公开(公告)号：US20080074655A1

公开(公告)日：2008-03-27

申请号：US11527731

申请日：2006-09-27

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Niels Machiel Driessen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Niels Machiel Driessen

IPC分类号： G01N21/00

CPC分类号： G03F7/70916 ,  G01N21/15 ,  G03F7/70558

摘要： An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

摘要翻译： 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。

公开(公告)号：US20080001101A1

公开(公告)日：2008-01-03

申请号：US11478303

申请日：2006-06-30

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

IPC分类号： G03F7/20

CPC分类号： G03F7/70925 ,  B08B7/00

摘要： A cleaning arrangement is provided for use in an EUV lithographic apparatus, for example an EUV lithographic apparatus with a Sn source. The cleaning arrangement includes a gas source for a hydrogen containing gas and a hydrogen radical source. The hydrogen radical source is a source of (UV) radiation which induces photo dissociation of the hydrogen. Radicals may reduce Sn oxides (if present) and my form volatile hydrides of Sn deposition and/or carbon deposition. In this way the cleaning arrangement can be used to clean optical elements from Sn and/or C deposition. The EUV source may be used as hydrogen radical source. An optical filter is used to remove undesired EUV radiation and transmit desired UV radiation.

摘要翻译： 提供了用于EUV光刻设备（例如具有Sn源的EUV光刻设备）的清洁装置。 清洁装置包括用于含氢气体和氢根源的气体源。 氢自由基源是（UV）辐射源，其诱导氢的光解离。 自由基可以减少Sn氧化物（如果存在）和形成Sn沉积和/或碳沉积的挥发性氢化物。 以这种方式，清洁装置可用于从Sn和/或C沉积物清洁光学元件。 EUV源可以用作氢源。 使用滤光器去除不期望的EUV辐射并传输所需的UV辐射。

公开(公告)号：US07262423B2

公开(公告)日：2007-08-28

申请号：US11292310

申请日：2005-12-02

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Johannes Hubertus Josephina Moors ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Johannes Hubertus Josephina Moors ,  Derk Jan Wilfred Klunder

IPC分类号： G01B9/02

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/70191 ,  G03F7/7055 ,  G03F7/70908 ,  G21K1/043 ,  G21K1/062

摘要： A radiation system for generating a beam of radiation is disclosed. The radiation system includes a pulsed EUV source for generating EUV radiation, and a spectral filter mounted in front of the EUV source for selectively passing a spectral range of a beam of EUV radiation from the EUV source. The spectral filter is mounted on a movable mount configured to be moved in synchronicity with the pulsed EUV source to prevent debris traveling from the EUV source from impacting the spectral filter. Accordingly, the spectral filter is kept substantially free from contamination by the debris.

摘要翻译： 公开了一种用于产生辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的脉冲EUV源和安装在EUV源前面的光谱滤波器，用于选择性地通过来自EUV源的EUV辐射束的光谱范围。 光谱滤光器安装在可移动的安装座上，可移动的安装件被配置为与脉冲EUV源同步地移动，以防止从EUV源传播的碎屑撞击光谱滤波器。 因此，光谱滤波器基本上不受碎屑的污染。

公开(公告)号：US20070145297A1

公开(公告)日：2007-06-28

申请号：US11444535

申请日：2006-06-01

申请人： Johannes Maria Freriks ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Johannes Maria Freriks ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G03F7/20

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70925

摘要： A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa). The cleaning arrangement may further include a gas return system.

摘要翻译： 用于光刻设备模块的清洁装置可以设置在收集器中。 清洁装置包括被配置为向至少部分模块提供含氢自由基气体的氢根源，以及构造成将气体泵送通过模块的泵，使得通过至少部分的至少一部分提供含氢自由基气体的流速 该模块至少为1米/秒。 清洁装置还可以包括配置成将含氢自由基气体的流动调制到模块的至少一部分的气闸，与模块连通的至少1m 3的缓冲体积， 以及配置成在0.001mbar（0.1Pa）和1mbar（100Pa）之间的缓冲体积中提供气体压力的泵。 清洁装置还可以包括气体返回系统。

公开(公告)号：US07196343B2

公开(公告)日：2007-03-27

申请号：US11025851

申请日：2004-12-30

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Derk Jan Wilfred Klunder

IPC分类号： G03F7/20 ,  G02B27/14

CPC分类号： G03F7/70958 ,  G02B1/113 ,  G02B5/0891 ,  G03F7/70575 ,  G21K1/06 ,  G21K2201/067

摘要： An optical element including an anti-reflection (AR) coating is configured to reflect Extreme-Ultra-Violet (EUV) radiation only.

