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    WAVEGUIDES WITH LIGHT ABSORBING FILMS AND PROCESSES FOR FORMING THE SAME
    31.
    发明申请
    WAVEGUIDES WITH LIGHT ABSORBING FILMS AND PROCESSES FOR FORMING THE SAME 有权

    公开(公告)号：US20210103147A1

    公开(公告)日：2021-04-08

    申请号：US17105241

    申请日：2020-11-25

    Applicant: Magic Leap, Inc.

    Inventor： Mauro Melli

    IPC: G02B27/01 ,  F21V8/00

    Abstract: In some embodiments, a display device includes one or more waveguides having a vapor deposited light absorbing film on edges of the waveguide to mitigate ghost images. In some embodiments, the film is formed directly on the edge of the waveguide by a vapor deposition, such as an evaporative deposition process. In some embodiments, the light absorbing films may comprise carbon, for example carbon in the form of one or more allotropes of carbon, such as fullerenes, or black silicon.

    Optical elements based on polymeric structures incorporating inorganic materials
    32.
    发明授权
    Optical elements based on polymeric structures incorporating inorganic materials 有权

    公开(公告)号：US10916060B2

    公开(公告)日：2021-02-09

    申请号：US16236140

    申请日：2018-12-28

    Applicant: Magic Leap, Inc.

    Inventor： Melanie Maputol West ,  Christophe Peroz ,  Mauro Melli

    IPC: G06T15/00 ,  G06T19/00 ,  G02B27/01 ,  G06F3/16 ,  G02B27/42 ,  G06T7/50 ,  G02B5/18 ,  B29D11/00 ,  G02B6/24

    Abstract: The present disclosure relates to display systems and, more particularly, to augmented reality display systems. In one aspect, a method of fabricating an optical element includes providing a substrate having a first refractive index and transparent in the visible spectrum. The method additionally includes forming on the substrate periodically repeating polymer structures. The method further includes exposing the substrate to a metal precursor followed by an oxidizing precursor. Exposing the substrate is performed under a pressure and at a temperature such that an inorganic material comprising the metal of the metal precursor is incorporated into the periodically repeating polymer structures, thereby forming a pattern of periodically repeating optical structures configured to diffract visible light. The optical structures have a second refractive index greater than the first refractive index.

    Diffraction gratings formed by metasurfaces having differently oriented nanobeams
    33.
    发明授权
    Diffraction gratings formed by metasurfaces having differently oriented nanobeams 有权

    公开(公告)号：US10466394B2

    公开(公告)日：2019-11-05

    申请号：US15880404

    申请日：2018-01-25

    Applicant: Magic Leap, Inc.

    Inventor： Dianmin Lin ,  Michael Anthony Klug ,  Pierre St. Hilaire ,  Mauro Melli ,  Christophe Peroz ,  Evgeni Poliakov

    IPC: G02B5/18 ,  F21V8/00 ,  G02B27/01

    Abstract: Metasurfaces provide compact optical elements in head-mounted display systems to, e.g., incouple light into or outcouple light out of a waveguide. The metasurfaces may be formed by a plurality of repeating unit cells, each unit cell comprising two sets or more of nanobeams elongated in crossing directions: one or more first nanobeams elongated in a first direction and a plurality of second nanobeams elongated in a second direction. As seen in a top-down view, the first direction may be along a y-axis, and the second direction may be along an x-axis. The unit cells may have a periodicity in the range of 10 nm to 1 μm, including 10 nm to 500 nm or 300 nm to 500 nm. Advantageously, the metasurfaces provide diffraction of light with high diffraction angles and high diffraction efficiencies over a broad range of incident angles and for incident light with circular polarization.

    PATTERNING OF HIGH REFRACTIVE INDEX GLASSES BY PLASMA ETCHING
    34.
    发明申请
    PATTERNING OF HIGH REFRACTIVE INDEX GLASSES BY PLASMA ETCHING 审中-公开

    公开(公告)号：US20180186689A1

    公开(公告)日：2018-07-05

    申请号：US15862078

    申请日：2018-01-04

    Applicant: Magic Leap, Inc.

    Inventor： Mauro Melli ,  Christophe Peroz ,  Vikramjit Singh

    IPC: C03C15/00 ,  F21V8/00 ,  G06F1/16

    CPC classification number: C03C15/00 ,  C03C3/097 ,  C03C2218/34 ,  G02B6/0026 ,  G02B6/0038 ,  G02B6/0076 ,  G02B27/225 ,  G06F1/163 ,  G06F3/011 ,  H04N5/2257

    Abstract: Plasma etching processes for forming patterns in high refractive index glass substrates, such as for use as waveguides, are provided herein. The substrates may be formed of glass having a refractive index of greater than or equal to about 1.65 and having less than about 50 wt % SiO2. The plasma etching processes may include both chemical and physical etching components. In some embodiments, the plasma etching processes can include forming a patterned mask layer on at least a portion of the high refractive index glass substrate and exposing the mask layer and high refractive index glass substrate to a plasma to remove high refractive index glass from the exposed portions of the substrate. Any remaining mask layer is subsequently removed from the high refractive index glass substrate. The removal of the glass forms a desired patterned structure, such as a diffractive grating, in the high refractive index glass substrate.

    METASURFACES FOR REDIRECTING LIGHT AND METHODS FOR FABRICATING
    37.
    发明申请
    METASURFACES FOR REDIRECTING LIGHT AND METHODS FOR FABRICATING 有权

    公开(公告)号：US20250147224A1

    公开(公告)日：2025-05-08

    申请号：US19018490

    申请日：2025-01-13

    Applicant: Magic Leap, Inc.

    Inventor： Dianmin Lin ,  Mauro Melli ,  Pierre St. Hilaire ,  Christophe Peroz ,  Evgeni Poliakov

    IPC: F21V8/00 ,  G02B5/18 ,  G02B6/00 ,  G02B6/122 ,  G02B6/293 ,  G02B27/01

    Abstract: A display system comprises a waveguide having light incoupling or light outcoupling optical elements formed of a metasurface. The metasurface is a multilevel (e.g., bi-level, tri-level, etc.) structure having a first level defined by spaced apart protrusions formed of a first optically transmissive material and a second optically transmissive material between the protrusions. The metasurface can also include a second level formed by the second optically transmissive material. The protrusions on the first level may be patterned by nanoimprinting the first optically transmissive material, and the second optically transmissive material may be deposited over and between the patterned protrusions. The widths of the protrusions and the spacing between the protrusions may be selected to diffract light, and a pitch of the protrusions may be 10-600 nm.

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