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    Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus
    3.
    发明授权
    Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus 有权
    样品高度调节方法，样品观察方法，样品处理方法和带电粒子束装置

    公开(公告)号：US07423266B2

    公开(公告)日：2008-09-09

    申请号：US11360948

    申请日：2006-02-23

    申请人： Junichi Tashiro ,  Yutaka Ikku ,  Makoto Sato

    发明人： Junichi Tashiro ,  Yutaka Ikku ,  Makoto Sato

    IPC分类号： G21K7/00 ,  G01N23/00

    CPC分类号： G01N23/2251 ,  H01J37/20 ,  H01J37/28 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/20235 ,  H01J2237/216 ,  H01J2237/221 ,  H01J2237/31745

    摘要： In a sample height regulating method, an area including the observation point on the sample is scan-irradiated with a first charged particle beam to obtain a first secondary electron image including the observation point. An area including the observation point on the sample is then scan-irradiated with a second charged particle beam to obtain a second secondary electron image including the observation point. Thereafter, based on magnifications of the first secondary electron image and the second secondary electron image and a distance between the observation point in the first secondary electron image and the observation point in the second secondary electron image, a height of the sample required for focusing the first charged particle beam and the second charged particle beam on the observation point is calculated. A sample stage supporting the sample is then displaced so as to position the sample at the calculated sample height.

    摘要翻译： 在样品高度调节方法中，利用第一带电粒子束对包含样品上的观察点的区域进行扫描照射，以获得包括该观察点的第一二次电子图像。 然后利用第二带电粒子束对样品上的观察点进行扫描照射，得到包含该观察点的第二二次电子像。 此后，基于第一二次电子图像和第二二次电子图像的放大率和第一二次电子图像中的观察点与第二二次电子图像中的观察点之间的距离，聚焦所需的样本的高度 计算观测点上的第一带电粒子束和第二带电粒子束。 然后移动支撑样品的样品台，以将样品定位在计算的样品高度。

    Method and apparatus for specifying working position on a sample and method of working the sample
    5.
    发明授权
    Method and apparatus for specifying working position on a sample and method of working the sample 有权
    用于指定样品上的工作位置的方法和装置以及加工样品的方法

    公开(公告)号：US07595488B2

    公开(公告)日：2009-09-29

    申请号：US11313326

    申请日：2005-12-21

    申请人： Junichi Tashiro ,  Yutaka Ikku ,  Makoto Sato

    发明人： Junichi Tashiro ,  Yutaka Ikku ,  Makoto Sato

    IPC分类号： H01J37/26 ,  H01J3/14 ,  G21K7/00 ,  G01N23/00

    CPC分类号： H01J37/222 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/24592 ,  H01J2237/2487 ,  Y10S707/99943 ,  Y10S707/99945

    摘要： Techniques for specifying an observing or working position of a sample are provided. Digitized data of a sample is obtained and stored in a 1st storage device. A 1st display area displays an image of a portion containing a desired observing or working position of the digitized data stored in the 1st storage device. A 1st position that is indicated by a pointing device on the 1st display area is stored in a 2nd storage device. The sample is moved to an observing or working position for observation, and an observation image of the sample is stored in the 3rd storage device. A 2nd display area displays the observation image of the sample stored in the 3rd storage device. A position indicated on the 2nd display area and corresponding to the 1st position stored in the 2nd storage device is stored in a 4th storage device. A conversion function for converting a coordinate system of the 1st display area and the 2nd display area is calculated using the 1st position stored in the 2nd storage means and the position stored in the 4th storage device. A position indicated in one of the 1st and 2nd display areas and corresponding to another position indicated in the other of the 1st and 2nd display areas is calculated in accordance with the calculated conversion function.

    摘要翻译： 提供了用于指定样品的观察或工作位置的技术。 获取样品的数字化数据并存储在第一存储装置中。 第一显示区域显示包含存储在第一存储装置中的数字化数据的期望观察或工作位置的部分的图像。 由第一显示区域上的指示装置指示的第一位置存储在第二存储装置中。 将样品移动到用于观察的观察或工作位置，并将样品的观察图像存储在第3存储装置中。 第二显示区域显示存储在第三存储装置中的样本的观察图像。 存储在第2存储装置中的与第2显示区域对应的与第2存储装置中存储的第1位置对应的位置。 使用存储在第二存储装置中的第一位置和存储在第四存储装置中的位置来计算用于转换第一显示区域和第二显示区域的坐标系的转换功能。 根据计算的转换函数计算在第一和第二显示区域之一中指示的位置，并对应于在第一和第二显示区域中的另一个中指示的另一位置。

    Defect recognizing method, defect observing method, and charged particle beam apparatus
    6.
    发明申请
    Defect recognizing method, defect observing method, and charged particle beam apparatus 审中-公开
    缺陷识别方法，缺陷观察方法和带电粒子束装置

