公开(公告)号：US20100149514A1

公开(公告)日：2010-06-17

申请号：US12714829

申请日：2010-03-01

申请人： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

发明人： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

IPC分类号： G03B27/58

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。

公开(公告)号：US20110310367A1

公开(公告)日：2011-12-22

申请号：US13223952

申请日：2011-09-01

申请人： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

发明人： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20100157277A1

公开(公告)日：2010-06-24

申请号：US12718112

申请日：2010-03-05

申请人： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Frits Van Der Meulen

发明人： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Frits Van Der Meulen

IPC分类号： G03B27/60 ,  G03B27/32

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between the liquid confinement structure and the substrate is extracted.

摘要翻译： 构造成在投影系统和基板之间的空间中容纳液体的液体限制结构在其下表面中具有凹槽，该凹部对于相对低的压力源和相对高的压力源是开放的，并且液体和/或气体 从液体限制结构和基板之间提取。

公开(公告)号：US20110025994A1

公开(公告)日：2011-02-03

申请号：US12901939

申请日：2010-10-11

申请人： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Sergei SHULEPOV

发明人： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Sergei SHULEPOV

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  H01L21/67034

摘要： A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.

摘要翻译： 通过确保在待干燥的表面上的液膜中形成压力梯度，配置成干燥浸没式光刻设备中的表面的气刀被优化以去除液体。

公开(公告)号：US20110273678A1

公开(公告)日：2011-11-10

申请号：US13187055

申请日：2011-07-20

申请人： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus Donders ,  Joost Jeroen Ottens ,  Edwin Cornelis Kadijk ,  Sergei Shulepov

发明人： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus Donders ,  Joost Jeroen Ottens ,  Edwin Cornelis Kadijk ,  Sergei Shulepov

IPC分类号： G03B27/52

CPC分类号： G03B27/42 ,  G03F7/70341 ,  G03F7/70716

摘要： Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

公开(公告)号：US20110025995A1

公开(公告)日：2011-02-03

申请号：US12904617

申请日：2010-10-14

申请人： Martinus Hendrikus Antonius LEENDERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas Rudolf KEMPER

发明人： Martinus Hendrikus Antonius LEENDERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas Rudolf KEMPER

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A capillary passage is formed between a substrate holder and an edge structure. Along the capillary passage are arranged a plurality of electrodes which, when charged, become liquidphilic. The electrodes may be used to split droplets of liquid and pump the liquid along the capillary passage.

摘要翻译： 在基板保持器和边缘结构之间形成毛细通道。 沿着毛细通道布置有多个电极，当被带电时，它们变成液晶。 电极可用于分离液体液滴并沿着毛细通道泵送液体。

公开(公告)号：US20110242512A1

公开(公告)日：2011-10-06

申请号：US13149121

申请日：2011-05-31

申请人： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Joost Jeroen OTTENS ,  Edwin Cornelis KADIJK ,  Sergei SHULEPOV

发明人： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Joost Jeroen OTTENS ,  Edwin Cornelis KADIJK ,  Sergei SHULEPOV

IPC分类号： G03B27/52

CPC分类号： G03B27/42 ,  G03F7/70341 ,  G03F7/70716

摘要： Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

摘要翻译： 描述了光刻投影设备中的漏极的实施例，其具有例如在排水管中不存在液体的时段期间减少气体进入排水管的特征。 在一个示例中，提供无源液体移除机构，使得排水管中的气体的压力等于环境气体压力，并且在另一个实施例中，提供了一个挡板，以在不需要液体移除的时间内关闭室。

公开(公告)号：US20090296065A1

公开(公告)日：2009-12-03

申请号：US12472099

申请日：2009-05-26

申请人： Christian Gerardus Norbertus Hendricus Marie CLOIN ,  Nicolaas TEN KATE ,  Nicolaas Rudolf KEMPER ,  Marco Koert STAVENGA ,  Erik Henricus Egidius Catharina EUMMELEN ,  Michel RIEPEN ,  Olga Vladimirovna ELISSEEVA ,  Tijmen Wilfred Mathijs GUNTHER ,  Michaël Christiaan VAN DER WEKKEN

发明人： Christian Gerardus Norbertus Hendricus Marie CLOIN ,  Nicolaas TEN KATE ,  Nicolaas Rudolf KEMPER ,  Marco Koert STAVENGA ,  Erik Henricus Egidius Catharina EUMMELEN ,  Michel RIEPEN ,  Olga Vladimirovna ELISSEEVA ,  Tijmen Wilfred Mathijs GUNTHER ,  Michaël Christiaan VAN DER WEKKEN

IPC分类号： G03B27/72 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

摘要： A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

摘要翻译： 公开了一种光刻投影装置，其包括工作台，活门构件，流体处理结构和流体抽出系统。 流体处理结构可以被配置为在投影系统和（i）基板之间供应和限制液体，或者（ii）工作台，或（iii）活门构件的表面，或者（iv）选自（ i） - （iii）。 活门构件的表面可以与桌子的表面邻接并且共面。 活门构件和桌子的表面可以间隔开间隙。 流体提取系统可以构造成从间隙去除液体。

公开(公告)号：US20110007286A1

公开(公告)日：2011-01-13

申请号：US12814325

申请日：2010-06-11

申请人： Daniel Jozef Maria DIRECKS ,  Nicolaas Rudolf KEMPER ,  Danny Maria Hubertus PHILIPS ,  Michel RIEPEN ,  Clemens Johannes Gerardus VAN DEN DUNGEN ,  Maikel Adrianus Cornelis SCHEPERS

发明人： Daniel Jozef Maria DIRECKS ,  Nicolaas Rudolf KEMPER ,  Danny Maria Hubertus PHILIPS ,  Michel RIEPEN ,  Clemens Johannes Gerardus VAN DEN DUNGEN ,  Maikel Adrianus Cornelis SCHEPERS

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a substrate table configured to support a substrate, a projection system configured to direct a patterned beam of radiation onto a substrate, a liquid handling system configured to supply and confine immersion liquid to a space defined between a projection system and a substrate, or substrate table, or both, and a controller to control speed of motion of the substrate table relative to the liquid handling system during movement of the substrate table through a path under the liquid handling system based on a distance between turns in the path.

摘要翻译： 公开了一种浸没式光刻设备，其包括：被配置为支撑衬底的衬底台;被配置为将图案化的辐射束引导到衬底上的投影系统;液体处理系统，被配置为将浸没液体限定在突出部 系统和衬底或衬底台或两者，以及控制器，用于在衬底台通过液体处理系统下面的路径基于匝之间的距离来控制衬底台相对于液体处理系统的运动速度 在路上

公开(公告)号：US20100149501A1

公开(公告)日：2010-06-17

申请号：US12634242

申请日：2009-12-09

申请人： Nicolaas Rudolf KEMPER ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

发明人： Nicolaas Rudolf KEMPER ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

IPC分类号： G03B27/52 ,  B01D69/14 ,  B01D61/36

CPC分类号： G03F7/70341 ,  F01N1/023 ,  G03F7/709

摘要： An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

摘要翻译： 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。