透明导电薄膜部分地去除,使得源极接触部分,漏极接触部分,像素电极, (403)和桥结构(1062)。 通过制造方法,图案化处理的使用次数减少。

    DISPLAY SUBSTRATE AND DETECTION METHOD THEREFOR, AND DISPLAY APPARATUS

    公开(公告)号:US20230005430A1

    公开(公告)日:2023-01-05

    申请号:US17778597

    申请日:2021-01-15

    Abstract: Provided are a display substrate and a detection method therefor, and a display apparatus. Compensation sub-circuits that are in one-to-one correspondence with each stage of a shift register are arranged in a gate driving circuit, and a first capacitor in each compensation sub-circuit is thus charged under the control of a detection input circuit when each stage of the shift register outputs a signal stage by stage; and an output control circuit is used to disconnect the compensation sub-circuit from a pull-up node of the corresponding stage of the shift register. The triggering of each stage of the shift register is stopped after each stage of the shift register (CR(n)) completes outputting, and the output control circuit provides a signal of a first power voltage end to the pull-up node of the corresponding stage of the shift register under the control of a second control end and the first capacitor.

    DISPLAY PANEL AND MANUFACTURING METHOD THEREFOR, AND DISPLAY APPARATUS

    公开(公告)号:US20220013673A1

    公开(公告)日:2022-01-13

    申请号:US17295921

    申请日:2020-08-18

    Abstract: Disclosed in embodiments of the present disclosure are a display panel and a manufacturing method therefor, and a display apparatus. The display panel includes: a base substrate; an organic functional film layer provided on the base substrate; an insulating layer provided on the organic functional film layer, a plurality of dents distributed at intervals are provided on one side of the insulating layer distant from the organic functional film layer; and an amorphous silicon solar cell film layer provided at one side of the insulating layer distant from the organic functional film layer, the amorphous silicon solar cell film layer has the same morphology as the surface of the insulating layer where the dents are provided.

    ARRAY SUBSTRATE, METHOD FOR FABRICATING THE SAME AND DISPLAY PANEL

    公开(公告)号:US20210375952A1

    公开(公告)日:2021-12-02

    申请号:US16641372

    申请日:2019-05-23

    Abstract: Embodiments of the present disclosure provide an array substrate including a base substrate, an active layer on the base substrate, a first gate insulating layer on the active layer, a first gate on the first gate insulating layer, and a second gate insulating layer on the first gate. The second gate insulating layer includes a first sub-insulating layer and a second sub-insulating layer disposed in a direction away from the active layer, and a hydrogen content of the first sub-insulating layer is larger than a hydrogen content of the second sub-insulating layer. A method for fabricating the array substrate and a display panel including the array substrate are also provided.

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