公开(公告)号：US07466531B2

公开(公告)日：2008-12-16

申请号：US11770979

申请日：2007-06-29

申请人： Atsushi Ito ,  Keiji Emoto

发明人： Atsushi Ito ,  Keiji Emoto

IPC分类号： H01T23/001

CPC分类号： H01L21/683 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  H01L21/6831 ,  H01L21/6838

摘要： A substrate holding system for holding a substrate based on vacuum attraction and electrostatic attraction including a rim configured to support the substrate, a protrusion for the electrostatic attraction, configured to support the substrate inside the rim, and a protrusion for the vacuum attraction, configured to support the substrate inside the rim. A substrate supporting surface area of the protrusion of the electrostatic attraction is larger than a substrate supporting surface area of the protrusion for the vacuum attraction.

摘要翻译： 一种用于基于真空吸引和静电吸引保持基板的基板保持系统，包括构造成支撑基板的边缘，用于静电吸引的突起，被配置为将基板支撑在边缘内，以及用于真空吸引的突起， 支撑轮辋内的基底。 静电吸引突起的基板支撑表面积大于用于真空吸引的突起的基板支撑表面积。

公开(公告)号：US07392718B2

公开(公告)日：2008-07-01

申请号：US11272560

申请日：2005-11-10

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： G01N1/00

CPC分类号： B01L7/52 ,  B01L2300/1855 ,  B01L2300/1866 ,  B01L2300/1894

摘要： Disclosed is a temperature adjusting system for adjusting temperature of a sample, that includes a sample container for containing a sample therein, and a cooling unit for applying a liquid to a surface of the sample container, to cool the sample on the basis of heat of vaporization of the liquid on the surface of the sample container.

摘要翻译： 公开了一种用于调节样品的温度的温度调节系统，其包括用于容纳样品的样品容器和用于将液体施加到样品容器的表面的冷却单元，以基于 液体在样品容器的表面上蒸发。

公开(公告)号：US20080117398A1

公开(公告)日：2008-05-22

申请号：US11940143

申请日：2007-11-14

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70733

摘要： A scanning immersion exposure apparatus includes a stage capable of delivering an area in contact with liquid to another member. The stage has a delivery portion configured to enable the area to the another member and one or more reference marks for positioning the stage with respect to a reticle. The delivery portion is disposed on the side opposite to a reference mark that is measured immediately before exposure relative to a first line that passes through the center of the substrate and extends perpendicular to a scanning direction.

摘要翻译： 扫描浸渍曝光装置包括能够将与液体接触的区域输送到另一构件的台。 舞台具有配置成能够使该区域与另一个构件和一个或多个参考标记相对于掩模版定位平台的传送部分。 输送部分设置在与基准标记相反的一侧，该基准标记在曝光前相对于穿过基板中心并垂直于扫描方向延伸的第一条线测量。

公开(公告)号：US20060220478A1

公开(公告)日：2006-10-05

申请号：US11392601

申请日：2006-03-30

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： H02K9/00 ,  H02K41/00

CPC分类号： G03F7/70758 ,  G03F7/70775 ,  G03F7/70858 ,  H02K9/005 ,  H02K15/125 ,  H02K41/03

摘要： Disclosed is a positioning system and an exposure apparatus having the same, wherein in accordance with an aspect of the present invention the positioning system includes a stage being movable and being configured to carry an object thereon, an interferometer configured to measure a position of the stage, a driving system configured to drive the stage, and a heater provided between a light path of the interferometer and a coil which is a component element of the driving system. In one preferred form of the present invention, the heater has a film-like shape or it is formed as a portion of a cooling jacket that is configured to cover the coil.

