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公开(公告)号：US07791049B2
公开(公告)日：2010-09-07
申请号：US12100973
申请日：2008-04-10
申请人： Mitsukuni Tsukihara , Yoshito Fujii
发明人： Mitsukuni Tsukihara , Yoshito Fujii
IPC分类号： H01J37/317 , G21K5/04
CPC分类号： H01J37/3171 , H01J37/045 , H01J37/244 , H01J37/304 , H01J2237/0213 , H01J2237/151 , H01J2237/24405 , H01J2237/30455 , H01J2237/31703
摘要： A beam line before incidence on a beam scanner is arranged with an injector flag Faraday cup that detects a beam current by measuring a total beam amount of an ion beam to be able to be brought in and out thereto and therefrom. When the ion beam is shut off by placing the injector flag Faraday cup on a beam trajectory line, the ion beam impinges on graphite provided at the injector flag Faraday cup. At this occasion, even when the graphite is sputtered by the ion beam, since the injector flag Faraday cup is arranged on an upstream side of the beam scanner and the ion beam is shut off by the injector flag Faraday cup, particles of the sputtered graphite do not adhere to a peripheral member of the injector flag Faraday cup.
摘要翻译： 在光束扫描仪入射之前的光束线布置有喷射器标记法拉第杯，其通过测量离子束的总光束量来检测束流，从而能够将其输入和输出。 当通过将注射器标记法拉第杯放置在梁轨迹线上来关闭离子束时，离子束撞击在注射器标记法拉第杯处提供的石墨上。 在这种情况下，即使当石墨被离子束溅射时，由于注射器标志法拉第杯布置在射束扫描器的上游侧，并且离子束被注射器标记法拉第杯切断，溅射的石墨颗粒 不要附着在注射器标志法拉第杯的周边部件上。
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公开(公告)号：US07718980B2
公开(公告)日：2010-05-18
申请号：US11806128
申请日：2007-05-30
IPC分类号： H01J37/30
CPC分类号： H01J37/3171 , H01J37/04 , H01J37/05 , H01J2237/055 , H01J2237/30483
摘要： A beam processing system is for causing a particle beam extracted from a beam generating source to pass through a mass analysis magnet device, a mass analysis slit, and a deflection scanner in the order named, thereby irradiating the particle beam onto a processing object. The mass analysis slit is installed between the mass analysis magnet device and the deflection scanner at a position where the particle beam having passed through the mass analysis magnet device converges most in a lateral direction. A first DC quadrupole electromagnet and a second DC quadrupole electromagnet are installed on an upstream side and a downstream side of the mass analysis slit, respectively.
摘要翻译： 光束处理系统用于使从束发生源提取的粒子束按照所述顺序通过质量分析磁体装置，质量分析狭缝和偏转扫描器，从而将粒子束照射到处理对象上。 在通过质量分析用磁体装置的粒子束在横向收敛最多的位置处，将质量分析用狭缝安装在质量分析磁体装置与偏转扫描仪之间。 第一直流四极电磁体和第二直流四极电磁体分别安装在质量分析狭缝的上游侧和下游侧。
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33.发明申请Ion Implantation Apparatus and Method of Converging/Shaping Ion Beam Used Therefor 失效离子注入装置及其所用的离子束聚合/成形方法公开(公告)号：US20080251734A1
公开(公告)日：2008-10-16
申请号：US12100861
申请日：2008-04-10
IPC分类号： G21K1/08
CPC分类号： H01J37/3171 , H01J37/05 , H01J37/304 , H01J2237/30477
摘要： An ion implantation apparatus reciprocally scans an ion beam extracted from an ion source and passed through a mass analysis magnet apparatus and a mass analysis slit and irradiates to a wafer. The ion beam is converged and shaped by providing a first quadrupole vertical focusing electromagnet at a section of a beam line from an outlet of the mass analysis magnet apparatus before incidence of the mass analysis slit and providing a second quadrupole vertical focusing electromagnet having an effective magnetic field effect larger than that of the first quadrupole focusing electromagnet at a section of the beam line from an outlet of the mass analysis slit before incidence on the beam scanner.
