公开(公告)号：US20100143239A1

公开(公告)日：2010-06-10

申请号：US12596395

申请日：2007-04-17

申请人： Yukio Minami ,  Keiji Hirao ,  Masaharu Taguchi ,  Toshiro Nariai ,  Koji Kawada ,  Akihiro Morimoto ,  Nobukazu Ikeda

发明人： Yukio Minami ,  Keiji Hirao ,  Masaharu Taguchi ,  Toshiro Nariai ,  Koji Kawada ,  Akihiro Morimoto ,  Nobukazu Ikeda

IPC分类号： C01B5/00

CPC分类号： C01B5/00 ,  Y10T137/0396

摘要： The method for parallel operation of moisture generating reactors according to the present invention operates so that an orifice, provided with an orifice hole having a predetermined opening diameter, is disposed on a mixed-gas inlet side of each of a plurality of moisture generating reactors connected in parallel with each other, and mixed gas G consisting of hydrogen and oxygen is supplied from a mixer to each of the moisture generating reactors through each orifice, and the flows of moisture generated by the moisture generating reactors are combined, and the resulting combined moisture is supplied to an apparatus that uses high-purity water. Thus, a need to increase the amount of high-purity water supply is met by allowing a plurality of moisture generating reactors to perform a parallel water generating operation by branching off a mixed gas consisting of H2 and O2 by using a simple orifice construction.

摘要翻译： 根据本发明的水分发生反应器的并联操作方法操作，使得设置有具有预定开口直径的孔眼的孔口设置在连接的多个水分发生反应器中的每一个的混合气体入口侧 并且由氢气和氧气组成的混合气体G通过每个孔口从混合器供给到每个水分发生反应器，并且由湿度发生反应器产生的水分流合并，并将所得的组合湿气 供应给使用高纯度水的设备。 因此，通过使用多个水分产生反应器通过使用简单的孔结构分支由H 2和O 2组成的混合气体来进行平行的水生成操作来满足增加高纯度供水量的需要。

公开(公告)号：US06274098B1

公开(公告)日：2001-08-14

申请号：US09225575

申请日：1999-01-05

申请人： Yoshikazu Tanabe ,  Yukio Minami ,  Koji Kawada ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Keiji Hirao

发明人： Yoshikazu Tanabe ,  Yukio Minami ,  Koji Kawada ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Keiji Hirao

IPC分类号： B01J800

CPC分类号： B01D53/8671

摘要： An apparatus for the treatment of exhaust gases containing hydrogen which permits always stable treatment with certainty of the exhaust gases from a semiconductor manufacturing line or the like irrespective of violent fluctuations in the flow rate of the exhaust gases, without having adverse effects on the operation of the semiconductor manufacturing line. The apparatus comprises: an ejector-type vacuum generator having a suction port connected to the discharge source of exhaust gases containing hydrogen and having a drive fluid supply port connected to an oxygen supply source, a hydrogen-oxygen reactor provided with a catalyst and connected to a drive fluid discharge port of the vacuum generator, and a drain reservoir connected to an outlet of the reactor for storing water discharged therefrom.

摘要翻译： 一种用于处理含有氢的废气的装置，其允许始终稳定地处理来自半导体生产线等的废气的确定性，而不管排气的流量的剧烈波动，而不会对操作造成不利影响 半导体生产线。 该装置包括：喷射式真空发生器，其具有连接到含有氢气的废气排放源的吸入口，并且具有连接到氧供应源的驱动流体供给口，设置有催化剂的氢氧反应器， 真空发生器的驱动流体排出口，以及连接到反应器的出口的排水储存器，用于储存从其排出的水。

公开(公告)号：US07815872B2

公开(公告)日：2010-10-19

申请号：US11570667

申请日：2005-07-04

申请人： Toshirou Nariai ,  Kouji Kawada ,  Keiji Hirao ,  Yukio Minami ,  Akihiro Morimoto ,  Nobukazu Ikeda

发明人： Toshirou Nariai ,  Kouji Kawada ,  Keiji Hirao ,  Yukio Minami ,  Akihiro Morimoto ,  Nobukazu Ikeda

IPC分类号： B01J8/02 ,  C01B5/00

CPC分类号： B01J12/007 ,  B01J2219/00078 ,  B01J2219/00087 ,  B01J2219/00096 ,  B01J2219/00135 ,  C01B5/00 ,  F28D2021/0029 ,  F28F3/02 ,  H01L21/67017

