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公开(公告)号：US11227785B2
公开(公告)日：2022-01-18
申请号：US17187299
申请日：2021-02-26
IPC分类号： H01L21/677 , H01L21/67 , H01L21/68 , B65G47/90 , H01L21/687
摘要： A substrate transfer system includes a load lock module, an atmospheric transfer module having a first sidewall adjacent to the load lock module and a second sidewall remote from the load lock module, the atmospheric transfer module being connected to the load lock module, and a substrate transfer robot disposed in the atmospheric transfer module. The substrate transfer robot includes a base configured to reciprocate along the first sidewall, a substrate transfer arm disposed on the base, and a flow rectifier surrounding the base, the flow rectifier being configured, upon movement of the base, to create an obliquely downward air flow in a direction opposite to a moving direction of the base.
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公开(公告)号：US20210013012A1
公开(公告)日：2021-01-14
申请号：US16922579
申请日：2020-07-07
发明人： Atsushi Sawachi , Norihiko Amikura
IPC分类号： H01J37/32 , C23C16/455 , C23C16/52 , H01L21/67
摘要： A performance calculation method is provided. In the performance calculation method, shipment inspection data of multiple flow rate controllers are acquired. Further, first performance values indicating, as deviation values, performance of the flow rate controllers are calculated based on the acquired shipment inspection data and first coefficients for items indicating the performance of the flow rate controllers. Further, second performance values indicating, as deviation values, performance of a processing apparatus using the flow rate controllers are calculated based on the calculated first performance values and second coefficients for items indicating the performance of the processing apparatus.
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公开(公告)号：US10859426B2
公开(公告)日：2020-12-08
申请号：US16117630
申请日：2018-08-30
发明人： Jun Hirose , Norihiko Amikura , Risako Miyoshi , Shinobu Onodera
摘要： Disclosed is a method of inspecting a flow rate measuring system used in a substrate processing system. The flow rate measuring system provides a gas flow path used for calculating a flow rate in a build-up method. A gas output by a flow rate controller of a gas supply unit of the substrate processing system may be supplied to the gas flow path. In the method, apart from a previously obtained initial value of a volume of the gas flow path, a volume of the gas flow path is obtained at the time of inspection of the flow rate measuring system. Then, the obtained volume is compared to the initial value.
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公开(公告)号：US10424466B2
公开(公告)日：2019-09-24
申请号：US15680621
申请日：2017-08-18
发明人： Norihiko Amikura , Risako Miyoshi
摘要： The present disclosure provides a method for inspecting a shower plate of a plasma processing apparatus. In the plasma processing apparatus, a gas ejection unit includes a shower plate. A plurality of gas ejection holes are formed on the shower plate. This method includes (i) setting a flow rate of gas output from a first flow rate controller, and (ii) acquiring a measurement value indicating a pressure in a flow path inside a second pressure control type flow rate controller by using a pressure gauge of the second flow rate controller in a state where the gas output from the first flow rate controller at the set flow rate is supplied to the gas ejection unit and branched between the first flow rate controller and the gas ejection unit so as to be supplied to the flow path inside the second flow rate controller.
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公开(公告)号：US10229844B2
公开(公告)日：2019-03-12
申请号：US15183891
申请日：2016-06-16
IPC分类号： C23C16/455 , H01J37/32 , H01L21/67 , G05D7/06 , G01F1/684 , H01L21/311
摘要： Throughput of the processing can be improved. A gas supply system includes a plurality of element devices which constitute the gas supply system and a base 212 on which the plurality of element devices are disposed. Some of the element devices are disposed on a surface 212a of the base 212, and the others are disposed on a surface 212b of the base 212, which is opposite to the surface 212a of the base 212. The plurality of element devices may be implemented by, for example, a flow rate controller FD and a secondary valve FV2. The secondary valve FV2 is disposed on the surface 212b, which is opposite to the surface 212a of the base 212 where the flow rate controller FD is disposed.
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公开(公告)号：US20170075361A1
公开(公告)日：2017-03-16
申请号：US15263490
申请日：2016-09-13
发明人： Norihiko Amikura , Risako Miyoshi
CPC分类号： G05D7/0635 , F16K31/004 , F16K37/0075 , F17D5/00 , H01L21/00
摘要： A flow rate of a gas supplied into a processing vessel of a substrate processing apparatus is controlled according to a set flow rate of a first flow rate controller. The gas is also supplied into a second flow rate controller. When an output flow rate of the first flow rate controller is in a steady state, a first pressure measurement value of a first pressure gauge and a second pressure measurement value of a second pressure gauge of the second flow rate controller are obtained. A difference absolute value between the first pressure measurement value and a reference pressure value and a difference absolute value between the second pressure measurement value and a reference pressure value are calculated, and then, an average value of the difference absolute values is calculated. The difference absolute values and the average value are respectively compared with a first to third threshold value.
摘要翻译： 根据第一流量控制器的设定流量来控制供给到基板处理装置的处理容器内的气体的流量。 气体也被供应到第二流量控制器中。 当第一流量控制器的输出流量处于稳定状态时，获得第二流量控制器的第一压力计的第一压力测量值和第二压力计的第二压力测量值。 计算第一压力测量值和参考压力值之间的差异绝对值以及第二压力测量值和参考压力值之间的差异绝对值，然后计算差值绝对值的平均值。 差分绝对值和平均值分别与第一至第三阈值进行比较。
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公开(公告)号：US20170074694A1
公开(公告)日：2017-03-16
申请号：US15262120
申请日：2016-09-12
发明人： Norihiko Amikura , Risako Miyoshi
CPC分类号： G01F1/42
摘要： A gas, whose flow rate is adjusted by a flow rate controller as a measurement target, is supplied into a processing vessel in a state that a third valve of the gas supply system provided at an upstream side of the processing vessel is opened. While the gas is continuously supplied, the third valve is closed after a pressure measurement value of a pressure gauge within a flow rate controller for pressure measurement is stabilized. After the third valve is closed, an output flow rate of the flow rate controller as the measurement target is calculated from a previously known volume of the gas supply system in which the gas supplied through the flow rate controller as the measurement target is collected and a rise rate of the pressure measurement value of the pressure gauge within the flow rate controller for pressure measurement with respect to time.
摘要翻译： 在作为处理容器的上游侧设置的供气系统的第三阀打开的状态下，将流量由作为测定对象的流量控制器调节的气体供给到处理容器。 当连续供给气体时，在用于压力测量的流量控制器内的压力表的压力测量值稳定之后，第三阀关闭。 在第三阀关闭之后，作为测量对象的流量控制器的输出流量根据先前已知的通过作为测量对象的流量控制器供给的气体被收集的气体供给系统的体积来计算， 用于压力测量的流量控制器内压力计的压力测量值的上升率相对于时间。
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