公开(公告)号：US06391118B1

公开(公告)日：2002-05-21

申请号：US09845177

申请日：2001-05-01

申请人： Toshiaki Fujii ,  Kikuo Okuyama ,  Manabu Shimada

发明人： Toshiaki Fujii ,  Kikuo Okuyama ,  Manabu Shimada

IPC分类号： B08B312

摘要： A method and an apparatus for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.

公开(公告)号：US06240931B1

公开(公告)日：2001-06-05

申请号：US08963685

申请日：1997-11-04

申请人： Toshiaki Fujii ,  Kikuo Okuyama ,  Manabu Shimada

发明人： Toshiaki Fujii ,  Kikuo Okuyama ,  Manabu Shimada

IPC分类号： B08B312

CPC分类号： H01L21/02046 ,  B08B6/00 ,  H01L21/67028 ,  Y10S134/902

摘要： A method for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.

摘要翻译： 一种用于从洁净室中的诸如半导体晶片的物品的表面去除颗粒的方法。 颗粒被带有电荷。 随后，当施加电场以从表面驱走带电粒子时，将超声波或气流施加到制品的表面上，从而从表面除去尺寸小于1微米的颗粒。 收集构件的存在允许去除所得到的浮动颗粒。

公开(公告)号：US06205676B1

公开(公告)日：2001-03-27

申请号：US09131914

申请日：1998-08-10

申请人： Toshiaki Fujii ,  Kikuo Okuyama ,  Manabu Shimada

发明人： Toshiaki Fujii ,  Kikuo Okuyama ,  Manabu Shimada

IPC分类号： F26B334

CPC分类号： H01L21/02046 ,  B08B6/00 ,  H01L21/67028 ,  Y10S134/902

摘要： An apparatus for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.

摘要翻译： 一种用于从洁净室中的诸如半导体晶片的物品的表面去除颗粒的设备。 颗粒被带有电荷。 随后，当施加电场以从表面驱走带电粒子时，将超声波或气流施加到制品的表面上，从而从表面除去尺寸小于1微米的颗粒。 收集构件的存在允许去除所得到的浮动颗粒。

公开(公告)号：US07347006B2

公开(公告)日：2008-03-25

申请号：US11065359

申请日：2005-02-25

申请人： Tsuyoshi Moriya ,  Hiroshi Nagaike ,  Hiroyuki Nakayama ,  Kikuo Okuyama ,  Manabu Shimada

发明人： Tsuyoshi Moriya ,  Hiroshi Nagaike ,  Hiroyuki Nakayama ,  Kikuo Okuyama ,  Manabu Shimada

IPC分类号： F26B5/04

CPC分类号： H01L21/67248 ,  H01J37/32935 ,  H01J2237/0225

摘要： A processing apparatus includes a first detection unit for detecting a temperature of an inner wall of the vacuum vessel, a second detection unit for detecting a temperature of the processing unit, and a first control unit for controlling a temperature of the gas. The first control unit controls the temperature of the gas based on a temperature gradient between the temperatures of the inner wall and the gas or a temperature gradient between the temperatures of the processing unit and the gas. A method for removing particles from a processing apparatus includes a first detection step for detecting a temperature of an inner wall of the vacuum vessel, a second detection step for detecting a temperature of the processing unit, a first control step for controlling a temperature of the gas, and a gas introduction step for introducing the gas into the inner space of the vacuum vessel.

摘要翻译： 处理装置包括用于检测真空容器的内壁的温度的第一检测单元，用于检测处理单元的温度的第二检测单元和用于控制气体的温度的第一控制单元。 第一控制单元基于内壁和气体的温度之间的温度梯度或处理单元和气体的温度之间的温度梯度来控制气体的温度。 从处理装置中除去颗粒的方法包括：第一检测步骤，用于检测真空容器的内壁的温度;第二检测步骤，用于检测处理单元的温度;第一控制步骤， 气体和气体引入步骤，用于将气体引入真空容器的内部空间。

