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    PROJECTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    1.
    发明申请
    PROJECTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    投影系统，平面设备和设备制造方法

    公开(公告)号：US20120236275A1

    公开(公告)日：2012-09-20

    申请号：US13418936

    申请日：2012-03-13

    申请人： Frank Johannes Jacobus VAN BOXTEL ,  Roelof Frederik De Graaf ,  Antonius Johannus Van Der Net ,  Johannes Antonius Maria Martina Van Uijtregt ,  Leonarda Hendrika Van Den Heuvel

    发明人： Frank Johannes Jacobus VAN BOXTEL ,  Roelof Frederik De Graaf ,  Antonius Johannus Van Der Net ,  Johannes Antonius Maria Martina Van Uijtregt ,  Leonarda Hendrika Van Den Heuvel

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70858

    摘要： Various configurations of a projection system, of a lithographic apparatus, and of a device manufacturing method are disclosed. According to a disclosed configuration, the projection system is configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes an optical element having a first face and a second face. The first face is configured to be exposed to an external gaseous environment connected to the outside of the lithographic apparatus. The second face is configured to be exposed to an internal gaseous environment, the internal gaseous environment being substantially isolated from the external gaseous environment. The projection system further includes a pressure compensation system configured to adjust the pressure in the internal gaseous environment in response to a change in pressure in the external gaseous environment or a pressure differential between the internal gaseous environment or the external gaseous environment.

    摘要翻译： 公开了投影系统，光刻设备以及器件制造方法的各种配置。 根据所公开的配置，投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统包括具有第一面和第二面的光学元件。 第一面被配置为暴露于连接到光刻设备外部的外部气体环境。 第二面构造成暴露于内部气体环境中，内部气体环境基本上与外部气体环境隔离。 投影系统还包括压力补偿系统，其配置为响应于外部气体环境中的压力变化或内部气体环境或外部气体环境之间的压力差来调节内部气体环境中的压力。