摘要： A reactor for generating moisture, with which hydrogen and oxygen fed into the reactor contact with a platinum coating catalyst layer to activate reactivity so that hydrogen and oxygen react under conditions of non-combustion, wherein the reactor includes a cooler comprising a heat dissipation body substrate in which a heater insertion hole is made in the center to fix to the outer surface of the reactor structural component on the outlet side and a cooler on the outlet side made up of a plural number of heat dissipation bodies installed vertically in parallel on the part excluding the area where the afore-mentioned heater insertion hole of the heat dissipation body substrate exists, and a part of the heater to heat the reactor is inserted in the heater insertion hole so as to fix to the outer surface of the reactor structural component on the outlet side.

摘要翻译： 一种用于产生水分的反应器，通过该反应器将进入反应器的氢气和氧气与铂涂层催化剂层接触以激活反应性，使氢气和氧气在非燃烧条件下反应，其中反应器包括一个包含散热体基体 其中在中心处制造加热器插入孔以固定到出口侧的反应堆结构部件的外表面和出口侧的冷却器，该多个散热体垂直并排安装在部件上 不包括存在散热体基板的上述加热器插入孔的区域，并且将加热器的加热器的一部分插入加热器插入孔中，以便将反应器结构部件的外表面固定在 出口侧。

公开(公告)号：US20080241022A1

公开(公告)日：2008-10-02

申请号：US11570667

申请日：2005-07-04

申请人： Toshirou Nariai ,  Kouji Kawada ,  Keiji Hirao ,  Yukio Minami ,  Akihiro Morimoto ,  Nobukazu Ikeda

发明人： Toshirou Nariai ,  Kouji Kawada ,  Keiji Hirao ,  Yukio Minami ,  Akihiro Morimoto ,  Nobukazu Ikeda

IPC分类号： B01J12/00

CPC分类号： B01J12/007 ,  B01J2219/00078 ,  B01J2219/00087 ,  B01J2219/00096 ,  B01J2219/00135 ,  C01B5/00 ,  F28D2021/0029 ,  F28F3/02 ,  H01L21/67017

摘要： A reactor for generating moisture, with which hydrogen and oxygen fed into the reactor contact with a platinum coating catalyst layer to activate reactivity so that hydrogen and oxygen react under conditions of non-combustion, wherein the reactor includes a cooler comprising a heat dissipation body substrate in which a heater insertion hole is made in the center to fix to the outer surface of the reactor structural component on the outlet side and a cooler on the outlet side made up of a plural number of heat dissipation bodies installed vertically in parallel on the part excluding the area where the afore-mentioned heater insertion hole of the heat dissipation body substrate exists, and a part of the heater to heat the reactor is inserted in the heater insertion hole so as to fix to the outer surface of the reactor structural component on the outlet side.

摘要翻译： 一种用于产生水分的反应器，通过该反应器将进入反应器的氢气和氧气与铂涂层催化剂层接触以激活反应性，使氢气和氧气在非燃烧条件下反应，其中反应器包括一个包含散热体基体 其中在中心处制造加热器插入孔以固定到出口侧的反应堆结构部件的外表面和出口侧的冷却器，该多个散热体垂直并排安装在部件上 不包括存在散热体基板的上述加热器插入孔的区域，并且将加热器的加热器的一部分插入加热器插入孔中，以便将反应器结构部件的外表面固定在 出口侧。

公开(公告)号：US06334962B1

公开(公告)日：2002-01-01

申请号：US09207763

申请日：1998-12-09

申请人： Yukio Minami ,  Koji Kawada ,  Yoshikazu Tanabe ,  Nobukazu Ikeda ,  Akihiro Morimoto

发明人： Yukio Minami ,  Koji Kawada ,  Yoshikazu Tanabe ,  Nobukazu Ikeda ,  Akihiro Morimoto

IPC分类号： C01B500

CPC分类号： F22B1/003 ,  C01B5/00

摘要： A process of supplying moisture at low flow rates which permits high precision control of the flow of moisture to a semiconductor manufacturing line from an apparatus for the generation of moisture, characterized in that the flow of hydrogen to a moisture-generating reactor is controlled by means of a flow controller in such a way that an amount of hydrogen as fed is gradually increased from the start and reaches a specific set level such that when a specific time has passed, a predetermined rate of moisture begins to be produced and supplied to the semiconductor manufacturing line. The moisture is generated in the apparatus for generation of moisture in which hydrogen and oxygen are (a) fed into a reactor provided with a coat of platinum on the wall in the interior space, (b) enhanced in reactivity by the platinum catalytic action, and (c) caused to instantaneously react with each other at a temperature lower than the ignition point to produce moisture without undergoing combustion at a high temperature.

