公开(公告)号：US07774322B2

公开(公告)日：2010-08-10

申请号：US11136522

申请日：2005-05-25

Applicant: Christopher S. Davis ,  David R. Johnson ,  Robert F. Day ,  Stephan Hoefnagels ,  Timothy P. McKee

Inventor： Christopher S. Davis ,  David R. Johnson ,  Robert F. Day ,  Stephan Hoefnagels ,  Timothy P. McKee

IPC: G06F17/30

CPC classification number: G06F17/30067 ,  G06F17/30115 ,  G06F17/30123 ,  G06F17/30176

Abstract: A file operations engine is provided that manages many user interactions with their files via a computer system. The operation engine may provide a user with the option to keep both files that have a file name conflict. It may further permit the user to rename a file involved with a file name conflict. The operations engine may also automatically rename one of the files of a file name conflict by appending a character to a root of the filename. The character may include the lowest integer available for the root in a destination for the files. The operations engine may provide the option to keep both files as part of a pre-calculation of potential errors for a requested operation. The operations engine may place file name conflicts in an error queue and permit the user to select an option to keep both files after the conflict is encountered.

Abstract translation: 提供了一种文件操作引擎，通过计算机系统管理与他们的文件的许多用户交互。 操作引擎可以向用户提供保持具有文件名冲突的两个文件的选项。 它还可以允许用户重命名涉及文件名冲突的文件。 操作引擎还可以通过将文件附加到文件名的根来自动重命名文件名冲突的一个文件。 字符可能包括可用于文件目标中根目录的最小整数。 操作引擎可以提供将两个文件作为对所请求操作的潜在错误的预先计算的一部分的选项。 操作引擎可能会将文件名冲突置于错误队列中，并允许用户选择一个选项以在遇到冲突后保留这两个文件。

公开(公告)号：US07580933B2

公开(公告)日：2009-08-25

申请号：US11191070

申请日：2005-07-28

Applicant: David R. Johnson ,  Robert F. Day ,  Stephan Hoefnagels ,  Timothy P. McKee

Inventor： David R. Johnson ,  Robert F. Day ,  Stephan Hoefnagels ,  Timothy P. McKee

IPC: G06F17/30

CPC classification number: G06F21/604 ,  G06F2221/2141 ,  Y10S707/99931 ,  Y10S707/99939

Abstract: A file operations engine and other programming mechanisms are provided for handling file operations errors related to permissions. A file operations engine according to an embodiment of the invention manages many user interactions with their files via a computer system including options for taking a permission for a resource, such as a file, a folder or other object. The operations engine may enable another person to provide a user with a necessary permission for a resource. The operations engine or other programming mechanisms can provide dialogs and user interface mechanisms for handling permissions errors.

Abstract translation: 提供文件操作引擎和其他编程机制来处理与权限相关的文件操作错误。 根据本发明的一个实施例的文件操作引擎通过计算机系统管理许多用户与他们的文件的交互，包括用于对诸如文件，文件夹或其他对象的资源进行许可的选项。 操作引擎可以使另一人能够向用户提供资源所需的许可。 操作引擎或其他编程机制可以提供用于处理权限错误的对话框和用户界面机制。

公开(公告)号：US06831734B2

公开(公告)日：2004-12-14

申请号：US10093350

申请日：2002-03-07

Applicant: Mark Eyolfsou ,  Elton J. Hochhalter ,  Joe Lee Phillips ,  David R. Johnson ,  Peter S. Frank

Inventor： Mark Eyolfsou ,  Elton J. Hochhalter ,  Joe Lee Phillips ,  David R. Johnson ,  Peter S. Frank

IPC: G01N2164

CPC classification number: G01N21/6456 ,  G01N21/4738 ,  G01N21/643 ,  G01N21/6458 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/6421 ,  G01N2021/646 ,  G01N2021/6471

Abstract: A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

Abstract translation: 用于在样品表面上检测诸如光致抗蚀剂材料的特定材料的方法和装置。 将窄光束投影到样品表面上，并且通过光检测器测量在特定波长带处的荧光和/或反射光强度。 光强度被转换为数值，并以电子方式传输到逻辑电路，这决定了样品的正确配置。 逻辑电路控制一个样本处理机器人装置，该装置将样本顺序地传送到用于测试和随后的配置的阶段。 该方法对于在半导体晶片的表面上检测光致抗蚀剂材料特别有用。

