公开(公告)号：US07330238B2

公开(公告)日：2008-02-12

申请号：US11090699

申请日：2005-03-28

申请人： Jan-Gerard Cornelis Van Der Toorn ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Evert Hendrik Jan Draaijer ,  Nicolaas Ten Kate ,  Frits Van Der Meulen ,  Mark Johannes Hermanus Frencken ,  Martijn Houkes ,  Antonius Henricus Arends ,  Minne Cuperus

发明人： Jan-Gerard Cornelis Van Der Toorn ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Evert Hendrik Jan Draaijer ,  Nicolaas Ten Kate ,  Frits Van Der Meulen ,  Mark Johannes Hermanus Frencken ,  Martijn Houkes ,  Antonius Henricus Arends ,  Minne Cuperus

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.

摘要翻译： 光刻设备包括用于保持基板的基板台和将图案化的辐射束投影到基板的目标部分上的投影系统。 光刻设备还包括一个流体供应系统，用于在基板和投影系统的最终透镜元件之间提供流体，以及位置控制器，用于控制流体供应系统的位置。 位置控制器被配置为具有基板的位置量，通过向基板的位置量添加位置偏移来确定液体供应系统的期望位置，并且根据期望位置定位液体供应系统 。 位置量可以包括衬底台的位置和/或旋转位置和/或衬底高度的高度函数。

公开(公告)号：US07859644B2

公开(公告)日：2010-12-28

申请号：US12000774

申请日：2007-12-17

申请人： Jan-Gerard Cornelis Van Der Toorn ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Evert Hendrik Jan Draaijer ,  Nicolaas Ten Kate ,  Frits Van Der Meulen ,  Mark Johannes Hermanus Frencken ,  Martijn Houkes ,  Antonius Henricus Arends ,  Minne Cuperus

发明人： Jan-Gerard Cornelis Van Der Toorn ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Evert Hendrik Jan Draaijer ,  Nicolaas Ten Kate ,  Frits Van Der Meulen ,  Mark Johannes Hermanus Frencken ,  Martijn Houkes ,  Antonius Henricus Arends ,  Minne Cuperus

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.

摘要翻译： 控制系统，被配置为控制流体供应系统的位置，所述流体供应系统构造和布置成在基板和投影系统之间提供流体，所述基板定位在基板台上，所述控制系统包括控制器，所述控制器被配置为确定 基于要提供给衬底台的位置信号和位置偏移的流体供应系统的期望位置，位置偏移被添加到要提供给衬底台的位置信号。

公开(公告)号：US08860924B2

公开(公告)日：2014-10-14

申请号：US13589841

申请日：2012-08-20

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Jeroen Johannes Sophia M. Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Jeroen Johannes Sophia M. Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。

公开(公告)号：US08248577B2

公开(公告)日：2012-08-21

申请号：US11120186

申请日：2005-05-03

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Jeroen Johannes Sophia M. Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Jeroen Johannes Sophia M. Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。

公开(公告)号：US07295283B2

公开(公告)日：2007-11-13

申请号：US10816189

申请日：2004-04-02

申请人： Henrikus Herman Marie Cox ,  Petrus Marinus Christianus Maria Van Den Biggelaar ,  Frits Van Der Meulen ,  Franciscus Andreas Cornelis Johannes Spanjers ,  Jan-Gerard Cornelis Van Der Toorn ,  Arend-Jan Migchelbrink

发明人： Henrikus Herman Marie Cox ,  Petrus Marinus Christianus Maria Van Den Biggelaar ,  Frits Van Der Meulen ,  Franciscus Andreas Cornelis Johannes Spanjers ,  Jan-Gerard Cornelis Van Der Toorn ,  Arend-Jan Migchelbrink

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341

摘要： A lithographic apparatus for immersion lithography is described in which a compensation controller controls actuators to apply forces to the substrate equal in magnitude and opposite in direction to forces which are applied to the substrate by a liquid supply system which supplies liquid between the projection system and the substrate.

摘要翻译： 描述了一种用于浸没式光刻的光刻设备，其中补偿控制器控制致动器以将力施加到基板上，其尺寸相等，方向与施加到基板的力相反，该液体供应系统在投影系统和 基质。

公开(公告)号：US07119876B2

公开(公告)日：2006-10-10

申请号：US10966111

申请日：2004-10-18

申请人： Jan-Gerard Cornelis Van Der Toorn ,  Christiaan Alexander Hoogendam

发明人： Jan-Gerard Cornelis Van Der Toorn ,  Christiaan Alexander Hoogendam

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： To facilitate, for example, removal of a substrate between exposures of different substrates, an actuated closing plate is used to replace a substrate, a substrate table, or both, as a part of a boundary of a space in a lithographic apparatus containing liquid without, for example, breaking a seal containing the liquid.

