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78 条记录 (耗时 0.039 秒)

    Method of forming patterns
    39.
    发明授权
    Method of forming patterns 失效
    形成图案的方法

    公开(公告)号：US06168897A

    公开(公告)日：2001-01-02

    申请号：US09277744

    申请日：1999-03-29

    申请人： Toru Ushirogouchi ,  Makoto Nakase ,  Takuya Naito ,  Koji Asakawa

    发明人： Toru Ushirogouchi ,  Makoto Nakase ,  Takuya Naito ,  Koji Asakawa

    IPC分类号： G03F700

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  G03F7/09 ,  G03F7/091 ,  G03F7/2004 ,  G03F7/2006

    摘要： Disclosed is a method of forming a pattern on a substrate, comprising a step of forming a light-sensitive layer containing an aromatic compound on a substrate, a step of patternwise exposing the light-sensitive layer with a light having a wavelength range shorter than the maximum wavelength in the third absorption band from the long-wave side in the absorption spectrum of the aromatic compound and longer than the maximum wavelength in the fourth absorption band from the same, thereby to cause a photochemical reaction in the light-sensitive layer, and a step of developing the exposed light-sensitive layer, optionally after heat-treating the layer, so as to selectively remove the exposed area of the layer or leave the area as it is. The method gives a pattern having a high resolving power and an excellent dry-etching resistance.

    摘要翻译： 公开了一种在基板上形成图案的方法，包括在基板上形成含有芳族化合物的感光层的步骤，使用波长范围短于 在芳族化合物的吸收光谱中的长波侧的第三吸收带中的最大波长比第四吸收带中的最大波长长，从而在感光层中引起光化学反应， 任选地在热处理该层之后，显影出曝光的感光层的步骤，以选择性地去除该层的曝光区域，或者直接离开该区域。 该方法给出了具有高分辨能力和优异的耐干蚀刻性的图案。

    Photosensitive material
    40.
    发明授权
    Photosensitive material 失效
    感光材料

    公开(公告)号：US6060207A

    公开(公告)日：2000-05-09

    申请号：US499974

    申请日：1995-07-10

    申请人： Naomi Shida ,  Toru Ushirogouchi ,  Takuya Naito ,  Makoto Nakase

    发明人： Naomi Shida ,  Toru Ushirogouchi ,  Takuya Naito ,  Makoto Nakase

    IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/008

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122

    摘要： A photosensitive material which is very low in absorption of a light source of short wavelength and excellent in dry etch resistance. This photosensitive material comprises a compound having a terpenoid skeleton. Preferably, the compound having a terpenoid skeleton is a compound having a monovalent menthyl group or menthyl derivative group which can be represented by the general formula (1). ##STR1## wherein R is a hydrogen atom or a monovalent hydrocarbon group, R.sup.1 may be the same with or different from each other and individually represents a hydrogen atom, a halogen atom, a hydrocarbon group, a hydroxyl group, an alkoxyl group, an amino group, an alkoxy group, an amino group, an imide group, an amide group, or a sulfonyl group, a carboxyl group, a carbonyl group, or a sulfonamide group, and a pair of neighboring R.sup.1 may be connected together to form a closed ring.

    摘要翻译： 一种感光材料，其对短波长的光源的吸收非常低，并且具有优异的耐干蚀刻性。 该感光材料包含具有萜类骨架的化合物。 优选具有萜类骨架的化合物是具有可以由通式（1）表示的一价薄荷基或薄荷基衍生物基团的化合物。 其中R为氢原子或一价烃基，R 1可以相同或不同，分别表示氢原子，卤素原子，烃基，羟基，烷氧基，氨基， 烷氧基，氨基，酰亚胺基，酰胺基或磺酰基，羧基，羰基或磺酰胺基，并且一对相邻的R 1可以连接在一起形成封闭环。