公开(公告)号：US20080070408A1

公开(公告)日：2008-03-20

申请号：US11441294

申请日：2006-05-24

Applicant: Chin-Lung Lin ,  Ming-Jui Chen ,  Chen-yu Ao ,  Hung-Chin Thuang ,  Jen-Hsiang Tsai ,  Jian-Shin Liou

Inventor： Chin-Lung Lin ,  Ming-Jui Chen ,  Chen-yu Ao ,  Hung-Chin Thuang ,  Jen-Hsiang Tsai ,  Jian-Shin Liou

IPC: H01L21/66 ,  H01L21/44

CPC classification number: H01L23/5226 ,  H01L2924/0002 ,  H01L2924/00

Abstract: The invention is directed to a method for adjusting sizes and shapes of plug openings for border plug openings overlapping with trenches respectively, wherein the border plug openings are separated from each other with a distance equal to or smaller than a specific distance. The method comprises performing an adjusting process for separating the border plug openings away from each other and enlarging the dimensions of the border plug openings so that the border plug openings are located within the trenches respectively and the edges of the borer openings are separated from the sidewalks of the trenches, wherein the border plug openings are enlarged within ranges of the trenches respectively.

Abstract translation: 本发明涉及一种用于调整与沟槽重叠的边界插头开口的插头开口的尺寸和形状的方法，其中边界插头开口彼此间隔一定距离等于或小于特定距离。 所述方法包括执行调整过程，以将边界插头开口彼此分开，并扩大边界插头开口的尺寸，使得边框插头开口分别位于沟槽内，并且钻孔口的边缘与人行道分开 的沟槽，其中边界插头开口分别在沟槽的范围内扩大。

公开(公告)号：US20070053077A1

公开(公告)日：2007-03-08

申请号：US11218454

申请日：2005-09-02

Applicant: Ling-Chieh Lin ,  I-Hsiung Huang ,  Te-Hung Wu ,  Chin-Lung Lin

Inventor： Ling-Chieh Lin ,  I-Hsiung Huang ,  Te-Hung Wu ,  Chin-Lung Lin

IPC: G02B9/00 ,  G02B9/08

CPC classification number: G03F7/701 ,  G02B5/005 ,  G03F7/70091

Abstract: A customer illumination aperture (CIA) structure for lithographic exposure is disclosed, including a central part and at least one off-axis part around the central part. The off-axis part of the CIA is disposed in a symmetric manner with respect to the central part.

Abstract translation: 公开了一种用于光刻曝光的客户照明孔径（CIA）结构，包括中心部分和围绕中心部分的至少一个离轴部分。 CIA的离轴部分相对于中心部分以对称的方式设置。

公开(公告)号：US07034724B2

公开(公告)日：2006-04-25

申请号：US10904545

申请日：2004-11-16

Applicant: Chin-Lung Lin

Inventor： Chin-Lung Lin

IPC: H03M1/00

CPC classification number: H03M1/1061 ,  H03M1/804

Abstract: A training method of a digital-analog converter is provided. The digital-analog converter comprises a plurality of parallel capacitors, each of which is floatingly coupled to a plurality of correcting capacitors. Two voltages outputted from the digital-analog converter are received and compared. When a latter output voltage is lower than or equal to a former output voltage, the correcting capacitor is used to correct the capacitor corresponding to the latter output voltage until the latter output voltage is higher than the former output voltage. When the latter output voltage is higher than the former output voltage, a new voltage is outputted from the digital-analog convert and compared with the latter output voltage. The steps of comparing and correcting are repeated until every latter output voltage is higher than every former output voltage.

Abstract translation: 提供了数模转换器的训练方法。 数模转换器包括多个并联电容器，每个并联电容器浮动耦合到多个校正电容器。 接收并比较从数模转换器输出的两个电压。 当后一个输出电压低于或等于前一个输出电压时，校正电容器用于校正与后一个输出电压相对应的电容，直到后一个输出电压高于前一个输出电压。 当后一个输出电压高于前一个输出电压时，从数模转换器输出一个新的电压，并与后一个输出电压进行比较。 重复比较和校正的步骤，直到每个后一个输出电压高于每个先前的输出电压。

公开(公告)号：US20050155727A1

公开(公告)日：2005-07-21

申请号：US10759065

申请日：2004-01-20

Applicant: Chin-Lung Lin

Inventor： Chin-Lung Lin

IPC: E06B9/322 ,  E06B9/326 ,  E06B9/70 ,  A47H1/00

CPC classification number: E06B9/70 ,  E06B9/322 ,  E06B9/326

Abstract: A drive device for a sunshade curtain includes a housing with a cover attached thereto, a motor received in the housing with a driving shaft extending through the cover, a driver attached to the free end of the driving shaft, and a pair of switches movably attached to the cover at opposite sides of the driver. The switches have a pair of idlers respectively in contact with the driver at opposite sides of the driver. When a rope for opening or closing the sunshade curtain is received between the driver and the idlers, and when the drive device is turned on to drive the driver, the rotating driver draws the rope to move along the rotation direction thereof through friction. Thus, the sunshade curtain is opened or closed automatically by the drive device through controlling the rotation of the motor.