摘要翻译： 公开了一种定位系统和具有该定位系统的曝光设备，其中根据本发明的一个方面，定位系统包括可移动并被配置为在其上承载物体的台架，干涉仪被配置为测量台架的位置 配置为驱动所述载物台的驱动系统，以及设置在所述干涉仪的光路和作为所述驱动系统的构成要素的线圈之间的加热器。 在本发明的一个优选形式中，加热器具有膜状形状，或者形成为构造成覆盖线圈的冷却套的一部分。

公开(公告)号：US20060187437A1

公开(公告)日：2006-08-24

申请号：US11406442

申请日：2006-04-19

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： G03B27/58

CPC分类号： F16C29/025 ,  F16C32/0603 ,  F16C33/748 ,  F16C2300/62 ,  G03F7/70758 ,  G03F7/70816 ,  G03F7/70875

摘要： An alignment apparatus includes a first support member having a reference surface which movably supports an object, a driving unit which moves the object in at least one direction on the reference surface and aligns the object at a predetermined position, and a second support member which is provided separately from the first support member and supports a heating unit of the driving unit through a bearing.

公开(公告)号：US07053982B2

公开(公告)日：2006-05-30

申请号：US10847455

申请日：2004-05-18

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： G03B27/42

CPC分类号： F16C29/025 ,  F16C32/0603 ,  F16C33/748 ,  F16C2300/62 ,  G03F7/70758 ,  G03F7/70816 ,  G03F7/70875

摘要： An alignment apparatus includes a first support member having a reference surface which movably supports an object, and a driving unit which moves the object in at least one direction on the reference surface and aligns the object at a predetermined position. The driving unit includes (i) a first driving unit which moves the object in a first direction, and (ii) a second driving unit which moves the object in a second direction, substantially perpendicular to the first direction. The alignment apparatus further includes a second support member which is provided separately from the first support member and supports a heating unit of the driving unit, through a bearing. The first support member supports the object so as to allow the object to move in the first and second directions, and the second support member supports the first and second driving units. The first driving unit has a first movable element which moves the object in the first direction and a first stator which applies a driving force to the first movable element. The second driving unit has a second movable element which moves the object in the second direction and a second stator which applies a driving force to the second movable element. The bearing has a hydrostatic bearing, and the first and second stators are supported on the second support member through the hydrostatic bearing.

摘要翻译： 对准装置包括具有可移动地支撑物体的参考表面的第一支撑构件和在参考表面上沿至少一个方向移动物体并使物体在预定位置对准的驱动单元。 驱动单元包括：（i）第一驱动单元，其沿第一方向移动物体;以及第二驱动单元，其沿着与第一方向大致垂直的第二方向移动物体。 对准装置还包括与第一支撑构件分开设置并且通过轴承支撑驱动单元的加热单元的第二支撑构件。 第一支撑构件支撑物体以允许物体沿第一和第二方向移动，并且第二支撑构件支撑第一和第二驱动单元。 第一驱动单元具有使物体沿第一方向移动的第一可移动元件和向第一可移动元件施加驱动力的第一定子。 第二驱动单元具有使物体沿第二方向移动的第二可移动元件和向第二可移动元件施加驱动力的第二定子。 轴承具有静压轴承，第一和第二定子通过静压轴承支撑在第二支撑构件上。

公开(公告)号：US07012690B2

公开(公告)日：2006-03-14

申请号：US10998670

申请日：2004-11-30

申请人： Kotaro Akutsu ,  Keiji Emoto

发明人： Kotaro Akutsu ,  Keiji Emoto

IPC分类号： G00B11/00 ,  G00B27/52

CPC分类号： G03F7/70733 ,  G03F7/70725 ,  G03F7/7075 ,  G03F7/70775 ,  G03F7/70991 ,  H01L21/681 ,  H01L21/682

摘要： In order to perform a measurement operation of a pattern and a processing operation in parallel while the positions of two substrate stages are accurately measured and wire/hose units are prevented from becoming tangled, a substrate processing apparatus includes an alignment system for measuring the pattern arrangements of the substrates, a processing system disposed separately from the alignment system and used for processing the substrates, substrate stages which are able to support the substrates and move in an xy plane, and position measurement systems which measure the positions of the substrate stages. Four position measurement systems are arranged for the measurement in the x direction, and three position measurement systems are arranged for the measurement in the y direction. One of the position measurement systems for the measurement in the y direction is disposed at a side opposite to the remaining positioning measurement systems across the substrate stages.

