公开(公告)号：US20080069669A1

公开(公告)日：2008-03-20

申请号：US11857271

申请日：2007-09-18

申请人： Keisuke Kondoh ,  Hiroshi Koizumi

发明人： Keisuke Kondoh ,  Hiroshi Koizumi

IPC分类号： H01L21/67 ,  B65D85/86 ,  H01L21/687

CPC分类号： H01L21/67253 ,  H01L21/67196 ,  H01L21/67748 ,  H01L21/67772

摘要： A method adjusts a pressure in a substrate processing device. The substrate processing device has a processing chamber for executing a predetermined processing for a substrate to be processed mounted on a mounting table; a pressure adjustment unit for the processing chamber which adjusts a pressure within the processing chamber; a transfer chamber connected to the processing chamber via a gate valve; and a pressure adjustment unit for the transfer chamber which adjusts a pressure in the transfer chamber and adjusts a pressure within the processing chamber while the gate valve is opened. The method is to adjust a pressure within the processing chamber to a predetermined pressure by using both the pressure adjustment unit for the processing chamber and the pressure adjustment unit for the transfer chamber.

摘要翻译： 一种方法调节衬底处理装置中的压力。 基板处理装置具有用于对安装在安装台上的待加工基板进行预定处理的处理室; 用于处理室的压力调节单元，其调节处理室内的压力; 经由闸阀连接到处理室的传送室; 以及用于传送室的压力调节单元，其调节所述传送室中的压力并且在所述闸阀打开时调节所述处理室内的压力。 该方法是通过使用用于处理室的压力调节单元和用于传送室的压力调节单元来将处理室内的压力调节到预定压力。

公开(公告)号：USD564655S1

公开(公告)日：2008-03-18

申请号：US29261308

申请日：2006-06-13

申请人： Hiroshi Koizumi ,  Ryosuke Miyagawa ,  Yoshikazu Ishitsuka ,  Tetsuya Tanaka ,  Shigeharu Sayama

设计人： Hiroshi Koizumi ,  Ryosuke Miyagawa ,  Yoshikazu Ishitsuka ,  Tetsuya Tanaka ,  Shigeharu Sayama

公开(公告)号：US20080004576A1

公开(公告)日：2008-01-03

申请号：US11768384

申请日：2007-06-26

申请人： Tetsuya TANAKA ,  Ryosuke Miyagawa ,  Yoshikazu Ishitsuka ,  Hiroshi Koizumi ,  Shigeharu Sayama

发明人： Tetsuya TANAKA ,  Ryosuke Miyagawa ,  Yoshikazu Ishitsuka ,  Hiroshi Koizumi ,  Shigeharu Sayama

IPC分类号： A61M1/00 ,  A61F5/44

CPC分类号： A61F5/451 ,  A61B5/208 ,  A61M1/0001 ,  A61M1/0025 ,  A61M1/005 ,  A61M2202/0496 ,  A61M2205/3393

摘要： An automatic urine collection apparatus includes a collection container for accumulating urine transferred from a urine receiver through a tube and a main body for supporting the collection container, wherein the main body includes a suction pump for sucking the urine received by the urine receiver and carrying the urine to the collection container, a mass sensor for measuring the urine accumulated in the collection container, a control board for calculating a volume of the urine based on the measured mass of the urine, and an indicator for indicating the calculated volume of the urine.

摘要翻译： 一种自动尿液收集装置，包括：收集容器，用于积聚从尿液接收器经由管传送的尿液和用于支撑收集容器的主体，其中，所述主体包括抽吸泵，所述抽吸泵吸收由所述尿液接收器接收的尿液， 尿液到收集容器，用于测量收集容器中积聚的尿液的质量传感器，用于根据测量的尿液量计算尿液体积的控制板和用于指示计算出的尿量的指示器。

公开(公告)号：USD494552S1

公开(公告)日：2004-08-17

申请号：US29183537

申请日：2003-06-12

申请人： Kazuyuki Tezuka ,  Takashi Kitazawa ,  Norihiko Amikura ,  Hiroshi Koizumi

设计人： Kazuyuki Tezuka ,  Takashi Kitazawa ,  Norihiko Amikura ,  Hiroshi Koizumi

公开(公告)号：US06746196B1

公开(公告)日：2004-06-08

申请号：US09889148

申请日：2001-07-12

申请人： Jun Ozawa ,  Jun Hirose ,  Eiji Hirose ,  Hiroshi Koizumi

发明人： Jun Ozawa ,  Jun Hirose ,  Eiji Hirose ,  Hiroshi Koizumi

IPC分类号： B65G4907

CPC分类号： H01L21/68707 ,  H01L21/67742 ,  H01L21/6835 ,  Y10S414/139

摘要： A vacuum treatment device, comprising a vacuum treatment chamber (1) etching a semiconductor wafer (W) as a body to be treated and a preliminary vacuum chamber (2) communicating with the vacuum treatment chamber (1), wherein a transfer arm (5) and first and second buffers (6, 7) for temporarily supporting the wafer (W) are installed in the preliminary vacuum chamber (2), the transfer arm (5) is provided with a flexible arm part (5a) and a support part (16) supporting the wafer (W), the arm part (5a) is extended and retracted by the rotations of a drive side swing arm (14) and a driven side swing arm (15) forming the arm (5a) so as to move the support part (16) straight forward and backward while maintaining it in its attitude, and the first and second buffers (6, 7) are disposed on the motion route of the support part (16) of the transfer arm (5).