公开(公告)号：US06704107B1

公开(公告)日：2004-03-09

申请号：US08964451

申请日：1997-11-04

Applicant: Mark Eyolfson ,  Elton J. Hochhalter ,  Joe Lee Phillips ,  David R. Johnson ,  Peter S. Frank

Inventor： Mark Eyolfson ,  Elton J. Hochhalter ,  Joe Lee Phillips ,  David R. Johnson ,  Peter S. Frank

IPC: G01B1100

CPC classification number: G01N21/6456 ,  G01N21/4738 ,  G01N21/643 ,  G01N21/6458 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/6421 ,  G01N2021/646 ,  G01N2021/6471

Abstract: A method and apparatus for detection of a particular material, such as photoresist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

Abstract translation: 用于在样品表面上检测诸如光致抗蚀剂材料的特定材料的方法和装置。 将窄光束投影到样品表面上，并且通过光检测器测量在特定波长带处的荧光和/或反射光强度。 将光强度转换为数值，并将其电子传输到确定样品的正确配置的逻辑电路。 逻辑电路控制一个样本处理机器人装置，该装置将样本顺序地传送到用于测试和随后的配置的阶段。 该方法对于在半导体晶片的表面上检测光致抗蚀剂材料特别有用。

公开(公告)号：US06429928B2

公开(公告)日：2002-08-06

申请号：US09399242

申请日：1999-09-20

Applicant: David R. Johnson ,  Joe Lee Phillips ,  Todd C. Nielsen ,  Robert J. Hatfield

Inventor： David R. Johnson ,  Joe Lee Phillips ,  Todd C. Nielsen ,  Robert J. Hatfield

IPC: G01B1100

CPC classification number: H01L21/67253 ,  G01N21/55 ,  G01N21/64 ,  G01N21/6489 ,  H01J37/32935 ,  H01J2237/335

Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.

Abstract translation: 用于从衬底表面剥离诸如光致抗蚀剂材料的特定材料的端点检测的方法和装置。 光束投射到基板表面上，并且通过光检测器测量特定波段的发光和/或反射光强度。 光强度被转换为数值，并以电子方式传送到确定衬底的适当布置的控制机构。 控制机构控制剥离过程的停止并且可以控制将衬底顺序地转移到剥离室和从剥离室传送衬底的衬底处理装置。

公开(公告)号：US06226792B1

公开(公告)日：2001-05-01

申请号：US09173095

申请日：1998-10-14

Applicant: David A. Goiffon ,  Gerald E. Hartmann ,  David R. Johnson

Inventor： David A. Goiffon ,  Gerald E. Hartmann ,  David R. Johnson

IPC: G06F945

CPC classification number: G06F8/36

Abstract: An object management system is providing for managing, cataloging, and discovering various potentially reusable code and data components that exist within an Information Technology (IT) platform, and which each have well-defined interfaces with other components. For each of these re-usable code and data components, an associated software object called an “asset element” is created that describes the associated component. Relationships are created between various asset elements to represent the relationships existing between the software components. Other software objects called “locator elements” are created that each describes an application concept or sub-concept. This application concept or sub-concept is associated with a problem solved by the code and data components within the IT platform. Relationships are created between the various locator elements to correlate the concepts and sub-concepts to software constructs represented by asset elements. The object management system further supports various object discovery tools capable of identifying locator elements associated with a particular concept. These locator elements and the associated relationships may then be efficiently traced to identify related asset elements and the associated software and code constructs. This provides an efficient concept-based search mechanism for the code constructs. Other tools are provided for creating, modifying, and deleting the elements. A model may be used to define the various types of relationships and elements that may exist within the system, thereby simplifying the various tools needed to support element creation, modification, deletion, and traversal.