摘要翻译： 以低流量供应水分的方法，其允许从用于产生水分的装置对半导体生产线的水分流的高精度控制，其特征在于，通过装置控制氢气流向产生水分的反应器 的流量控制器，使得所供给的氢气的量从开始逐渐增加并达到特定设定水平，使得当经过特定时间时，开始产生预定的水分率并将其供应到半导体 生产线。 在用于产生水分的装置中产生水分，其中（a）在内部空间的壁上被供给到设置有铂层的反应器的反应器中，（b）通过铂催化作用增强反应性， 和（c）在低于点火点的温度下彼此瞬间反应以产生湿气，而不会在高温下经历燃烧。

公开(公告)号：US5791369A

公开(公告)日：1998-08-11

申请号：US812330

申请日：1997-03-05

申请人： Koji Nishino ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Yukio Minami ,  Koji Kawada ,  Ryosuke Dohi ,  Hiroyuki Fukuda

发明人： Koji Nishino ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Yukio Minami ,  Koji Kawada ,  Ryosuke Dohi ,  Hiroyuki Fukuda

IPC分类号： F16K17/22 ,  F16K31/02 ,  G05D7/06 ,  G05D16/20 ,  H01L21/3065 ,  E03B11/00

CPC分类号： G05D7/0635 ,  Y10T137/5109 ,  Y10T137/7737 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/777 ,  Y10T137/87917

摘要： A pressure type flow rate control apparatus (1) for controlling flow rate of a fluid maintains an upstream side pressure P1 of an orifice at more than about twice a downstream side pressure P2. In addition to an orifice-forming member (5) the apparatus includes a control valve (2) provided at the upstream side of the orifice, a pressure detector (3) provided between the control valve and the orifice, and an operation control device (6) for calculating a flow rate Qc from the detected pressure P1 of the pressure detector as Qc=KP1 (K being a constant) and issuing a difference as a control signal Qy between a flow rate command signal Qs and the calculated flow rate Qc to a drive unit of the control valve. The orifice upstream side pressure P1 is adjusted by opening and closing the control valve, thereby controlling the orifice downstream side flow rate.

摘要翻译： 用于控制流体流量的压力型流量控制装置（1）将孔口的上游侧压力P1保持在下游侧压力P2的大约两倍。 除了孔口形成构件（5）之外，装置还包括设置在孔口上游侧的控制阀（2），设置在控制阀和孔之间的压力检测器（3）和操作控制装置 6），用于从Qc = KP1（K为常数）的压力检测器的检测压力P1计算流量Qc，并将差作为流量指令信号Qs与计算出的流量Qc之间的控制信号Qy发出， 控制阀的驱动单元。 通过打开和关闭控制阀来调节孔口上游侧压力P1，从而控制孔口下游侧流速。

公开(公告)号：US5669408A

公开(公告)日：1997-09-23

申请号：US661181

申请日：1996-06-10

申请人： Koji Nishino ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Yukio Minami ,  Koji Kawada ,  Ryosuke Dohi ,  Hiroyuki Fukuda

发明人： Koji Nishino ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Yukio Minami ,  Koji Kawada ,  Ryosuke Dohi ,  Hiroyuki Fukuda

IPC分类号： F16K17/22 ,  F16K31/02 ,  G05D7/06 ,  G05D16/20 ,  H01L21/3065 ,  F16K31/12

CPC分类号： G05D7/0635 ,  Y10T137/5109 ,  Y10T137/7737 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/777 ,  Y10T137/87917

摘要： A pressure type flow rate control apparatus (1) for controlling flow rate of a fluid maintains an upstream side pressure P1 of an orifice at more than about twice a downstream side pressure P2. In addition to an orifice-forming member (5) the apparatus includes a control valve (2) provided at the upstream side of the orifice, a pressure detector (3) provided between the control valve and the orifice, and an operation control device (6) for calculating a flow rate Qc from the detected pressure P1 of the pressure detector as Qc=KP1 (K being a constant) and issuing a difference as a control signal Qy between a flow rate command signal Qs and the calculated flow rate Qc to a drive unit of the control valve. The orifice upstream side pressure P1 is adjusted by opening and closing the control valve, thereby controlling the orifice downstream side flow rate.