摘要翻译： 包括抗反射（AR）涂层的光学元件被配置为仅反射极紫外（EUV）辐射。

公开(公告)号：US08071963B2

公开(公告)日：2011-12-06

申请号：US11645809

申请日：2006-12-27

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Kurt Gielissen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Kurt Gielissen

IPC分类号： G21G5/00

CPC分类号： G03F7/70916 ,  G03F7/70858 ,  H05G2/003 ,  H05G2/005

摘要： A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.

摘要翻译： 用于捕集来自碎屑产生辐射源的污染物质的碎片缓解系统。 该系统包括构造和布置成围绕轴线旋转的污染屏障，以及构造和布置成提供用于使来自辐射源的带电碎片偏转的磁场的磁体结构。 磁体结构被构造和布置成通过污染屏障提供磁场。 当通过污染屏障时，磁场沿着通常与污染屏障旋转轴线重合的平面定向。

公开(公告)号：US07736820B2

公开(公告)日：2010-06-15

申请号：US11418465

申请日：2006-05-05

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Koen Van Ingen Schenau ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Koen Van Ingen Schenau ,  Derk Jan Wilfred Klunder

IPC分类号： G03F1/00

CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G03F7/70575 ,  G21K1/062

摘要： An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a patterned absorber layer is provided. The spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. The patterned absorber layer may also itself function as an anti-reflection (AR) coating. The AR effect of this absorber layer is a function of the aperture sizes in the pattern. The spectral purity of a mask may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

摘要翻译： EUV掩模在多层反射镜之上包括光谱纯度增强层，用于EUV光刻设备中。 在光谱纯度增强层的顶部，提供了图案化的吸收层。 光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可以存在中间层或第二光谱纯度增强层和中间层。 图案化的吸收层本身也可以用作抗反射（AR）涂层。 该吸收层的AR效应是图案中孔径尺寸的函数。 可以增强掩模的光谱纯度，使得DUV辐射比EUV辐射相对更强。

公开(公告)号：US07541603B2

公开(公告)日：2009-06-02

申请号：US11527731

申请日：2006-09-27

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Niels Machiel Driessen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Niels Machiel Driessen

IPC分类号： G21K5/00

CPC分类号： G03F7/70916 ,  G01N21/15 ,  G03F7/70558

摘要： An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

摘要翻译： 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。

公开(公告)号：US20080316595A1

公开(公告)日：2008-12-25

申请号：US12230384

申请日：2008-08-28

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

IPC分类号： G02B5/28 ,  G02B5/26 ,  G02B5/22

CPC分类号： G02B1/10 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/283 ,  G03F1/24 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer that includes a first material m1 and has a first layer thickness d1, an intermediate layer that includes a second material m2 and has a second layer thickness d2. The intermediate layer is arranged on the multi-layer stack top layer. The first material is selected from SiN, Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF. The second material includes a material different from the first material, and d1+d2 has a thickness between 1.5 and 40 nm.

摘要翻译： 多层反射镜包括多层堆叠。 多层堆叠包括多层交叠层，多层叠层顶层和布置在多层堆叠上的光谱过滤器顶层。 光谱过滤器顶层包括第一光谱纯度增强层，其包括第一材料m1并且具有第一层厚度d1，包括第二材料m2并具有第二层厚度d2的中间层。 中间层布置在多层堆叠顶层上。 第一种材料选自SiN，Si3N4，SiO2，ZnS，Te，金刚石，CsI，Se，SiC，无定形碳，MgF2，CaF2，TiO2，Ge，PbF2，ZrO2，BaTiO3，LiF或NaF。 第二材料包括与第一材料不同的材料，并且d1 + d2具有在1.5和40nm之间的厚度。

公开(公告)号：US07468521B2

公开(公告)日：2008-12-23

申请号：US11319190

申请日：2005-12-28

申请人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Frank Jeroen Pieter Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Frank Jeroen Pieter Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G21G5/00 ,  G01J3/10 ,  G03B27/52

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

摘要翻译： 光刻设备包括用于提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。 污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。 设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收 的元件，使得元件经历的热负荷降低。