摘要翻译： 离子注入装置相互扫描从离子源提取的离子束并通过质量分析磁体装置和质量分析狭缝并照射到晶片。 通过在质量分析用狭缝入射之前从质量分析磁体装置的出口在梁线的一部分处设置第一四极杆垂直聚焦电磁体并提供具有有效磁性的第二四极杆垂直聚焦电磁体，离子束会聚并成形 在光束扫描器上入射之前，在质量分析狭缝的出口处的光束线的一部分处的第一四极聚焦电磁体的场效应大于第一四极聚焦电磁体。
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34.发明授权Method to increase low-energy beam current in irradiation system with ion beam 有权用离子束增加照射系统中低能量束电流的方法公开(公告)号：US07361892B2
公开(公告)日：2008-04-22
申请号：US11202099
申请日：2005-08-12
CPC分类号： H01J37/3171 , H01J27/024 , H01J37/023 , H01J37/05 , H01J37/1474 , H01J37/1478 , H01J37/15 , H01J37/3007 , H01J2237/0213 , H01J2237/022 , H01J2237/0458 , H01J2237/047 , H01J2237/0492 , H01J2237/061 , H01J2237/0835 , H01J2237/1536 , H01J2237/24405 , H01J2237/24507 , H01J2237/30477 , H01J2237/31705
摘要： A method to increase low-energy beam current according to this invention is applied to an irradiation system with ion beam comprising a beam generation source, a mass analysis device, a beam transformer, a deflector for scanning, a beam parallelizing device, an acceleration/deceleration device, and an energy filtering device. The beam transformer comprises a vertically focusing DC quadrupole electromagnet QD and a longitudinally focusing DC quadrupole electromagnet QF. The beam transformer transforms a beam having a circular cross-section or an elliptical or oval cross-section to the beam has an elliptical or oval cross-section that is long in the scan direction in all the region of a beam line after deflection for scanning.
摘要翻译： 根据本发明的增加低能量束电流的方法被应用于具有离子束的照射系统，该离子束包括束发生源，质量分析装置，光束变换器，用于扫描的偏转器，光束并行化装置，加速度/ 减速装置和能量过滤装置。 光束变换器包括垂直聚焦DC四极电磁体QD和纵向聚焦DC四极电磁体QF。 光束变换器将具有圆形横截面或椭圆形或椭圆形横截面的光束变换成具有在扫描偏转之后在光束线的所有区域中沿扫描方向长的椭圆形或椭圆形横截面 。
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公开(公告)号：US20080067397A1
公开(公告)日：2008-03-20
申请号：US11806128
申请日：2007-05-30
IPC分类号： H01J1/50
CPC分类号： H01J37/3171 , H01J37/04 , H01J37/05 , H01J2237/055 , H01J2237/30483
摘要： A beam processing system is for causing a particle beam extracted from a beam generating source to pass through a mass analysis magnet device, a mass analysis slit, and a deflection scanner in the order named, thereby irradiating the particle beam onto a processing object. The mass analysis slit is installed between the mass analysis magnet device and the deflection scanner at a position where the particle beam having passed through the mass analysis magnet device converges most in a lateral direction. A first DC quadrupole electromagnet and a second DC quadrupole electromagnet are installed on an upstream side and a downstream side of the mass analysis slit, respectively,
摘要翻译： 光束处理系统用于使得从光束发生源提取的粒子束以所述顺序通过质量分析磁体装置，质量分析狭缝和偏转扫描器，从而将粒子束照射到处理对象上。 在通过质量分析用磁体装置的粒子束在横向收敛最多的位置处，将质量分析用狭缝安装在质量分析磁体装置与偏转扫描仪之间。 分别在质量分析狭缝的上游侧和下游侧安装第一直流四极电磁体和第二直流四极电磁体，
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