摘要翻译： 用于控制流体流量的压力型流量控制装置（1）将孔口的上游侧压力P1保持在下游侧压力P2的大约两倍。 除了孔口形成构件（5）之外，装置还包括设置在孔口上游侧的控制阀（2），设置在控制阀和孔之间的压力检测器（3）和操作控制装置 6），用于从Qc = KP1（K为常数）的压力检测器的检测压力P1计算流量Qc，并将差作为流量指令信号Qs与计算出的流量Qc之间的控制信号Qy发出， 控制阀的驱动单元。 通过打开和关闭控制阀来调节孔口上游侧压力P1，从而控制孔口下游侧流速。

公开(公告)号：US5950675A

公开(公告)日：1999-09-14

申请号：US800763

申请日：1997-02-13

申请人： Yukio Minami ,  Nobukazu Ikeda ,  Manohar L. Shrestha ,  Satoshi Kagatsume

发明人： Yukio Minami ,  Nobukazu Ikeda ,  Manohar L. Shrestha ,  Satoshi Kagatsume

IPC分类号： B01J4/00 ,  C23C16/44 ,  C23C16/455 ,  F17D1/04 ,  G05D11/13 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  F17D1/02

CPC分类号： G05D11/132 ,  F17D1/04 ,  Y10T137/87684

摘要： An apparatus for mixing and feeding plural gases flowing at different mass flow rates and having different molecular weights includes a plurality of gas feed lines connected to a mixing region having an outlet for feeding a mixture of the gases to a semiconductor production apparatus. The gas feed line carrying the lowest-flow-rate gas is connected to the mixing region at a location farther from the outlet than where any other feed line is connected to the mixing region. Feed lines carrying gases other than the lowest-flow-rate gas are connected to the mixing region according to (1) the relative mass flow rates of the gases carried by the lines (2) the relative molecular weights of the gases carried by the lines or (3) the product of the respective gas flow rates and molecular weights of the gases. At least the line carrying the lowest-flow-rate gas is provided with an apparatus for increasing the velocity of the gas flowing therein prior to entry of the gas into the mixing region.

摘要翻译： 用于混合和供给以不同质量流量流动并且具有不同分子量的多种气体的装置包括连接到具有用于将气体混合物供给到半导体生产装置的出口的混合区域的多个气体供给管线。 承载最低流量气体的气体供给管线在距离出口更远的位置处与混合区域连接，其中任何其它进料管线连接到混合区域。 携带除最低流量气体之外的气体的进料管线根据（1）线路（2）携带的气体的相对质量流量与管线携带的气体的相对分子量连接到混合区域 或（3）气体的相应气体流速和分子量的乘积。 至少带有最低流量气体的管线设置有用于在气体进入混合区域之前增加其中流动的气体的速度的装置。

公开(公告)号：US5488967A

公开(公告)日：1996-02-06

申请号：US327419

申请日：1994-10-21

申请人： Yukio Minami ,  Nobukazu Ikeda

发明人： Yukio Minami ,  Nobukazu Ikeda

IPC分类号： F17D1/02 ,  B01J4/00 ,  C23C16/44 ,  C23C16/455 ,  G05D16/00 ,  H01L21/205 ,  F16K11/12

CPC分类号： C23C16/45561 ,  B01J4/008 ,  C23C16/4412 ,  C23C16/455 ,  Y10T137/0318 ,  Y10T137/0396 ,  Y10T137/86083 ,  Y10T137/87249 ,  Y10T137/87499

