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公开(公告)号:US12139569B2
公开(公告)日:2024-11-12
申请号:US17675055
申请日:2022-02-18
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Nazila Dadvand , Benjamin Stassen Cook , Archana Venugopal , Luigi Colombo
IPC: C08F292/00 , C08F8/42 , C08J5/00 , C08K3/04 , C08K3/08 , C08K7/00 , C08L25/06 , C08L33/12 , G03F1/78
Abstract: A method of forming a composite material includes photo-initiating a polymerization of a monomer in a pattern of interconnected units to form a polymer microlattice. Unpolymerized monomer is removed from the polymer microlattice. The polymer microlattice is coated with a metal. The metal-coated polymer microlattice is dispersed in a polymer matrix.
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公开(公告)号:US11854933B2
公开(公告)日:2023-12-26
申请号:US17138541
申请日:2020-12-30
Applicant: Texas Instruments Incorporated
Inventor: Benjamin Stassen Cook , Nazila Dadvand , Archana Venugopal , Daniel Lee Revier
IPC: H01L23/373 , H01L23/532 , H01L21/683 , H01L21/3205 , H01L21/78
CPC classification number: H01L23/373 , H01L21/32051 , H01L21/6835 , H01L21/78 , H01L23/53209
Abstract: In described examples, a semiconductor wafer with a thermally conductive surface layer comprises a bulk semiconductor layer having a first surface and a second surface, circuitry on the first surface, a metallic layer attached to the first surface or the second surface, and a graphene layer attached to the metallic layer. The first surface opposes the second surface. The metallic layer comprises a transition metal.
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公开(公告)号:US11296237B2
公开(公告)日:2022-04-05
申请号:US16501731
申请日:2019-05-28
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Archana Venugopal , Luigi Colombo , Arup Polley
IPC: H01L29/786 , H01L29/20 , H01L29/267 , H01L29/49 , H01L29/45 , H01L29/66 , H01L21/02 , H01L21/8258 , H01L27/092 , H01L29/16
Abstract: A microelectronic device includes a gated graphene component over a semiconductor material. The gated graphene component includes a graphitic layer having at least one layer of graphene. The graphitic layer has a channel region, a first connection and a second connection make electrical connections to the graphitic layer adjacent to the channel region. The graphitic layer is isolated from the semiconductor material. A backgate region having a first conductivity type is disposed in the semiconductor material under the channel region. A first contact field region and a second contact field region are disposed in the semiconductor material under the first connection and the second connection, respectively. At least one of the first contact field region and the second contact field region has a second, opposite, conductivity type. A method of forming the gated graphene component in the microelectronic device with a transistor is disclosed.
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公开(公告)号:US20210272804A1
公开(公告)日:2021-09-02
申请号:US17315524
申请日:2021-05-10
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Archana Venugopal , Benjamin Stassen Cook , Luigi Colombo , Robert Reid Doering
IPC: H01L21/02 , H01L23/522 , H01L23/528 , H01L23/373 , H01L21/56 , H01L23/433 , H01L23/367
Abstract: A packaged electronic device includes an integrated circuit and an electrically non-conductive encapsulation material in contact with the integrated circuit. A thermal conduit extends from an exterior of the package, through the encapsulation material, to the integrated circuit. The thermal conduit has a thermal conductivity higher than the encapsulation material contacting the thermal conduit. The thermal conduit includes a cohered nanoparticle film. The cohered nanoparticle film is formed by a method which includes an additive process.
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公开(公告)号:US11063120B2
公开(公告)日:2021-07-13
申请号:US16232123
申请日:2018-12-26
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Luigi Colombo , Archana Venugopal , Benjamin Stassen Cook , Nazila Dadvand
IPC: H01L29/16 , H01L21/768 , C01B32/194 , H01L23/532 , H01L27/06 , H01L29/06 , C23C16/26 , H01L21/02 , C01B32/184 , C25D11/00 , C23C16/02 , B05D1/00 , H01L23/00
Abstract: A structure includes a metal layer and a plurality of interconnected unit cells forming a lattice contained at least partly within the metal layer, including at least a first unit cell formed of first interconnected graphene tubes, and a second unit cell formed of second interconnected graphene tubes, wherein the metal layer protrudes through holes within the lattice.