Abstract translation: 一种用于遮阳帘的驱动装置，包括具有附接到其上的盖的壳体，容纳在壳体中的电动机，具有延伸穿过盖的驱动轴，连接到驱动轴的自由端的驱动器和可移动地连接的一对开关 到司机对面的盖子。 这些开关具有一对惰轮，分别与驾驶员在驾驶员的相对侧接触。 当用于打开或关闭遮阳帘的绳索被接收在驾驶员和惰轮之间时，并且当驱动装置打开以驱动驾驶员时，旋转驾驶员通过摩擦沿着其旋转方向拉动绳索。 因此，遮阳帘由驱动装置通过控制马达的旋转自动地打开或关闭。

公开(公告)号：US20050112473A1

公开(公告)日：2005-05-26

申请号：US10721153

申请日：2003-11-24

Applicant: Wen-Tien Hung ,  Chin-Lung Lin ,  Chuen-Huei Yang

Inventor： Wen-Tien Hung ,  Chin-Lung Lin ,  Chuen-Huei Yang

IPC: G03C5/00 ,  G03F1/00 ,  G03F1/14 ,  G03F9/00

CPC classification number: G03F1/29 ,  G03F1/32

Abstract: The present invention provides a photomask comprising a substrate and a plurality of shielding patterns. The substrate comprising a plurality of shielding regions and a plurality of transparent regions, while each transparent region is disposed between two adjacent shielding regions and has one depression. The depression and the shielding region share a same edge and a sidewall of the depression is aligned with a sidewall of the shielding pattern.

Abstract translation: 本发明提供一种光掩模，其包括基板和多个屏蔽图案。 所述基板包括多个屏蔽区域和多个透明区域，而每个透明区域设置在两个相邻的屏蔽区域之间并且具有一个凹陷部。 凹陷和屏蔽区域共享相同的边缘，并且凹陷的侧壁与屏蔽图案的侧壁对准。

公开(公告)号：US06482559B2

公开(公告)日：2002-11-19

申请号：US10016833

申请日：2001-12-12

Applicant: Chin-Lung Lin

Inventor： Chin-Lung Lin

IPC: G03F900

CPC classification number: G03F7/70441 ,  G03F1/36

Abstract: In a method of optical proximity correction, a main pattern is provided. The main pattern has a critical dimension. When the critical dimension is reduced to reach or fall below a first reference value, a serif/hammerhead is added onto the main pattern. When the critical dimension is further reduced to a second reference value or below, an assist feature is added onto the main pattern. The corrected pattern is then transferred to a layer on the wafer with an improved fidelity.

Abstract translation: 在光学邻近校正的方法中，提供主图案。 主要模式有一个关键的维度。 当临界尺寸减小达到或低于第一参考值时，将衬线/锤头添加到主图案上。 当临界尺寸进一步减小到第二参考值或更低时，辅助特征被添加到主图案上。 然后校正的图案以改进的保真度转移到晶片上的层。

公开(公告)号：US06472108B1

公开(公告)日：2002-10-29

申请号：US09686433

申请日：2000-10-10

Applicant: Chin-Lung Lin

Inventor： Chin-Lung Lin

IPC: G03F900

CPC classification number: G03F1/36

Abstract: An optical proximity correction method. Assist features, such as scattering bars, are added to a main pattern to be transferred. Calculations are performed on the entire two-dimensional original pattern using model-based optical proximity correction. A series of features are added according to the specific reference indexes of the coordinate system. The original pattern is altered to form a corrected pattern. The process of calculation and correction, however, does not include the scattering bars.

