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113 条记录 (耗时 0.038 秒)

    Process for the purification of aromatic polycarboxylic acids
    37.
    发明授权
    Process for the purification of aromatic polycarboxylic acids 失效
    芳族多元羧酸的纯化方法

    公开(公告)号：US5723659A

    公开(公告)日：1998-03-03

    申请号：US794103

    申请日：1997-02-03

    申请人： James F. White

    发明人： James F. White

    IPC分类号： C07C51/50 ,  C07C51/487 ,  C07C63/26 ,  C07C51/42

    CPC分类号： C07C51/487

    摘要： An improved process is disclosed for purifying impure aromatic polycarboxylic acids produced by the catalytic oxidation of polyalkylaromatic hydrocarbons which comprises contacting said impure acid with hydrogen and at least one hydrogenation catalyst, the improvement comprising said catalyst having a water insoluble and non-brittle coating of at least one polymeric material.

    摘要翻译： 公开了一种用于净化通过聚烷基芳烃的催化氧化产生的不纯的芳族多元羧酸的改进方法，其包括使所述不纯的酸与氢气和至少一种氢化催化剂接触，该改进包括所述催化剂具有水不溶性和非脆性涂层 至少一种聚合材料。

    Planarized, reusable calibration grids
    38.
    发明授权
    Planarized, reusable calibration grids 失效
    平面化，可重复使用的校准网格

    公开(公告)号：US5043586A

    公开(公告)日：1991-08-27

    申请号：US603137

    申请日：1990-10-25

    申请人： George J. Giuffre ,  Maris A. Sturans ,  James F. White ,  Robert R. Wilbarg

    发明人： George J. Giuffre ,  Maris A. Sturans ,  James F. White ,  Robert R. Wilbarg

    IPC分类号： G03F7/20 ,  G03F1/00 ,  H01J37/304 ,  H01L21/027 ,  H01L21/30 ,  H01L21/302 ,  H01L21/3065

    CPC分类号： H01J37/3045

    摘要： An improved structure for electron beam lithography grids and a method of fabricating such grids yields calibration grids having grid lines coplanar with the surface of a the grid body and laterally supported by grooves formed in the grid body and which can also be cleaned after contamination by outgassing resist during use by virtue of the provision of such lateral support for the grid lines. The grid exhibits improved accuracy due to the technique of fabrication of the grooves. The invention thus allows the electron beam lithography process to be conducted with less expense and at a greater speed. The improved accuracy of the calibration grid also permits integrated circuits and masks used in the fabrication of such devices to be designed more flexibly and fabricated at reduced cost and improved integration densities and manufacturing yields.

    摘要翻译： 用于电子束光刻栅格的改进的结构和制造这种栅格的方法产生校准栅格，栅格线与栅格体的表面共面并且由形成在栅格体中的沟槽侧向支撑，并且还可以通过除气 由于为网格线提供这样的横向支撑而在使用期间抗拒。 由于槽的制造技术，栅格表现出提高的精度。 因此，本发明允许以更少的费用和更高的速度进行电子束光刻工艺。 校准网格的改进的精度还允许在制造这种装置中使用的集成电路和掩模更灵活地设计并且以降低的成本和改进的集成密度和制造产量来制造。