Abstract translation: 对象管理系统正在提供对信息技术（IT）平台中存在的各种潜在可重用的代码和数据组件进行管理，编目和发现，并且每个组件都具有与其他组件的明确界面。 对于这些可重用的代码和数据组件中的每一个，创建了称为“资产元素”的关联软件对象，描述相关组件。 在各种资产元素之间创建关系，以表示软件组件之间存在的关系。 创建称为“定位器元素”的其他软件对象，每个对象描述应用程序概念或子概念。 该应用程序概念或子概念与IT平台中的代码和数据组件解决的问题相关联。 在各种定位器元素之间创建关系，以将概念和子概念与由资产元素表示的软件结构相关联。 对象管理系统还支持能够识别与特定概念相关联的定位符元素的各种对象发现工具。 然后可以有效地跟踪这些定位符元素和关联关系，以识别相关的资产元素和相关的软件和代码结构。 这为代码结构提供了一种高效的基于概念的搜索机制。 提供了其他工具来创建，修改和删除元素。 可以使用模型来定义系统中可能存在的各种类型的关系和元素，从而简化支持元素创建，修改，删除和遍历所需的各种工具。

公开(公告)号：US06179448B2

公开(公告)日：2001-01-30

申请号：US09025213

申请日：1998-02-18

Applicant: David R. Johnson ,  Peter S. Frank ,  Joe L. Phillips ,  Robert J. Hatfield

Inventor： David R. Johnson ,  Peter S. Frank ,  Joe L. Phillips ,  Robert J. Hatfield

IPC: F21V2128

CPC classification number: F21V29/74 ,  F21V19/02 ,  F21V29/505 ,  F21V29/75 ,  F21V29/76 ,  G02B21/06 ,  G03F7/708

Abstract: An apparatus and method for automatically tuning the power and the intensity of light supplied to an illuminated object to some desired values, the apparatus including a light source positionable along at least a first axis with respect to a reflector, a drive assembly for positioning the light source in response to an intensity of light measured by a light meter positioned to sample light reflected from the object along a reflected light path, and a diaphragm having an adjustable aperture for controlling the amount of light supplied to the object. The light source is automatically positioned along the first axis to achieve a maximum intensity of light on the object. The light source may then be automatically positioned along a second axis and a third axis to achieve respective maximum light intensities on the object.

Abstract translation: 一种用于自动调节供应给被照明物体的光的功率和强度达到某些期望值的装置和方法，该装置包括可沿着至少第一轴线相对于反射器定位的光源，用于定位光的驱动组件 响应于由被定位成沿着反射光路对从物体反射的光进行采样的光计测量的光强度的光源，以及具有用于控制提供给对象的光量的可调节光圈的光阑。 光源沿着第一轴自动定位，以实现物体上最大的光强度。 然后可以沿着第二轴和第三轴自动地定位光源，以实现物体上的相应的最大光强度。

公开(公告)号：US6080272A

公开(公告)日：2000-06-27

申请号：US074591

申请日：1998-05-08

Applicant: Rodney C. Langley ,  David R. Johnson ,  Willard L. Hofer

Inventor： Rodney C. Langley ,  David R. Johnson ,  Willard L. Hofer

IPC: H01L21/00 ,  C23F1/02 ,  B23B5/22

CPC classification number: H01L21/67069 ,  H01J37/32082 ,  H01J2237/2001 ,  Y10T279/23

Abstract: A plasma etching machine comprises a process chamber defining an interior region and including a bottom wall having an aperture and a block disposed in the aperture and including a longitudinally extending bore. A shaft extends through the bore and includes a spider push rod extending longitudinally therethrough. An internally cooled chuck is coupled to the shaft and disposed in the interior region and cooperates with the shaft to define a chamber. A spider is disposed in the chamber and is coupled to the push rod. A lift mechanism is coupled to the shaft and the push rod so that the spider pushes up on a wafer in response to actuation of the lift mechanism. A wafer clamping mechanism is coupled to the push rod if a mechanical clamp is used. In the case of electrostatic clamp the bias applied to the chuck is coupled with the use of a rotational roller to allow the bias to be applied to the chuck for the duration of the etch process. A RF source is needed for ionization of the gas. If the plasma etching machine has RF power applied through the bottom, then a rotational roller is used for this as well and must be isolated from the electrostatic voltage used to clamp the wafer. A drive motor is coupled to the shaft for rotating the shaft during a plasma etching process.