公开(公告)号：US07748138B2

公开(公告)日：2010-07-06

申请号：US11128256

申请日：2005-05-13

申请人： Tsuyoshi Moriya ,  Hiroyuki Nakayama ,  Kikuo Okuyama ,  Manabu Shimada

发明人： Tsuyoshi Moriya ,  Hiroyuki Nakayama ,  Kikuo Okuyama ,  Manabu Shimada

IPC分类号： F26B3/00 ,  B65H1/00 ,  C23F1/00 ,  C23C16/00

CPC分类号： H01L21/67248 ,  H01L21/67103 ,  H01L21/67742

摘要： A substrate transfer mechanism for transferring a substrate includes a mounting table on which the substrate is mounted; an arm member connected to the mounting table and moving it. The substrate transfer mechanism further includes a temperature control unit for controlling temperature of the mounting table, wherein the temperature control unit forms a temperature gradient in the mounting table. The temperature control unit includes a detector for detecting temperature in an environment or a chamber in which the substrate transfer mechanism is installed a heater for heating the mounting table and a controller for controlling an operation of the heater based on the temperature in the environment or the chamber detected by the detector.

摘要翻译： 用于转印衬底的衬底传送机构包括：安装台，其上安装有衬底; 连接到安装台并将其移动的臂构件。 基板传送机构还包括用于控制安装台的温度的温度控制单元，其中温度控制单元在安装台中形成温度梯度。 温度控制单元包括用于检测环境或室内温度的检测器，其中基板传送机构安装有用于加热安装台的加热器和用于基于环境中的温度控制加热器的操作的控制器 检测器检测到室。

公开(公告)号：US20050252455A1

公开(公告)日：2005-11-17

申请号：US11128256

申请日：2005-05-13

申请人： Tsuyoshi Moriya ,  Hiroyuki Nakayama ,  Kikuo Okuyama ,  Manabu Shimada

发明人： Tsuyoshi Moriya ,  Hiroyuki Nakayama ,  Kikuo Okuyama ,  Manabu Shimada

IPC分类号： C23C16/00 ,  H01L21/00

CPC分类号： H01L21/67248 ,  H01L21/67103 ,  H01L21/67742

摘要： A substrate transfer mechanism for transferring a substrate includes a mounting table on which the substrate is mounted; an arm member connected to the mounting table and moving it. The substrate transfer mechanism further includes a temperature control unit for controlling temperature of the mounting table, wherein the temperature control unit forms a temperature gradient in the mounting table. The temperature control unit includes a detector for detecting temperature in an environment or a chamber in which the substrate transfer mechanism is installed a heater for heating the mounting table and a controller for controlling an operation of the heater based on the temperature in the environment or the chamber detected by the detector.

摘要翻译： 用于转印衬底的衬底传送机构包括：安装台，其上安装有衬底; 连接到安装台并将其移动的臂构件。 基板传送机构还包括用于控制安装台的温度的温度控制单元，其中温度控制单元在安装台中形成温度梯度。 温度控制单元包括用于检测环境或室内温度的检测器，其中基板传送机构安装有用于加热安装台的加热器和用于基于环境中的温度控制加热器的操作的控制器 检测器检测到室。

公开(公告)号：US20050180543A1

公开(公告)日：2005-08-18

申请号：US10928320

申请日：2004-08-30

申请人： Kikuo Okuyama ,  Manabu Shimada ,  Mansoo Choi ,  Bangwoo Han

发明人： Kikuo Okuyama ,  Manabu Shimada ,  Mansoo Choi ,  Bangwoo Han

IPC分类号： B03C7/02 ,  G01N15/06 ,  G01N15/10 ,  G01N23/00 ,  G21K5/08 ,  G01N15/00

CPC分类号： G01N15/065 ,  G01N15/1012 ,  G21K5/08

摘要： Distributed non-charged particles having a desired particle diameter are introduced into a chamber. A photoionizer in which a soft X-ray power is adjustable is attached to the chamber, to charge the particles within the chamber. The power level of the soft X-ray is adjusted by a controller so as to produce singly charged particles. The charged particles are then introduced into a differential mobility analyzer for classification, thus producing monodisperse standard particles having particle diameter of 0.1 to 1.0 μm.