Abstract translation: 光学邻近校正方法。 诸如散射条的辅助特征被添加到要传送的主图案中。 使用基于模型的光学邻近校正对整个二维原始图案执行计算。 根据坐标系的具体参考指标，添加一系列特征。 原始图案被改变以形成校正图案。 然而，计算和校正的过程不包括散射条。

公开(公告)号：US06339649B1

公开(公告)日：2002-01-15

申请号：US09290107

申请日：1999-04-12

Applicant: Waterson Chen ,  Chin-Lung Lin

Inventor： Waterson Chen ,  Chin-Lung Lin

IPC: H04R102

CPC classification number: H04R1/2826

Abstract: A loudspeaker system includes at least two loudspeaker units. Each loudspeaker unit includes at least one loudspeaker mechanism mounted on a loudspeaker enclosure. The loudspeaker enclosure includes an outer cabinet body having an open front side, a closed rear side, opposed lateral walls, and opposed top and bottom walls, and an inner baffle frame disposed in the cabinet body. The baffle frame has parallel left and right walls that form a sound space in the baffle frame. The left and right walls further form first clearances with the lateral walls respectively, and have a front portion with the loudspeaker mechanism mounted thereon. The front portion cooperates with the lateral walls to form a pair of acoustic port openings at front ends of the first clearances. The left and right walls further have a rear portion that forms a second clearance with the rear side. The second clearance is communicated with and extends between rear ends of the first clearances. The baffle frame further has a ducting member at the rear portion. The ducting member forms an acoustic path that communicates the sound space and the second clearance such that sound pressure behind the loudspeaker mechanism can be radiated through the acoustic port openings via the sound space, the acoustic path, the second clearance and the first clearances.

Abstract translation: 扬声器系统包括至少两个扬声器单元。 每个扬声器单元包括安装在扬声器外壳上的至少一个扬声器机构。 扬声器外壳包括具有敞开的前侧，封闭的后侧，相对的侧壁和相对的顶壁和底壁以及设置在机壳主体中的内挡板框架的外机壳主体。 挡板框架具有平行的左右壁，在挡板框架中形成一个声音空间。 左右壁还分别与侧壁形成第一间隙，并且具有安装有扬声器机构的前部。 前部与侧壁协作以在第一间隙的前端形成一对声口开口。 左右壁还具有与后侧形成第二间隙的后部。 第二间隙与第一间隙的后端连通并延伸。 挡板框架还具有在后部的管道构件。 管道构件形成声音路径，其传播声音空间和第二间隙，使得扬声器机构后面的声压可以经由声音空间，声学路径，第二间隙和第一间隙通过声学开口辐射。

公开(公告)号：US6087049A

公开(公告)日：2000-07-11

申请号：US457119

申请日：1999-12-07

Applicant: Chin-Lung Lin ,  Yao-Ching Ku

Inventor： Chin-Lung Lin ,  Yao-Ching Ku

IPC: G03F1/00 ,  G03F1/26 ,  G03F1/36 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F1/26 ,  G03F1/36 ,  G03F7/70283 ,  G03F7/70433 ,  G03F7/70441

Abstract: A method of optical proximity correction suitable for use in a mixed mode photomask. An original pattern is to be -transferred from the mixed mode photomask. A binary mask curve and a phase shift mask curve reflecting relationship between critical dimensions of the photomask and the original pattern are obtained. A critical value of the critical dimension is selected. For the binary mask curve, the portion with the critical dimension of the original pattern larger than the critical value is selected. In contrast, for the phase shift mask curve, the portion with the critical dimension of the original pattern smaller than the critical value is selected. These two portions are combined as an optical characteristic curve. The mixed mode photomask can thus be fabricated according to the optical characteristic curve.

Abstract translation: 适用于混合模式光掩模的光学邻近校正方法。 原始模式将从混合模式光掩模传输。 获得反映光掩模的关键尺寸与原始图案之间的关系的二进制掩模曲线和相移掩模曲线。 选择关键维度的临界值。 对于二进制掩模曲线，选择原始图案的临界尺寸大于临界值的部分。 相反，对于相移掩模曲线，选择原始图案的临界尺寸小于临界值的部分。 将这两个部分组合为光学特性曲线。 因此可以根据光学特性曲线制造混合模式光掩模。

公开(公告)号：US6064485A

公开(公告)日：2000-05-16

申请号：US345168

申请日：1999-06-30

Applicant: Chin-Lung Lin ,  Yao-Ching Ku

Inventor： Chin-Lung Lin ,  Yao-Ching Ku

IPC: G03F1/00 ,  G03F1/26 ,  G03F1/36 ,  G03F7/20 ,  G01N11/00

CPC classification number: G03F1/26 ,  G03F1/36 ,  G03F7/70283 ,  G03F7/70433 ,  G03F7/70441

Abstract: A method of optical proximity correction suitable for use in a mixed mode photomask. An original pattern is to be transferred from the mixed mode photomask. A binary mask curve and a phase shift mask curve reflecting relationship between critical dimensions of the photomask and the original pattern are obtained. A critical value of the critical dimension is selected. For the binary mask curve, the portion with the critical dimension of the original pattern larger than the critical value is selected. In contrast, for the phase shift mask curve, the portion with the critical dimension of the original pattern smaller than the critical value is selected. These two portions are combined as an optical characteristic curve. The mixed mode photomask can thus be fabricated according to the optical characteristic curve.