公开(公告)号：US5969805A

公开(公告)日：1999-10-19

申请号：US963508

申请日：1997-11-04

Applicant: David R. Johnson ,  Joe Lee Phillips ,  Todd C. Nielsen ,  Robert J. Hatfield

Inventor： David R. Johnson ,  Joe Lee Phillips ,  Todd C. Nielsen ,  Robert J. Hatfield

IPC: G01N21/27 ,  G01N21/55 ,  G01N21/64 ,  G01N21/88 ,  G01N21/956 ,  H01J37/32 ,  H01L21/00 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/66 ,  G01B11/00 ,  G01B11/06

CPC classification number: H01L21/67253 ,  G01N21/55 ,  G01N21/64 ,  H01J37/32935 ,  G01N21/6489 ,  H01J2237/335

Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.

公开(公告)号：US5498327A

公开(公告)日：1996-03-12

申请号：US466655

申请日：1995-06-06

Applicant: Bruce E. Stangeland ,  David C. Kramer ,  David S. Smith ,  James T. McCall ,  Georgieanne L. Scheuerman ,  Robert W. Bachtel ,  David R. Johnson

Inventor： Bruce E. Stangeland ,  David C. Kramer ,  David S. Smith ,  James T. McCall ,  Georgieanne L. Scheuerman ,  Robert W. Bachtel ,  David R. Johnson

IPC: B01J8/00 ,  B01J8/12 ,  B01J8/18 ,  B01J8/22 ,  C10G35/10 ,  C10G45/00 ,  C10G49/00 ,  C10G49/14 ,  C10G11/18

CPC classification number: B01J8/003 ,  B01J8/008 ,  B01J8/125 ,  B01J8/1881 ,  B01J8/22 ,  C10G49/002 ,  C10G49/14 ,  B01J2208/00884

Abstract: This invention makes possible substantially continuous flow of uniformly distributed hydrogen and hydrocarbon liquid across a densely packed catalyst bed to fill substantially the entire volume of a reactor vessel by introducing the fluids as alternate annular rings of gas and liquid (i.e. a mixture of liquid hydrocarbon and a hydrogen-containing gas) at a rate insufficient to levitate or ebullate the catalyst bed. Catalyst are selected by density, shape and size at a design feed rate of liquids and gas to prevent ebullation of the packed bed at the design feed rates. Catalysts are selected by measuring bed expansion, such as in a large pilot plant run, with hydrocarbon, hydrogen, and catalyst at the design pressures and flow velocities. The liquid and gas components of the feed flow into the bed in alternate annular rings across the full area of the bed. At the desired flow rate, such catalyst continually flows in a plug-like manner downwardly through the reactor vessel by introducing fresh catalyst at the top of the catalyst bed by laminarly flowing such catalyst in a liquid stream on a periodic or semicontinuous basis. Catalyst is similarly removed by laminarly flowing catalyst particles in a liquid stream out of the bottom of the catalyst bed.

Abstract translation: 本发明使得均匀分布的氢气和烃液体可以在密集填充的催化剂床上基本连续地流动，以通过将流体作为气体和液体的替代环​​形环（即，液体烃和液体烃的混合物）引入反应器容器的基本整个体积 含氢气体），其速率不足以使催化剂床漂浮或沸腾。 在液体和气体的设计进料速率下，通过密度，形状和尺寸选择催化剂，以防止填料床以设计进料速率进行沸腾。 通过在设计压力和流速下测量床膨胀，例如在大型中试设备运行中与烃，氢气和催化剂进行选择。 进料床的液体和气体组分在床的整个区域内以交替的环形环流入床中。 以期望的流速，这种催化剂以塞子状方式向下延伸穿过反应器容器，通过在催化剂床的顶部引入新鲜的催化剂，通过在液体流中以周期性或半连续的方式层流流动这种催化剂。 催化剂类似地通过层流流动的催化剂颗粒在催化剂床底部的液体流中除去。