摘要： A vacuum deposition chamber alternately receives a reactive gas and an inert gas during a process in which a thin film is formed on a wafer in the chamber. The inert gas flows through a first pressure regulator, a first feed line and a first changeover valve into the chamber. The reactive gas flows through a second pressure regulator, a second feed line and a second changeover valve into the chamber. A vent line is connected to a vacuum pump and a pressure regulating valve which vents to the atmosphere to thereby control the vacuum pressure in the vent line. A first shunt valve is connected between the vent line and the first feed line and a second shunt valve is connected between the vent line and the second feed line. When the first changeover valve is opened to permit flow of reactive gas into the chamber, the second shunt valve is opened to evacuate the second feed line and when the second changeover valve is opened to permit flow of inert gas into the chamber, the first shunt valve is opened to evacuate the first feed line. By alternately evacuating the feed lines, pressure fluctuations which usually occur in the chamber at the time of changeover from one gas to the other, are suppressed.

摘要翻译： 真空沉积室在室中的晶片上形成薄膜的过程中交替地接收反应性气体和惰性气体。 惰性气体通过第一压力调节器，第一供给管线和第一转换阀流入腔室。 反应性气体通过第二压力调节器，第二进料管线和第二转换阀流入室中。 排气管线连接到真空泵和通向大气的压力调节阀，从而控制排气管线中的真空压力。 第一分流阀连接在排气管线和第一进料管线之间，第二分流阀连接在排气管线和第二进料管线之间。 当第一转换阀打开以允许反应气体流入腔室时，第二分流阀打开以排出第二进料管线，并且当第二转换阀打开以允许惰性气体流入室中时，第一分流器 打开阀门以排出第一个进料管线。 通过交替地排出进料管线，抑制了在从一种气体切换到另一种气体时在室中通常发生的压力波动。

公开(公告)号：US5427357A

公开(公告)日：1995-06-27

申请号：US209906

申请日：1994-03-14

申请人： Mutsunori Koyomogi ,  Kunihiko Daido ,  Masahiko Nakazawa ,  Yukio Minami ,  Masahiko Sogao ,  Kazuhiro Yoshikawa ,  Shuhei Ogawa ,  Tetsuya Kojima

发明人： Mutsunori Koyomogi ,  Kunihiko Daido ,  Masahiko Nakazawa ,  Yukio Minami ,  Masahiko Sogao ,  Kazuhiro Yoshikawa ,  Shuhei Ogawa ,  Tetsuya Kojima

IPC分类号： F16K1/10 ,  F16K41/10 ,  F16K3/00

CPC分类号： F16K41/10 ,  F16K1/10 ,  Y10T137/6416

摘要： A control valve comprises a valve body having a fluid channel and a valve seat; a valve operating part; a valve stem supporting member having its upper end fixed to the valve operating part and its lower end fixed to the valve body; a valve stem penetrating the valve stem supporting member and having its upper end part connected to the valve operating part and its lower end part entering the valve body, the valve stem being movable upward or downward by the valve operating part; and a valve element attached to the lower end of the valve stem. The valve element is moved upward or downward by moving the valve stem upward or downward, the valve element being brought into contact with and seated in the valve seat to close a fluid channel as it is moved downward, the valve element being detached from the valve seat to open the fluid channel as it is moved upward. The valve stem supporting member has an upper tubular body and a lower tubular body, the upper tubular body having its upper end fixed to the valve operating part and its lower end detached from the valve body, the lower tubular body having its lower end fixed to the valve body and its upper end detached from the valve operating part, the two tubular bodies being spaced apart each other, the lower end part of the upper tubular body and the upper end part of the lower tubular body being connected by a connecting member.

摘要翻译： 控制阀包括具有流体通道和阀座的阀体; 阀门操作部分; 阀杆支撑构件，其上端固定到阀操作部分，其下端固定到阀体; 阀杆贯穿阀杆支撑构件，其上端部分连接到阀操作部分，其下端部分进入阀体，阀杆可由阀操作部件向上或向下移动; 以及附接到阀杆的下端的阀元件。 阀元件通过向上或向下移动阀杆而向上或向下移动，阀元件与阀座接触并安置在阀座中，以在其向下移动时闭合流体通道，阀元件从阀门拆下 座椅向上移动以打开流体通道。 阀杆支撑构件具有上管状体和下管状体，上管状体的上端固定到阀操作部分，其下端与阀体分离，下管状体的下端固定到 阀体及其上端与阀操作部分脱离，两个管状体彼此间隔开，上管状体的下端部和下管状体的上端部通过连接部件连接。