公开(公告)号：US07630059B2

公开(公告)日：2009-12-08

申请号：US11491493

申请日：2006-07-24

申请人： Hans Butler ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes ,  Wilhelmus Franciscus Johannes Simons

发明人： Hans Butler ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes ,  Wilhelmus Franciscus Johannes Simons

IPC分类号： G03B27/58 ,  H02N3/00

CPC分类号： G03F7/70725

摘要： A control system to control a position parameter of a stage in a lithographic apparatus includes a stage controller to control a position parameter of the stage in at least a first direction. The control system includes a disturbance torque estimator to estimate a disturbance torque on the stage, the disturbance torque about an axis extending in a second direction, the second direction being substantially perpendicular to the first direction. The control system includes a correction signal calculator, the correction signal calculator provided with the estimated disturbance torque and a signal representative of a position of the stage in a third direction, the third direction being substantially perpendicular to the first and second directions. The correction signal calculator determines a feedforward correction signal to correct a position error of the stage in the first direction due to the disturbance torque, the feedforward correction signal to be fed to the stage.

摘要翻译： 用于控制光刻设备中的台的位置参数的控制系统包括：阶段控制器，用于至少在第一方向上控制台的位置参数。 所述控制系统包括用于估计所述载物台上的扰动扭矩的扰动扭矩估计器，围绕在第二方向上延伸的轴线的扰动扭矩，所述第二方向基本上垂直于所述第一方向。 所述控制系统包括校正信号计算器，所述校正信号计算器具有估计的干扰转矩和表示所述载物台在第三方向上的位置的信号，所述第三方向基本上垂直于所述第一和第二方向。 校正信号计算器确定前馈校正信号，以由于干扰转矩，馈送到级的前馈校正信号来校正第一方向上的级的位置误差。

公开(公告)号：US20080018877A1

公开(公告)日：2008-01-24

申请号：US11491493

申请日：2006-07-24

申请人： Hans Butler ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes ,  Wilhelmus Franciscus Johannes Simons

发明人： Hans Butler ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes ,  Wilhelmus Franciscus Johannes Simons

IPC分类号： G03B27/58

CPC分类号： G03F7/70725

摘要： A control system to control a position parameter of a stage in a lithographic apparatus includes a stage controller to control a position parameter of the stage in at least a first direction. The control system includes a disturbance torque estimator to estimate a disturbance torque on the stage, the disturbance torque about an axis extending in a second direction, the second direction being substantially perpendicular to the first direction. The control system includes a correction signal calculator, the correction signal calculator provided with the estimated disturbance torque and a signal representative of a position of the stage in a third direction, the third direction being substantially perpendicular to the first and second directions. The correction signal calculator determines a feedforward correction signal to correct a position error of the stage in the first direction due to the disturbance torque, the feedforward correction signal to be fed to the stage.

摘要翻译： 用于控制光刻设备中的台的位置参数的控制系统包括：阶段控制器，用于至少在第一方向上控制台的位置参数。 所述控制系统包括用于估计所述载物台上的扰动扭矩的扰动扭矩估计器，围绕在第二方向上延伸的轴线的扰动扭矩，所述第二方向基本上垂直于所述第一方向。 所述控制系统包括校正信号计算器，所述校正信号计算器具有估计的干扰转矩和表示所述载物台在第三方向上的位置的信号，所述第三方向基本上垂直于所述第一和第二方向。 校正信号计算器确定前馈校正信号，以由于干扰转矩，馈送到级的前馈校正信号来校正第一方向上的级的位置误差。

公开(公告)号：US20070114452A1

公开(公告)日：2007-05-24

申请号：US11285774

申请日：2005-11-23

申请人： Hans Jansen ,  Sebastiaan Cornelissen ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Hernes Jacobs ,  Martinus Leenders ,  Jeroen Johannes Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Janssen ,  Michel Riepen ,  Bob Streefkerk

发明人： Hans Jansen ,  Sebastiaan Cornelissen ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Hernes Jacobs ,  Martinus Leenders ,  Jeroen Johannes Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Janssen ,  Michel Riepen ,  Bob Streefkerk

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： Lithographic Apparatus and Device Manufacturing Method In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 平版印刷设备和设备制造方法在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US20080252866A1

公开(公告)日：2008-10-16

申请号：US12213149

申请日：2008-06-16

申请人： Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Jan-Gerard Cornelis Van Der Toorn

发明人： Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Jan-Gerard Cornelis Van Der Toorn

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to provide a confining surface for liquid supplied by the liquid supply system in place of the substrate; and a closing surface positioning device configured to create and maintain a gap between the liquid supply system and the closing surface so that the liquid flows in the gap when the closing surface is used to confine the liquid supplied by the liquid supply system.

摘要翻译： 光刻设备包括：投影系统，被配置为将图案化的辐射束投影到由衬底台支撑的衬底上; 液体供应系统，被配置为用液体在所述投影系统和所述基板之间提供空间; 闭合表面，其构造成为由液体供应系统提供的液体提供代替基底的液体的限制表面; 以及封闭面定位装置，其构造成在所述液体供应系统和所述封闭表面之间产生并保持间隙，使得当所述封闭表面用于限制由所述液体供应系统供应的液体时，所述液体在所述间隙中流动。