摘要:
A carrier box 21 for a semiconductor substrate, including an opening and closing mechanism for taking the semiconductor in or out of the box 21. The box 21 is provided with a gas cleaning device A-2 which uses a photo-electron or the photo-catalyst actuated by light irradiation for cleaning an inside of the box, or a gas cleaning unit including the gas cleaning device and a rechargeable battery for supplying the gas cleaning device with electricity and integrated into the gas cleaning unit, and thereby providing a practically efficient function to remove particles or gaseous harmful components.
摘要:
A method and an apparatus for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.
摘要:
A photoelectron emitting member having a multiplex structure comprises a matrix and a protective film. The matrix being selected from the group consisting of elements, inorganic compounds, alloys, mixtures thereof and composites thereof which emit photoelectrons upon exposure to uv rays and other forms of radiation, the protective film comprising at least one material selected from the group consisting of metals, metallic compounds, plastics, polycyclic aromatic hydrocarbon, derivatives thereof or a mixture thereof which is film-forming and not thicker than 0.2 .mu.m. The member can be used in a consistent way over a prolonged period as well as being capable of effective emission of photoelectrons. Fine particles electrically charged with photoelectrons which are emitted upon applying uv rays and/or other forms of radiation to the photoelectron emitting member, can be used in various applications such as (a) separation and classification of fine particles, as well as modifying their surfaces and controlling an electrically charged amount thereof; (b) the measurement of the concentration and size of fine particles in gases such as air and waste gases by using electrically charged fine particles; and (c) trapping and removal of charged fine particles to produce clean gases.
摘要:
By using parallax compensation which performs prediction by using parallax between video images, the video images are encoded as a single video image. Reference parallax for a target image to be encoded is set, wherein the reference parallax is estimated using a reference image; area division in an image frame is set; parallax displacement for each divided area is set, wherein the parallax displacement is the difference between the reference parallax and parallax for the parallax compensation; data of the area division is encoded; and data for indicating the parallax displacement is encoded. During decoding, reference parallax for a target image to be decoded is set, wherein it is estimated using a reference image; data for indicating area division, which is included in encoded data, is decoded; and data of parallax displacement, which is included in the encoded data, is decoded for each area indicated by the area division data.
摘要:
Detected is a secondary electron generated by irradiating a focused ion beam while performing etching a sample section and the around through scan-irradiating the focused ion beam. From a changing amount of the detected secondary electron signal an end-point detecting mechanism detects an end point to thereby terminate the etching, so that a center position of a defect or a contact hole is effectively detected even with an FIB apparatus not having a SEM observation function.
摘要:
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing means and adsorption and/or absorption means so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.
摘要:
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as an in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.
摘要:
An airplane fuel supply system includes a wing fuel tank that is formed from a wing tip fuel tank having a wing tip fuel pump; a central fuel tank having a central fuel pump; and a wing root fuel tank having a wing root fuel pump. Fuel movement from the wing tip fuel tank to the central fuel tank is allowed by a flapper valve, and fuel movement from the central fuel tank to the wing root fuel tank is allowed by another flapper valve. When the fuel delivery volume of the wing tip fuel pump is represented by Vt, the fuel delivery volume of the central fuel pump is represented by Vc, the fuel delivery volume of the wing root fuel pump is represented by Vr, and the fuel delivery volume from a collector tank to the engine is represented by Ve, the fuel delivery volumes Vt, Vc, Vr, and Ve are set so as to satisfy the relationships Vr>Ve, Vt+Vc>Ve, and Vc
摘要:
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.
摘要:
A method for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.