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公开(公告)号:US20200381517A1
公开(公告)日:2020-12-03
申请号:US16995563
申请日:2020-08-17
Applicant: Texas Instruments Incorporated
Inventor: Benjamin Stassen Cook , Luigi Colombo , Nazila Dadvand , Archana Venugopal
IPC: H01L29/15 , H01L29/16 , H01L29/808 , H01L29/423
Abstract: A switchable array includes: a microstructure of interconnected units formed of graphene tubes with open spaces in the microstructure bounded by the graphene tubes; at least one JFET gate in at least one of the graphene tubes; and a control line having an end connected to the at least one JFET gate. The control line extends to a periphery of the microstructure.
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公开(公告)号:US10790228B2
公开(公告)日:2020-09-29
申请号:US16372455
申请日:2019-04-02
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Archana Venugopal , Benjamin Stassen Cook , Luigi Colombo , Robert Reid Doering
IPC: H01L23/528 , H01L23/522 , H01L23/532 , H01L23/31 , H01L21/288 , H01L23/367 , H01L23/373 , H01L21/768 , H01L21/3105 , H01L21/324 , H01L21/285 , H01L21/3205 , H01L23/48
Abstract: An integrated circuit has a substrate and an interconnect region disposed on the substrate. The interconnect region includes a plurality of interconnect levels. Each interconnect level includes interconnects in dielectric material. The integrated circuit includes a graphitic via in the interconnect region. The graphitic via vertically connects a first interconnect in a first interconnect level to a second interconnect in a second, higher, interconnect level. The graphitic via includes a cohered nanoparticle film of nanoparticles in which adjacent nanoparticles cohere to each other, and a layer of graphitic material disposed on the cohered nanoparticle film. The nanoparticles include one or more metals suitable for catalysis of the graphitic material. The cohered nanoparticle film is formed by a method which includes an additive process. The graphitic via is electrically coupled to an active component of the integrated circuit.
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公开(公告)号:US10748999B2
公开(公告)日:2020-08-18
申请号:US16229827
申请日:2018-12-21
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Benjamin Stassen Cook , Luigi Colombo , Nazila Dadvand , Archana Venugopal
IPC: H01L29/15 , H01L29/16 , H01L29/423 , H01L29/808 , H01L29/66
Abstract: A switchable array micro-lattice comprises a plurality of interconnected units wherein the units are formed of graphene tubes. JFET gates are provided in selected members of the micro-lattice. Gate connectors are routed from an external surface of an integrated circuit (IC) through openings in the micro-lattice to permit control of the JFET gates.
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公开(公告)号:US10741473B2
公开(公告)日:2020-08-11
申请号:US16654900
申请日:2019-10-16
Applicant: Texas Instruments Incorporated
Inventor: Dhishan Kande , Archana Venugopal
IPC: H01L49/02 , H01L23/42 , H01L21/768 , H01L23/522 , H01L23/485
Abstract: An integrated circuit has a substrate including semiconductor material and a resistor in an interconnect region, above a first level of interconnect lines. The integrated circuit further includes an electrically isolated thermal conduit having one or more interconnect lines in every interconnect level lower than the resistor. The interconnect lines of the thermal conduit are directly connected through one or more vertical interconnects, including contacts, and possibly vias, to a gate structure located on a dielectric material over the semiconductor material of the substrate. The thermal conduit is electrically isolated from the resistor, from all active components in the integrated circuit, and from the semiconductor material of the substrate.
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公开(公告)号:US20200051893A1
公开(公告)日:2020-02-13
申请号:US16654900
申请日:2019-10-16
Applicant: Texas Instruments Incorporated
Inventor: Dhishan Kande , Archana Venugopal
IPC: H01L23/42 , H01L49/02 , H01L21/768 , H01L23/522 , H01L23/485
Abstract: An integrated circuit has a substrate including semiconductor material and a resistor in an interconnect region, above a first level of interconnect lines. The integrated circuit further includes an electrically isolated thermal conduit having one or more interconnect lines in every interconnect level lower than the resistor. The interconnect lines of the thermal conduit are directly connected through one or more vertical interconnects, including contacts, and possibly vias, to a gate structure located on a dielectric material over the semiconductor material of the substrate. The thermal conduit is electrically isolated from the resistor, from all active components in the integrated circuit, and from the semiconductor material of the substrate.
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