摘要翻译： 将具有所需粒径的分布的无电荷粒子引入室中。 将软X射线功率可调的光离子化器附着到腔室，以对腔室内的颗粒充电。 通过控制器调整软X射线的功率水平，以产生单一带电粒子。 然后将带电粒子引入差示迁移率分析仪中进行分类，从而产生粒径为0.1至1.0μm的单分散标准颗粒。

公开(公告)号：US07522703B2

公开(公告)日：2009-04-21

申请号：US10521173

申请日：2003-07-16

申请人： Kikuo Okuyama ,  Manabu Shimada ,  Yosio Ohtani ,  Norikazu Namiki ,  Toshihiko Hino

发明人： Kikuo Okuyama ,  Manabu Shimada ,  Yosio Ohtani ,  Norikazu Namiki ,  Toshihiko Hino

IPC分类号： G21K5/10

CPC分类号： G21K5/10 ,  B01J19/125 ,  B01J2219/0879

摘要： An X-ray emitting section 22 for emitting soft X-ray is arranged facing a chamber 21. An inlet duct 23 and a outlet duct 24 are arranged on both sides of the chamber 21. An irradiating region is ionized by the soft X-ray. It is therefore possible to achieve a charging device of aerosol particles that is safe and easy to handle.

摘要翻译： 用于发射软X射线的X射线发射部分22面向腔室21布置。入口管道23和出口管道24布置在腔室21的两侧。照射区域被软X射线 。 因此，可以实现安全且易于处理的气溶胶粒子的充电装置。

公开(公告)号：US20060108537A1

公开(公告)日：2006-05-25

申请号：US10521173

申请日：2003-07-16

申请人： Kikuo Okuyama ,  Manabu Shimada ,  Yosio Ohtani ,  Norikazu Namiki ,  Toshihiko Hino

发明人： Kikuo Okuyama ,  Manabu Shimada ,  Yosio Ohtani ,  Norikazu Namiki ,  Toshihiko Hino

IPC分类号： H01J27/24

CPC分类号： G21K5/10 ,  B01J19/125 ,  B01J2219/0879

摘要： An X-ray emitting section 22 for emitting soft X-ray is arranged facing a chamber 21. An inlet duct 23 and a outlet duct 24 are arranged on both sides of the chamber 21. An irradiating region is ionized by the soft X-ray. It is therefore possible to achieve a charging device of aerosol particles that is safe and easy to handle.

摘要翻译： 用于发射软X射线的X射线发射部分22面向腔室21布置。入口管道23和出口管道24布置在腔室21的两侧。照射区域被软X射线 。 因此，可以实现安全且易于处理的气溶胶粒子的充电装置。

公开(公告)号：US20050189071A1

公开(公告)日：2005-09-01

申请号：US11065359

申请日：2005-02-25

申请人： Tsuyoshi Moriya ,  Hiroshi Nagaike ,  Hiroyuki Nakayama ,  Kikuo Okuyama ,  Manabu Shimada

发明人： Tsuyoshi Moriya ,  Hiroshi Nagaike ,  Hiroyuki Nakayama ,  Kikuo Okuyama ,  Manabu Shimada

IPC分类号： C23C16/44 ,  C23C16/52 ,  H01J37/32 ,  H01L21/00 ,  H01L21/3065 ,  C23F1/00

CPC分类号： H01L21/67248 ,  H01J37/32935 ,  H01J2237/0225

摘要： A processing apparatus includes a first detection unit for detecting a temperature of an inner wall of the vacuum vessel, a second detection unit for detecting a temperature of the processing unit, and a first control unit for controlling a temperature of the gas. The first control unit controls the temperature of the gas based on a temperature gradient between the temperatures of the inner wall and the gas or a temperature gradient between the temperatures of the processing unit and the gas. A method for removing particles from a processing apparatus includes a first detection step for detecting a temperature of an inner wall of the vacuum vessel, a second detection step for detecting a temperature of the processing unit, a first control step for controlling a temperature of the gas, and a gas introduction step for introducing the gas into the inner space of the vacuum vessel.

摘要翻译： 处理装置包括用于检测真空容器的内壁的温度的第一检测单元，用于检测处理单元的温度的第二检测单元和用于控制气体的温度的第一控制单元。 第一控制单元基于内壁和气体的温度之间的温度梯度或处理单元和气体的温度之间的温度梯度来控制气体的温度。 从处理装置中除去颗粒的方法包括：第一检测步骤，用于检测真空容器的内壁的温度;第二检测步骤，用于检测处理单元的温度，第一控制步骤， 气体和气体引入步骤，用于将气体引入真空容器的内部空间。