摘要翻译： 1.一种真空处理装置，其特征在于，具备对作为被处理体的半导体晶片（W）进行蚀刻的真空处理室（1）和与所述真空处理室（1）连通的预备真空室（2），其特征在于， ）和用于临时支撑晶片（W）的第一和第二缓冲器（6,7）安装在预备真空室（2）中，传送臂（5）设置有柔性臂部分（5a）和支撑部分 （16）支撑晶片（W）时，通过驱动侧摆臂（14）和形成臂（5a）的从动侧摆臂（15）的旋转使臂部（5a）伸长和缩回，从而 在保持其姿态的同时将支撑部（16）向前后方向移动，第一缓冲器（6,7）设置在传送臂（5）的支撑部（16）的运动路径上。

公开(公告)号：US06645405B2

公开(公告)日：2003-11-11

申请号：US09883706

申请日：2001-06-18

申请人： Hisato Shimizu ,  Hiroshi Koizumi ,  Kazutoyo Kobayashi

发明人： Hisato Shimizu ,  Hiroshi Koizumi ,  Kazutoyo Kobayashi

IPC分类号： B29C4577

CPC分类号： B29C45/54 ,  B29C2045/548

摘要： An unstable weighing due to the plunger sliding resistance in a prepla type injection molding machine is prevented by dividing control of the plunger retraction movement for the weighing into speed control and pressure control. A plastic resin supply start position and a forced retraction release position are set along the way of the plunger retraction stroke by reference to a weighing start position. A plunger is moved from the weighing start position after injection and pressure-keeping to a weighing stop retraction position. Plastic resin is supplied to the forward portion of the injection cylinder when the plunger attains the supply start position from the weighing start position. The plunger is moved by forced retraction up to the forced retraction release position by speed control; the weighing is stabilized by changing the speed control to the pressure control once the plunger attains the forced retraction release position.

摘要翻译： 通过将用于称重的柱塞缩回运动的控制分成速度控制和压力控制来防止由于预成型注塑机中的柱塞滑动阻力导致的不稳定称重。 通过参考称重开始位置沿塑料树脂供给开始位置和强制退回释放位置沿柱塞退回行程的方式设置。 柱塞在注射和压力保持之后从称重起始位置移动到称重停止缩回位置。 当柱塞从称重开始位置到达供给开始位置时，将塑料树脂供给到注射缸的前部。 柱塞通过强制退回移动到强制退回释放位置，通过速度控制; 一旦柱塞达到强制退回释放位置，通过将速度控制改变为压力控制来使称重稳定。

公开(公告)号：US06497614B2

公开(公告)日：2002-12-24

申请号：US09824365

申请日：2001-04-02

申请人： Akio Kobayashi ,  Yumi Takahashi ,  Hiroshi Koizumi ,  Kazuo Abe ,  Makoto Taya ,  Michiko Nakanishi ,  Susumu Saito

发明人： Akio Kobayashi ,  Yumi Takahashi ,  Hiroshi Koizumi ,  Kazuo Abe ,  Makoto Taya ,  Michiko Nakanishi ,  Susumu Saito

IPC分类号： B24B100

CPC分类号： B24B37/013 ,  B24B9/146 ,  B24B47/22

摘要： In a lens periphery edge processing apparatus comprising lens rotating shafts 16, 17 for putting and holding an objective lens therebetween, a carriage 15 rotatable around a pivot, and a grindstone rotating shaft 9 provided with a grindstone 5 for grinding the objective lens L, the lens rotating shaft 17 is provided with a reference globe 70 having a predetermined radius.

