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公开(公告)号：US20080252866A1
公开(公告)日：2008-10-16
申请号：US12213149
申请日：2008-06-16
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to provide a confining surface for liquid supplied by the liquid supply system in place of the substrate; and a closing surface positioning device configured to create and maintain a gap between the liquid supply system and the closing surface so that the liquid flows in the gap when the closing surface is used to confine the liquid supplied by the liquid supply system.
摘要翻译： 光刻设备包括：投影系统，被配置为将图案化的辐射束投影到由衬底台支撑的衬底上; 液体供应系统，被配置为用液体在所述投影系统和所述基板之间提供空间; 闭合表面，其构造成为由液体供应系统提供的液体提供代替基底的液体的限制表面; 以及封闭面定位装置，其构造成在所述液体供应系统和所述封闭表面之间产生并保持间隙，使得当所述封闭表面用于限制由所述液体供应系统供应的液体时，所述液体在所述间隙中流动。
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公开(公告)号：US07403261B2
公开(公告)日：2008-07-22
申请号：US11012061
申请日：2004-12-15
CPC分类号： G03F7/70341
摘要： The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.
摘要翻译： 本发明涉及当封闭表面用于将液体限制在液体供应系统中时，减少光刻设备中浸没液的污染的方法。 为了避免或减少由与液体供应系统碰撞的关闭表面引起的颗粒污染，闭合表面保持离开液体供应系统一定距离，使得闭合表面和液体供应系统之间没有碰撞，但是 液体仍然受到限制。
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公开(公告)号：US08233135B2
公开(公告)日：2012-07-31
申请号：US12349642
申请日：2009-01-07
CPC分类号： G03F7/70341
摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to provide a confining surface for liquid supplied by the liquid supply system in place of the substrate; and a closing surface positioning device configured to create and maintain a gap between the liquid supply system and the closing surface so that the liquid flows in the gap when the closing surface is used to confine the liquid supplied by the liquid supply system.
摘要翻译： 光刻设备包括：投影系统，被配置为将图案化的辐射束投影到由衬底台支撑的衬底上; 液体供应系统，被配置为用液体在所述投影系统和所述基板之间提供空间; 闭合表面，其构造成为由液体供应系统提供的液体提供代替基底的液体的限制表面; 以及封闭面定位装置，其构造成在所述液体供应系统和所述封闭表面之间产生并保持间隙，使得当所述封闭表面用于限制由所述液体供应系统供应的液体时，所述液体在所述间隙中流动。
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公开(公告)号：US07751032B2
公开(公告)日：2010-07-06
申请号：US12213149
申请日：2008-06-16
CPC分类号： G03F7/70341
摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to provide a confining surface for liquid supplied by the liquid supply system in place of the substrate; and a closing surface positioning device configured to create and maintain a gap between the liquid supply system and the closing surface so that the liquid flows in the gap when the closing surface is used to confine the liquid supplied by the liquid supply system.
摘要翻译： 光刻设备包括：投影系统，被配置为将图案化的辐射束投影到由衬底台支撑的衬底上; 液体供应系统，被配置为用液体在所述投影系统和所述基板之间提供空间; 闭合表面，其构造成为由液体供应系统提供的液体提供代替基底的液体的限制表面; 以及封闭面定位装置，其构造成在所述液体供应系统和所述封闭表面之间产生并保持间隙，使得当所述封闭表面用于限制由所述液体供应系统供应的液体时，所述液体在所述间隙中流动。
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公开(公告)号：US08687168B2
公开(公告)日：2014-04-01
申请号：US13083966
申请日：2011-04-11
申请人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
摘要翻译： 公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。
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公开(公告)号：US07929112B2
公开(公告)日：2011-04-19
申请号：US12292329
申请日：2008-11-17
申请人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
摘要翻译： 公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。
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公开(公告)号：US07928407B2
公开(公告)日：2011-04-19
申请号：US11603228
申请日：2006-11-22
申请人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G21K5/10
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号：US07468779B2
公开(公告)日：2008-12-23
申请号：US11167563
申请日：2005-06-28
申请人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
摘要翻译： 公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。
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公开(公告)号：US20070114452A1
公开(公告)日：2007-05-24
申请号：US11285774
申请日：2005-11-23
申请人： Hans Jansen , Sebastiaan Cornelissen , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Leenders , Jeroen Johannes Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Janssen , Michel Riepen , Bob Streefkerk
发明人： Hans Jansen , Sebastiaan Cornelissen , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Leenders , Jeroen Johannes Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Janssen , Michel Riepen , Bob Streefkerk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： Lithographic Apparatus and Device Manufacturing Method In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 平版印刷设备和设备制造方法在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号：US08138486B2
公开(公告)日：2012-03-20
申请号：US12613846
申请日：2009-11-06
申请人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
发明人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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