公开(公告)号：US06954258B2

公开(公告)日：2005-10-11

申请号：US10207800

申请日：2002-07-31

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： G03F7/20 ,  G05D3/12 ,  G05D23/27 ,  H01L21/027 ,  G03B27/58 ,  G03B27/52

CPC分类号： G03F7/70708 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70758 ,  G03F7/70875 ,  G03F7/709

摘要： A positioning apparatus for performing position of a target object in a vacuum atmosphere. The apparatus includes a first structure, a second structure which is movable relative to the first structure and supports the target object, a radiation plate, which is arranged on the first structure, performing heat exchange between the radiation plate and the second temperature by utilizing radiation, and a temperature adjusting device for adjusting of a temperature of the radiation plate. The temperature adjusting device adjusts the temperature of the radiation plate to control a temperature of the second structure or the target object.

摘要翻译： 一种用于在真空气氛中执行目标物体的位置的定位装置。 该装置包括：第一结构，可相对于第一结构移动并支撑目标物体的第二结构;布置在第一结构上的辐射板，通过利用辐射进行辐射板与第二温度之间的热交换 以及用于调节辐射板的温度的温度调节装置。 温度调节装置调节辐射板的温度以控制第二结构或目标物体的温度。

公开(公告)号：US20050212361A1

公开(公告)日：2005-09-29

申请号：US11074642

申请日：2005-03-09

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： G03F7/20 ,  H01L21/027 ,  H02K41/00 ,  G03B27/42

CPC分类号： G03F7/70875 ,  G03F7/70758 ,  Y10T74/20201

摘要： A stage device for driving a movable element, mounted with an object thereon, by using a plane motor, including: (i) a stator unit having a coil group; and (ii) the movable element which moves on the stator unit, the stator unit including: (a) a first region where the object is to be subjected to a first process; and (b) a second region where the object is to be subjected to a second process, wherein the coil group in the stator unit is temperature-controlled independently between the first and second regions.

摘要翻译： 一种用于通过使用平面电动机驱动安装有物体的可移动元件的平台装置，包括：（i）具有线圈组的定子单元; 和（ii）在所述定子单元上移动的所述可动元件，所述定子单元包括：（a）所述物体将经受第一处理的第一区域; 和（b）第二区域，其中物体将进行第二处理，其中定子单元中的线圈组在第一和第二区域之间独立进行温度控制。

公开(公告)号：US20050016685A1

公开(公告)日：2005-01-27

申请号：US10879074

申请日：2004-06-30

申请人： Keiji Emoto ,  Atsushi Ito

发明人： Keiji Emoto ,  Atsushi Ito

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/683 ,  H01L21/306 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/70708 ,  G03F7/707 ,  H01L21/6831

摘要： Disclosed is a stage system that includes a stage for supporting and moving a substrate, and a probe for measuring a potential of a substrate without contact thereto, the probe being supported by the stage so as to be opposed to one of a bottom face and a side face of the substrate. Also disclosed is a stage system that includes a substrate holding member for holding a substrate, the substrate holding member having a protrusion and a first electrode, the first electrode being provided inside the substrate holding member and adjacent said protrusion, a terminal for adjusting a potential of said first electrode, and a stage for supporting and moving the substrate holding member through the terminal. Further, a substrate holding system is disclosed, that includes a plurality of protrusions to be supported by a stage, and a plurality of first electrodes disposed adjacent the plurality of protrusions, respectively, and for electrostatically attracting the stage.

摘要翻译： 公开了一种舞台系统，其包括用于支撑和移动衬底的台，以及用于测量衬底的电位而不与其接触的探针，所述探针由所述台支撑以与底面和 基板的侧面。 还公开了一种舞台系统，其包括用于保持衬底的衬底保持构件，所述衬底保持构件具有突起和第一电极，所述第一电极设置在衬底保持构件内部并且邻近所述突起，用于调节电位的端子 的第一电极，以及用于通过端子支撑和移动衬底保持构件的台。 此外，公开了一种基板保持系统，其包括由台架支撑的多个突起和分别邻近多个突起设置并用于静电吸引台的多个第一电极。