公开(公告)号：US20050083528A1

公开(公告)日：2005-04-21

申请号：US10387259

申请日：2003-03-12

申请人： Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

发明人： Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

IPC分类号： G01N21/27 ,  G01N21/35 ,  G01N21/55 ,  G01N21/88

CPC分类号： G01N21/276 ,  G01N21/1717 ,  G01N21/55 ,  G01N2021/3568

摘要： A method for simultaneously monitoring ion implantation dose, damage and/or dopant depth profiles in ion-implanted semiconductors includes a calibration step where the photo-modulated reflectance of a known damage profile is identified in I-Q space. In a following measurement step, the photo-modulated reflectance of a subject is empirically measured to obtain in-phase and quadrature values. The in-phase and quadrature values are then compared, in I-Q space, to the known damage profile to characterize the damage profile of the subject.

摘要翻译： 在离子注入的半导体中同时监测离子注入剂量，损伤和/或掺杂剂深度分布的方法包括校准步骤，其中在I-Q空间中识别已知损伤谱的光调制反射率。 在随后的测量步骤中，经验地测量受试者的光调制反射率以获得同相和正交值。 然后在I-Q空间中将同相和正交值与已知的损伤特征进行比较，以表征受试者的损伤特征。

公开(公告)号：US08535957B1

公开(公告)日：2013-09-17

申请号：US13077666

申请日：2011-03-31

申请人： Alex Salnik ,  Bin-Ming Benjamin Tsai ,  Lena Nicolaides

发明人： Alex Salnik ,  Bin-Ming Benjamin Tsai ,  Lena Nicolaides

IPC分类号： H01L21/66 ,  G01R31/26

CPC分类号： H01L22/10 ,  G01N21/9501 ,  G01R31/2601 ,  H01L21/265 ,  H01L22/12 ,  H01L22/20

摘要： The present invention may include a first dopant metrology system configured to measure a first plurality of values of at least one parameter of a wafer, an ion implanter configured to implant a plurality of ions into the wafer, a second dopant metrology system configured to measure a second plurality of values of at least one parameter of the wafer following ion implantation of the wafer by the implanter, wherein the first dopant metrology system and the second dopant metrology system are communicatively coupled, an annealer configured to anneal the wafer following ion implantation, and a third dopant metrology system configured to measure a third plurality of values of at least one parameter of the wafer following annealing of the wafer by the annealer, wherein the second dopant metrology system and the third dopant metrology system are communicatively coupled.

公开(公告)号：US20100134785A1

公开(公告)日：2010-06-03

申请号：US12616710

申请日：2009-11-11

申请人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

发明人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC分类号： G01N21/55 ,  G01J3/00

CPC分类号： G01N21/636 ,  G01N21/1717

摘要： A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

摘要翻译： 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US07646486B2

公开(公告)日：2010-01-12

申请号：US12022504

申请日：2008-01-30

申请人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

发明人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC分类号： G01N21/55

CPC分类号： G01N21/636 ,  G01N21/1717

摘要： A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

摘要翻译： 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US07619741B2

公开(公告)日：2009-11-17

申请号：US12185297

申请日：2008-08-04

申请人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

发明人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

IPC分类号： G01N21/00

CPC分类号： G01N21/39 ,  G01N21/1717 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2201/0612 ,  G01N2201/0691

摘要： A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.

摘要翻译： 调制反射测量系统包括三个基于单色二极管的激光器。 每个激光器可以作为探测光束或作为泵浦光源操作。 使用一系列反射镜和分束器将激光输出重定向到达物镜。 物镜将激光输出聚焦在样品上。 反射能量通过目标返回，并被分束器重定向到检测器。 锁定放大器转换检测器的输出以产生正交（Q）和同相（I）信号用于分析。 处理器使用Q和/或I信号来分析样本。 通过改变用作泵浦或探针光束源的激光器的数量，可以优化测量系统以测量不同样品类型的范围。

公开(公告)号：US20080158565A1

公开(公告)日：2008-07-03

申请号：US12022504

申请日：2008-01-30

申请人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

发明人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC分类号： G01N21/55

CPC分类号： G01N21/636 ,  G01N21/1717

摘要： A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

摘要翻译： 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US07362441B2

公开(公告)日：2008-04-22

申请号：US11520512

申请日：2006-09-13

申请人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

发明人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC分类号： G01N21/55

CPC分类号： G01N21/636 ,  G01N21/1717

摘要： A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

摘要翻译： 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US20080036998A1

公开(公告)日：2008-02-14

申请号：US11890712

申请日：2007-08-06

申请人： Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

发明人： Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

IPC分类号： G01N1/00

CPC分类号： G01N21/1717 ,  G01N21/4788 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2021/1731 ,  G01N2021/214

摘要： The present invention provides a probe beam profile—modulated optical reflectivity metrology system having a modulated pump source for exciting the sample. A separate probe beam is directed to interact with the sample in a manner so that the rays within the probe beam create a spread of angles of incidence. A detector array simultaneously measures intensities of the rays within the reflected/diffracted probe beam simultaneously at different angles of incidence. The intensity and angle of incidence information is used to analyze the sample.

摘要翻译： 本发明提供一种具有用于激发样品的调制泵浦源的探测光束分布调制光学反射率测量系统。 引导单独的探针光束以与样品相互作用的方式使得探针束内的光线产生入射角的扩展。 检测器阵列同时以不同的入射角测量反射/衍射探测光束内的光线的强度。 使用入射信息的强度和角度分析样品。

公开(公告)号：US07212288B2

公开(公告)日：2007-05-01

申请号：US10886110

申请日：2004-07-07

申请人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik

发明人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik

IPC分类号： G01N21/55

CPC分类号： G01N21/9501 ,  G01N21/1717 ,  G01N21/9505

摘要： A system for evaluating semiconductor wafers includes illumination sources for generating probe and pump beams. The pump beam is focused on the surface of a sample and a beam steering mechanism is used to modulate the point of focus in a predetermined pattern. The moving pump beam introduces thermal and plasma waves in the sample causing changes in the reflectivity of the surface of the sample. The probe beam is focused within or adjacent to the area illuminated by the pump beam. The reflected probe beam is gathered and used to measure the changes in reflectivity induced by the pump beam. By analyzing changes in reflectivity, a processor is able to deduce structure and chemical details of the sample.

摘要翻译： 用于评估半导体晶片的系统包括用于产生探针和泵浦光束的照明源。 泵浦光束聚焦在样品的表面上，并且使用光束转向机构以预定图案调制聚焦点。 移动的泵浦光束在样品中引入热和等离子体波，导致样品表面的反射率的变化。 探测光束聚焦在由泵浦光束照射的区域内或附近。 反射的探测光束被聚集并用于测量由泵浦光引起的反射率的变化。 通过分析反射率的变化，处理器能够推断样品的结构和化学细节。

公开(公告)号：US20070008541A1

公开(公告)日：2007-01-11

申请号：US11520512

申请日：2006-09-13

申请人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

发明人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC分类号： G01N21/55

CPC分类号： G01N21/636 ,  G01N21/1717

摘要： A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

摘要翻译： 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。