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52 条记录 (耗时 0.073 秒)

    Lithographic apparatus and in-line cleaning apparatus
    32.
    发明授权
    Lithographic apparatus and in-line cleaning apparatus 有权
    平版印刷设备和在线清洁设备

    公开(公告)号：US09036128B2

    公开(公告)日：2015-05-19

    申请号：US13549037

    申请日：2012-07-13

    申请人： Roelof Frederik De Graaf ,  Hans Jansen ,  Bauke Jansen ,  Hubertus Leonardus Franciscus Heusschen

    发明人： Roelof Frederik De Graaf ,  Hans Jansen ,  Bauke Jansen ,  Hubertus Leonardus Franciscus Heusschen

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70925 ,  G03F7/70341 ,  G03F7/7085

    摘要： A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.

    摘要翻译： 光刻系统包括浸没型光刻设备，其包括构造和布置成支撑衬底的支撑件，构造和布置成将图案化的辐射束投影到衬底的目标部分上的投影系统，配置为 用浸没液体至少部分地填充所述投影系统与所述基板和支撑体中的至少一个之间的空间，布置成将所述浸没液体提供给所述液体限制结构的液体供应系统，以及布置成提供清洁 液体流到与浸没液接触的光刻设备的表面。 该系统包括将洗涤液直接提供给液体限制结构并通过液体净化系统将浸液液体间接提供给液体限制结构的开关。

    PROJECTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    34.
    发明申请
    PROJECTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    投影系统，平面设备和设备制造方法

    公开(公告)号：US20120236275A1

    公开(公告)日：2012-09-20

    申请号：US13418936

    申请日：2012-03-13

    申请人： Frank Johannes Jacobus VAN BOXTEL ,  Roelof Frederik De Graaf ,  Antonius Johannus Van Der Net ,  Johannes Antonius Maria Martina Van Uijtregt ,  Leonarda Hendrika Van Den Heuvel

    发明人： Frank Johannes Jacobus VAN BOXTEL ,  Roelof Frederik De Graaf ,  Antonius Johannus Van Der Net ,  Johannes Antonius Maria Martina Van Uijtregt ,  Leonarda Hendrika Van Den Heuvel

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70858

    摘要： Various configurations of a projection system, of a lithographic apparatus, and of a device manufacturing method are disclosed. According to a disclosed configuration, the projection system is configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes an optical element having a first face and a second face. The first face is configured to be exposed to an external gaseous environment connected to the outside of the lithographic apparatus. The second face is configured to be exposed to an internal gaseous environment, the internal gaseous environment being substantially isolated from the external gaseous environment. The projection system further includes a pressure compensation system configured to adjust the pressure in the internal gaseous environment in response to a change in pressure in the external gaseous environment or a pressure differential between the internal gaseous environment or the external gaseous environment.

    摘要翻译： 公开了投影系统，光刻设备以及器件制造方法的各种配置。 根据所公开的配置，投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统包括具有第一面和第二面的光学元件。 第一面被配置为暴露于连接到光刻设备外部的外部气体环境。 第二面构造成暴露于内部气体环境中，内部气体环境基本上与外部气体环境隔离。 投影系统还包括压力补偿系统，其配置为响应于外部气体环境中的压力变化或内部气体环境或外部气体环境之间的压力差来调节内部气体环境中的压力。