摘要翻译： 在透镜周边边缘处理装置中，包括用于放置和保持物镜的透镜旋转轴16,17，可绕枢轴旋转的托架15和设置有用于研磨物镜L的砂轮5的砂轮旋转轴9， 透镜旋转轴17设置有具有预定半径的基准球面70。

公开(公告)号：US6048105A

公开(公告)日：2000-04-11

申请号：US932816

申请日：1997-09-16

申请人： Fumio Ohtomo ,  Hiroshi Koizumi ,  Masayuki Momiuchi ,  Masahiro Ohishi ,  Yoshiaki Goto

发明人： Fumio Ohtomo ,  Hiroshi Koizumi ,  Masayuki Momiuchi ,  Masahiro Ohishi ,  Yoshiaki Goto

IPC分类号： G01C15/00 ,  G02B6/42 ,  G02B6/26

CPC分类号： G02B6/4226 ,  G01C15/002 ,  G02B6/4216

摘要： A laser system for surveying, which comprises a laser light source unit, an optical system for irradiating a laser beam from the laser light source unit toward a given direction, whereby said laser light source unit is at least thermally isolated from the optical system, and the laser beam from the laser light source unit is guided toward the optical system by an optical fiber. Because the laser light source unit, or at least a heat generating portion of the light source unit is isolated from the optical system, no influence of heat from the laster light source unit is exerted on the optical system, and it is possible to prevent decrease of accuracy due to heat and to maintain the laser system for surveying in a condition to provide measurement at high accuracy.

摘要翻译： 一种用于测量的激光系统，包括激光光源单元，用于将来自激光光源单元的激光束朝向给定方向照射的光学系统，由此所述激光光源单元至少与光学系统热隔离，以及 来自激光光源单元的激光束通过光纤被引导到光学系统。 因为激光光源单元或至少光源单元的发热部分与光学系统隔离，所以不会对光学系统施加来自光源单元的热的影响，并且可以防止减小 由于热量导致的精度，并保持激光系统的测量，以提供高精度的测量。

公开(公告)号：US5969878A

公开(公告)日：1999-10-19

申请号：US922181

申请日：1997-09-02

申请人： Hiroshi Koizumi

发明人： Hiroshi Koizumi

IPC分类号： G02B13/18 ,  G02B15/177 ,  G02B15/20 ,  G02B15/14 ,  G02B9/12 ,  G02B13/04

CPC分类号： G02B15/177

摘要： A zoom lens system for use in a camera having a color filter and a CCD achieves a magnification ratio of about 2.9 or greater and a back focus of about 9.2 or greater. The zoom lens system includes in order from an object side of the lens system, a first lens group having a negative refracting power, a second lens group spaced from the first lens group and having a positive refracting power and a third lens group spaced from the second lens group and having a positive refracting power. One or both of the fifth and an eighth lens surface has an aspherical surface, the fifth and eighth lens surfaces being counted from the object side. The second lens group includes five lenses with an extra lens being located at a far end of the second lens group relative to the object side. Each of the first, second and third lens groups is movable from a first position when the lens system is in a wide position to a second position when the lens system is in a tele position.

摘要翻译： 用于具有滤色器和CCD的相机中的变焦透镜系统实现了大约2.9或更大的放大倍数和大约9.2或更大的后焦距。 变焦透镜系统从透镜系统的物体侧起依次包括具有负折射力的第一透镜组，与第一透镜组间隔开并且具有正折射率的第二透镜组，以及与第一透镜组间隔开的第三透镜组 第二透镜组并且具有正的折射光焦度。 第五和第八透镜表面中的一个或两个具有非球面，第五和第八透镜表面从物体侧开始计数。 第二透镜组包括五个透镜，其中多个透镜位于第二透镜组相对于物体侧的远端。 当透镜系统处于远程位置时，当透镜系统处于宽位置到第二位置时，第一，第二和第三透镜组中的每一个可从第一位置移动。

公开(公告)号：US5953116A

公开(公告)日：1999-09-14

申请号：US18907

申请日：1998-02-05

申请人： Fumio Ohtomo ,  Hiroshi Koizumi ,  Jun-ichi Kodaira

发明人： Fumio Ohtomo ,  Hiroshi Koizumi ,  Jun-ichi Kodaira

IPC分类号： G01C9/06 ,  G01C9/24 ,  G01C15/00 ,  G01C9/18

CPC分类号： G01C9/06 ,  G01C15/00 ,  G01C2009/066

摘要： A tilt detecting device of the present invention comprises a bubble tube 21, a light emitting element 22 for emitting detection light and photodetector elements 23 and 24 arranged opposite to each other with the bubble tube therebetween, and at least a light shading plate 35 disposed on an optical path of the detection light 26 and for partially blocking off light components entering the photodetector elements from the light emitting element, whereby a part of the detection light entering the photodetector elements is blocked off and it increase difference and ratio of light amounts between the case where the detection light passes through the air bubble of the bubble tube and the case where it passes through only the liquid portion of the bubble tube, and tilt detection accuracy is improved.

摘要翻译： 本发明的倾斜检测装置包括气泡管21，用于发射检测光的发光元件22和彼此相对布置的光电检测器元件23和24，并且至少设置有遮光板35 检测光26的光路，并且用于从发光元件部分地遮断进入光检测器元件的光成分，从而阻止进入光电检测器元件的检测光的一部分被增加，并且增加了光量 检测光通过气泡管的气泡和仅通过气泡管的液体部分的情况，提高了倾斜检测精度。