MEMORY DEVICE INCLUDING PASS TRANSISTOR CIRCUIT

    公开(公告)号:US20240105268A1

    公开(公告)日:2024-03-28

    申请号:US18529897

    申请日:2023-12-05

    CPC classification number: G11C16/24 G11C5/06 G11C16/26 H10B41/27 H10B43/27

    Abstract: A memory device includes: a memory cell array including a first memory block and a second memory block adjacently disposed in a first direction, driving signal lines respectively corresponding to vertically stacked word lines, and a pass transistor circuit including an odd number of pass transistor groups and connected between the driving signal lines and the memory cell array. One of the odd number of pass transistor groups includes a first pass transistor connected between a first word line of the first memory block and a first driving signal line among the driving signal lines, and a second pass transistor connected between a first word line of the second memory block and the first driving signal line adjacently disposed to the first pass transistor in a second direction.

    Memory device including pass transistor circuit

    公开(公告)号:US11462275B2

    公开(公告)日:2022-10-04

    申请号:US17227501

    申请日:2021-04-12

    Abstract: A memory device includes; a memory cell array including a first memory block and a second memory block adjacently disposed in a first direction, driving signal lines respectively corresponding to vertically stacked word lines, and a pass transistor circuit including an odd number of pass transistor groups and connected between the driving signal lines and the memory cell array. One of the odd number of pass transistor groups includes a first pass transistor connected between a first word line of the first memory block and a first driving signal line among the driving signal lines, and a second pass transistor connected between a first word line of the second memory block and the first driving signal line adjacently disposed to the first pass transistor in a second direction.

    NON-VOLATILE MEMORY DEVICE
    36.
    发明申请

    公开(公告)号:US20220277792A1

    公开(公告)日:2022-09-01

    申请号:US17746393

    申请日:2022-05-17

    Abstract: A memory device including: a memory cell array disposed in a first semiconductor layer, the memory cell array including a plurality of wordlines extended in a first direction and stacked in a second direction substantially perpendicular to the first direction; and a plurality of pass transistors disposed in the first semiconductor layer, wherein a first pass transistor of the plurality of pass transistors is disposed between a first signal line of a plurality of signal lines and a first wordline of the plurality of wordlines, and wherein the plurality of signal lines are arranged at the same level as a common source line.

    Semiconductor memory device
    37.
    发明授权

    公开(公告)号:US10763278B2

    公开(公告)日:2020-09-01

    申请号:US16243837

    申请日:2019-01-09

    Abstract: A semiconductor memory device includes a substrate having a cell array region and a contact region, a stack structure including a plurality of gate electrodes on the cell array region and the contact region, a plurality of cell vertical channel structures extending through the stack structure on the cell array region, and a contact structure disposed beside of the stack structure on a top surface of the substrate and disposed along a line extending from the cell array region toward the contact region. The height of the contact structure on the cell array region is different from the height of the contact structure on the contact region.

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