    公开(公告)号：US20090134327A1

    公开(公告)日：2009-05-28

    申请号：US12290619

    申请日：2008-10-31

    申请人： Yutaka Ikku ,  Junichi Tashiro ,  Makoto Sato

    发明人： Yutaka Ikku ,  Junichi Tashiro ,  Makoto Sato

    IPC分类号： G01N23/00 ,  H01J3/14

    CPC分类号： H01J37/3056 ,  H01J37/244 ,  H01J37/304 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2817 ,  H01J2237/304 ,  H01J2237/31713 ,  H01J2237/3174 ,  H01J2237/31749

    摘要： There are provided a detecting step of detecting secondary charged particles generated from an observation area of a sample when an electron beam or a focused ion beam is emitted onto the observation area under a certain irradiation condition; an image forming step of forming a plurality of observation images acquired by dividing the observation area and having an equal periodic pattern, from the secondary charged particles detected in the detecting step; and a defect recognizing step of recognizing a defect in the observation area from information on a difference acquired by comparing the plurality of observation images formed in the image forming step. Additionally, the detecting step, the image forming step, and the defect recognizing step are performed even when the electron beam or the focused ion beam is emitted onto the observation area under an irradiation condition different from the certain irradiation condition.

    摘要翻译： 提供了当在一定的照射条件下将电子束或聚焦离子束发射到观察区域时，检测从样本的观察区域产生的二次带电粒子的检测步骤; 图像形成步骤，从在检测步骤中检测到的二次带电粒子形成通过划分观察区域并具有相同的周期性图案而获得的多个观察图像; 以及从通过比较在图像形成步骤中形成的多个观察图像而获得的差异的信息，识别观察区域中的缺陷的缺陷识别步骤。 此外，即使当电子束或聚焦离子束在与特定照射条件不同的照射条件下发射到观察区域上时，也执行检测步骤，图像形成步骤和缺陷识别步骤。

    Charged particle beam apparatus
    8.
    发明申请
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US20070045560A1

    公开(公告)日：2007-03-01

    申请号：US11509520

    申请日：2006-08-24

    申请人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

    发明人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

    IPC分类号： H01J37/20 ,  G01N1/28

    CPC分类号： H01J37/304 ,  G01N1/32 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.

    摘要翻译： 为了包括聚焦离子束装置，通过加工试样和观察切片试样来制造切片样品，观察切片试样的扫描电子显微镜，气相离子束照射装置，通过将气体离子束照射到 切片试样的表面，切片试样固定并具有至少一个以上的旋转轴的试样台，识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制 意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台，以便允许气体离子束相对于正面或反向的入射角 切片样品为期望值。

    Charged particle beam apparatus
    9.
    发明授权
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US07442942B2

    公开(公告)日：2008-10-28

    申请号：US11509520

    申请日：2006-08-24

    申请人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

    发明人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

    IPC分类号： H01J37/20

    CPC分类号： H01J37/304 ,  G01N1/32 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.

    摘要翻译： 为了包括聚焦离子束装置，通过加工试样和观察切片试样来制造切片样品，观察切片试样的扫描电子显微镜，气相离子束照射装置，通过将气体离子束照射到 切片试样的表面，切片试样固定并具有至少一个以上的旋转轴的试样台，识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制 意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台，以便允许气体离子束相对于正面或反向的入射角 切片样品为期望值。

    X-ray fluorescence analyzer and X-ray fluorescence analysis method
    10.
    发明授权
    X-ray fluorescence analyzer and X-ray fluorescence analysis method 有权
    X射线荧光分析仪和X射线荧光分析方法

    公开(公告)号：US08611493B2

    公开(公告)日：2013-12-17

    申请号：US13174058

    申请日：2011-06-30

    申请人： Kiyoshi Hasegawa ,  Yutaka Ikku ,  Hideki Takiguchi

    发明人： Kiyoshi Hasegawa ,  Yutaka Ikku ,  Hideki Takiguchi

    IPC分类号： G01N23/223

    CPC分类号： G01N23/223 ,  G01N2223/076

    摘要： The X-ray fluorescence analyzer (100) includes: an enclosure (10); a door (20) for putting the sample into and out of the enclosure; a height measurement mechanism (7) capable of measuring a height at the irradiation point; a moving mechanism control unit (9) for adjusting a distance between the sample and the radiation source as well as the X-ray detector based on the measured height at the irradiation point; a laser unit (7) for irradiating the irradiation point with a visible light laser beam; a laser start control unit (9) for irradiating the visible light laser beam by the laser unit (7) when the door is open state; and a height measurement mechanism start control unit (9) for starting the height measurement mechanism to measure the height at the irradiation point when the door is opened.

    摘要翻译： X射线荧光分析仪（100）包括：外壳（10）; 用于将样品放入和离开外壳的门（20）; 能够测量照射点的高度的高度测量机构（7） 移动机构控制单元，用于根据所述照射点处的测量高度来调整所述样本和所述辐射源之间的距离以及所述X射线检测器; 用于用可见光激光束照射所述照射点的激光单元（7）; 激光启动控制单元（9），用于当所述门处于打开状态时，通过所述激光单元（7）照射所述可见光激光束; 以及高度测量机构启动控制单元（9），用于启动高度测量机构以测量门打开时的照射点处的高度。